JPS57178201A - Coating method for optical instrument for high-output laser - Google Patents
Coating method for optical instrument for high-output laserInfo
- Publication number
- JPS57178201A JPS57178201A JP56063244A JP6324481A JPS57178201A JP S57178201 A JPS57178201 A JP S57178201A JP 56063244 A JP56063244 A JP 56063244A JP 6324481 A JP6324481 A JP 6324481A JP S57178201 A JPS57178201 A JP S57178201A
- Authority
- JP
- Japan
- Prior art keywords
- optical instrument
- output laser
- coating
- vapor
- tio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title abstract 4
- 230000003287 optical effect Effects 0.000 title abstract 3
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 abstract 4
- 239000011248 coating agent Substances 0.000 abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 238000007733 ion plating Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 239000004408 titanium dioxide Substances 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
PURPOSE:To form a coating free from specks (fine spots formed by uneven vapor deposition) with high work efficiency by coating an optical instrument for a high-output laser with titanium monoxide as a vapor depositing source material by high frequency ion plating. CONSTITUTION:By a high frequency ion plating method using titanium monoxide (TiO) as a vapor depositing source material, a vapor deposited film[formed as a titanium dioxide (TiO)2 film by oxidation]is formed on an optical instrument for a high-output laser to form a coating oxidized sufficiently even under a low partial pressure of oxygen, contg. no lower oxide, and having superior laser resistance and physical strength.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56063244A JPS57178201A (en) | 1981-04-28 | 1981-04-28 | Coating method for optical instrument for high-output laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56063244A JPS57178201A (en) | 1981-04-28 | 1981-04-28 | Coating method for optical instrument for high-output laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57178201A true JPS57178201A (en) | 1982-11-02 |
Family
ID=13223617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56063244A Pending JPS57178201A (en) | 1981-04-28 | 1981-04-28 | Coating method for optical instrument for high-output laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57178201A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129601A (en) * | 1984-09-24 | 1986-06-17 | スペクトラ−フイジツクス・インコ−ポレイテツド | Laser optical member |
US8482926B2 (en) | 2008-09-26 | 2013-07-09 | Sharp Kabushiki Kaisha | Optical element wafer module, optical element module, method for manufacturing optical element module, electronic element wafer module, method for manufacturing electronic element module, electronic element module and electronic information device |
-
1981
- 1981-04-28 JP JP56063244A patent/JPS57178201A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129601A (en) * | 1984-09-24 | 1986-06-17 | スペクトラ−フイジツクス・インコ−ポレイテツド | Laser optical member |
US8482926B2 (en) | 2008-09-26 | 2013-07-09 | Sharp Kabushiki Kaisha | Optical element wafer module, optical element module, method for manufacturing optical element module, electronic element wafer module, method for manufacturing electronic element module, electronic element module and electronic information device |
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