[go: up one dir, main page]

JPS57172766A - Charge transfer device - Google Patents

Charge transfer device

Info

Publication number
JPS57172766A
JPS57172766A JP56058262A JP5826281A JPS57172766A JP S57172766 A JPS57172766 A JP S57172766A JP 56058262 A JP56058262 A JP 56058262A JP 5826281 A JP5826281 A JP 5826281A JP S57172766 A JPS57172766 A JP S57172766A
Authority
JP
Japan
Prior art keywords
charge transfer
transfer part
diffused layer
depression type
low voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56058262A
Other languages
Japanese (ja)
Inventor
Mototsugu Ogura
Yasuaki Terui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56058262A priority Critical patent/JPS57172766A/en
Publication of JPS57172766A publication Critical patent/JPS57172766A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00Charge transfer devices
    • H10D44/40Charge-coupled devices [CCD]
    • H10D44/45Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/454Output structures

Landscapes

  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To make it possible to drive the output circuit of the charge transfer device by a low voltage and to make it suitable for a solid state image pickup element, by providing a depression type IGFET which resets a potential of a floating diffused layer into which the signal charge is transferred from a charge transfer part. CONSTITUTION:A CCD element 11 which is to become the charge transfer part is formed in a semiconductor substrate 20, and the depression type, embedded CCD charge transfer part 14 is formed below the CCD element 11 and the output gate 13. The floating diffused layer 3 is formed at the same time as the formation of said transfer part 14. A lower channel part 16 beneath a reset gate 15 surrounded by the layer 3 and a drain 5 is also of the depression type. Transistors 6, 7, 9, and 10, which are connected to the floating diffused layer 3, are formed in the substrate 20 so as to form a unitary body. Thus the manufacturing method is simplified, and the low voltage driving is facilitated.
JP56058262A 1981-04-16 1981-04-16 Charge transfer device Pending JPS57172766A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56058262A JPS57172766A (en) 1981-04-16 1981-04-16 Charge transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56058262A JPS57172766A (en) 1981-04-16 1981-04-16 Charge transfer device

Publications (1)

Publication Number Publication Date
JPS57172766A true JPS57172766A (en) 1982-10-23

Family

ID=13079238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56058262A Pending JPS57172766A (en) 1981-04-16 1981-04-16 Charge transfer device

Country Status (1)

Country Link
JP (1) JPS57172766A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131854U (en) * 1985-02-06 1986-08-18
JPH01502634A (en) * 1986-09-18 1989-09-07 イーストマン・コダック・カンパニー Image sensor output circuit
US7755690B2 (en) * 1997-08-15 2010-07-13 Sony Corporation Solid state image sensor with fixed pattern noise reduction

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632764A (en) * 1979-08-27 1981-04-02 Nec Corp Charge coupled device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632764A (en) * 1979-08-27 1981-04-02 Nec Corp Charge coupled device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131854U (en) * 1985-02-06 1986-08-18
JPH01502634A (en) * 1986-09-18 1989-09-07 イーストマン・コダック・カンパニー Image sensor output circuit
US7755690B2 (en) * 1997-08-15 2010-07-13 Sony Corporation Solid state image sensor with fixed pattern noise reduction

Similar Documents

Publication Publication Date Title
JPS56120166A (en) Semiconductor ic device and manufacture thereof
JPS5362989A (en) Semiconductor memory device
EP0566739A4 (en) Semiconductor device
JPS5755672A (en) Solid-state image pickup device and its driving method
GB2087152B (en) Solid state image sensor
JPS57172766A (en) Charge transfer device
EP0377959A3 (en) A method of driving a charge detection circuit
JPS57204171A (en) Semiconductor device
JPS5759384A (en) Manufacture of longitudinal type insulated field effect semiconductor device
JPS5727069A (en) Mos type simiconductor device
JPS52152111A (en) Photoelectric conversion controller of charge transfer pickup device
JPS5780762A (en) Solid state image pickup element
JPS57106279A (en) Solid image pickup device
JPS5758358A (en) Charge transfer device
JPS56100477A (en) Semiconductor device
JPS562783A (en) Production of solid state image pickup device
JPS60152065A (en) Charge transfer device
JPS6419767A (en) Charge transfer device
JPS57138177A (en) Charge transfer device
JPS57211263A (en) Manufacture of complementary mos semiconductor device
JPS55113378A (en) Semiconductor device and its manufacturing method
JPS5756961A (en) Complementary mos field effect semiconductor device
JPS5553464A (en) Method for producing semiconductor element
JPS57171885A (en) Solid-state image pickup device
JPS6450463A (en) Solid-state image sensing device