JPS57162482A - Semiconductor luminous device and manufacture thereof - Google Patents
Semiconductor luminous device and manufacture thereofInfo
- Publication number
- JPS57162482A JPS57162482A JP4797981A JP4797981A JPS57162482A JP S57162482 A JPS57162482 A JP S57162482A JP 4797981 A JP4797981 A JP 4797981A JP 4797981 A JP4797981 A JP 4797981A JP S57162482 A JPS57162482 A JP S57162482A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- type
- semiconductor
- stripe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain the flat photoconductive wave channel without the etching process by a method wherein the semiconductor substrate is provided with a stripe type mask and the semiconductor layers of the conductive type similar to and opposite to that of the substrate are laminated on said substrate and removing said mask, the active layer is embedded therein. CONSTITUTION:The N type semiconductor substrate 21 is coated with the SiO2 film 22 formed into a stripe type mask by means of patterning and the P type InP inversed bias joint formed semiconductor layer 23 and the N type InP inversed bias joint formed semiconductor layer 24 are laminated to be grown on the substrate 21 surrounding said film 22 by means of the liquidus epitaxial growth. Next after removing said film 22, the surface of said substrate 21 exposed like stripe is cleaned up and the InGaAsP active layer 25 is embedded in the surface of said substrate 21 exposed again by means of the liquidus epitaxial growth. Then the P type InP clad layer 26 spread on the layer 24 covering said layer 25 is formed to be further covered with the P type InGaAsP contact layer 27.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4797981A JPS57162482A (en) | 1981-03-31 | 1981-03-31 | Semiconductor luminous device and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4797981A JPS57162482A (en) | 1981-03-31 | 1981-03-31 | Semiconductor luminous device and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57162482A true JPS57162482A (en) | 1982-10-06 |
Family
ID=12790424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4797981A Pending JPS57162482A (en) | 1981-03-31 | 1981-03-31 | Semiconductor luminous device and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57162482A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04125059U (en) * | 1991-04-16 | 1992-11-13 | サンハヤト株式会社 | electric soldering iron |
US5179040A (en) * | 1990-07-16 | 1993-01-12 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor laser device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347233A (en) * | 1976-10-12 | 1978-04-27 | Canon Inc | Charcter wheel control device |
-
1981
- 1981-03-31 JP JP4797981A patent/JPS57162482A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347233A (en) * | 1976-10-12 | 1978-04-27 | Canon Inc | Charcter wheel control device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5179040A (en) * | 1990-07-16 | 1993-01-12 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor laser device |
JPH04125059U (en) * | 1991-04-16 | 1992-11-13 | サンハヤト株式会社 | electric soldering iron |
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