JPS5727092A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS5727092A JPS5727092A JP10225080A JP10225080A JPS5727092A JP S5727092 A JPS5727092 A JP S5727092A JP 10225080 A JP10225080 A JP 10225080A JP 10225080 A JP10225080 A JP 10225080A JP S5727092 A JPS5727092 A JP S5727092A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- electrode
- type gaas
- end surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 4
- 229910017401 Au—Ge Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02461—Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To prevent deterioration due to stress applied to a crystal and to obtain long life, by forming an exciting region, to which a current is injected in stripe shape, only in the inside of a region covered by a PHS (plated heat sink) electrode. CONSTITUTION:On an N type GaAs substrate 11, is formed a double heterogeneous (DH) structure comprising N type Ga0.7Al0.3As layer 12, a P type Ga0.97Al0.03As layer 13, and a P type Ga0.7Al0.3As layer 14. A P type GaAs layer 15' which is patterned in a stripe shape is formed so as to confine the injecting current. An oxide film 16, a P side electrode 17 of a Cr-Au layer, an N side electrode 18 of Au-Ge, and the PHS electrode 19 of Au are formed. The stripe shaped P type GaAs layer 15' to which current is injected is not extended up to the end surface of the resonator. The end surface of the P type GaAs layer 15' is located within the inner side than the end surface of the PHS electrode 19.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10225080A JPS5727092A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10225080A JPS5727092A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5727092A true JPS5727092A (en) | 1982-02-13 |
Family
ID=14322350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10225080A Pending JPS5727092A (en) | 1980-07-25 | 1980-07-25 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5727092A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5608749A (en) * | 1992-09-16 | 1997-03-04 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser diode and semiconductor laser diode array including plated heat sink (PHS) electrode |
JP2002261379A (en) * | 2001-03-02 | 2002-09-13 | Mitsubishi Electric Corp | Semiconductor device and optical semiconductor device comprising it |
GB2411522A (en) * | 2000-12-18 | 2005-08-31 | Samsung Electro Mech | Light emitting device having heat-dissipating element |
JP2010056583A (en) * | 2009-12-10 | 2010-03-11 | Sanyo Electric Co Ltd | Semiconductor laser element |
JP2010124002A (en) * | 2010-03-08 | 2010-06-03 | Hitachi Ltd | Semiconductor laser device |
-
1980
- 1980-07-25 JP JP10225080A patent/JPS5727092A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5608749A (en) * | 1992-09-16 | 1997-03-04 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser diode and semiconductor laser diode array including plated heat sink (PHS) electrode |
GB2411522A (en) * | 2000-12-18 | 2005-08-31 | Samsung Electro Mech | Light emitting device having heat-dissipating element |
GB2411522B (en) * | 2000-12-18 | 2005-11-02 | Samsung Electro Mech | GaN based group III-V nitride semi-conductor light emitting diode |
JP2002261379A (en) * | 2001-03-02 | 2002-09-13 | Mitsubishi Electric Corp | Semiconductor device and optical semiconductor device comprising it |
JP2010056583A (en) * | 2009-12-10 | 2010-03-11 | Sanyo Electric Co Ltd | Semiconductor laser element |
JP2010124002A (en) * | 2010-03-08 | 2010-06-03 | Hitachi Ltd | Semiconductor laser device |
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