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JPS5726702A - Method and device for measuring film thickness - Google Patents

Method and device for measuring film thickness

Info

Publication number
JPS5726702A
JPS5726702A JP10212780A JP10212780A JPS5726702A JP S5726702 A JPS5726702 A JP S5726702A JP 10212780 A JP10212780 A JP 10212780A JP 10212780 A JP10212780 A JP 10212780A JP S5726702 A JPS5726702 A JP S5726702A
Authority
JP
Japan
Prior art keywords
sample
film thickness
measured
treated
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10212780A
Other languages
Japanese (ja)
Inventor
Shunpei Yamazaki
Yujiro Nagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP10212780A priority Critical patent/JPS5726702A/en
Publication of JPS5726702A publication Critical patent/JPS5726702A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To measure <=50Angstrom film thickness with <=+ or -0.5-+ or -2Angstrom high precision by removing an adsorbed layer adsorbed to a surface to be measured and by using an ellipsometer for a <=5,000Angstrom wavelength light source. CONSTITUTION:A sample to be measured is heated under vacuum or treated with plasma to remove an adsorbed layer on the surface, and while a light source having <=5,000Angstrom is used, the film thickness is measured by an ellipsometer. For example, the sample 1 to be measured is fitted under a sample table in a sample container 2 which can be evacuated and the sample is heated by a xenon lamp 8 or treated with plasma generated by applying a high voltage between electrodes 13 and 14 to remove the surface-treated layer, and the sample 1 is irradiated with Ar laser light from the light source 3 through a polarizer 4 and a compensator 5, thereby converting its reflected light into an electric signal by a photodetector 7 through an analyzer 6. In this case, the film thickness, refractivity, etc., are found with high precision from variations of ellipticity of the polarized wave of the light.
JP10212780A 1980-07-25 1980-07-25 Method and device for measuring film thickness Pending JPS5726702A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10212780A JPS5726702A (en) 1980-07-25 1980-07-25 Method and device for measuring film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10212780A JPS5726702A (en) 1980-07-25 1980-07-25 Method and device for measuring film thickness

Publications (1)

Publication Number Publication Date
JPS5726702A true JPS5726702A (en) 1982-02-12

Family

ID=14319111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10212780A Pending JPS5726702A (en) 1980-07-25 1980-07-25 Method and device for measuring film thickness

Country Status (1)

Country Link
JP (1) JPS5726702A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423105A (en) * 1987-07-17 1989-01-25 Japan Aviation Electron Film thickness evaluating device
WO1998033077A3 (en) * 1997-01-27 1998-09-11 Peter D Haaland Coatings, methods and apparatus for reducing reflection from optical substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6423105A (en) * 1987-07-17 1989-01-25 Japan Aviation Electron Film thickness evaluating device
WO1998033077A3 (en) * 1997-01-27 1998-09-11 Peter D Haaland Coatings, methods and apparatus for reducing reflection from optical substrates

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