JPS57153255A - Measuring method for nonelectrolytic plating reaction - Google Patents
Measuring method for nonelectrolytic plating reactionInfo
- Publication number
- JPS57153255A JPS57153255A JP56038631A JP3863181A JPS57153255A JP S57153255 A JPS57153255 A JP S57153255A JP 56038631 A JP56038631 A JP 56038631A JP 3863181 A JP3863181 A JP 3863181A JP S57153255 A JPS57153255 A JP S57153255A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- time
- electric charge
- polarization value
- electric potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
- G01N17/02—Electrochemical measuring systems for weathering, corrosion or corrosion-protection measurement
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Biodiversity & Conservation Biology (AREA)
- Ecology (AREA)
- Environmental & Geological Engineering (AREA)
- Environmental Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemically Coating (AREA)
Abstract
PURPOSE:To determine the velocity of deposition in nonelectrolytic plating reaction simply and quickly, by giving a fixed quantity of electric charge to a material to be plated instantaneously and measuring fluctuation of electric potential as the relation between polarization value and time. CONSTITUTION:An action electrode 11 consists of a material to be plated and a reference electrode 12 using as a standard for measuring electric potential fluctuation of the electrode 11 and also, an opposite electrode 13 using at the time of supplying an electric charge, are provided in a cell 14. A capacitor 15 is charged by a variable direct current power source 16 and the stored electric charge is given to the electrode 11 instantaneously by an electric charge giving mechanism 17. The electric potential fluctuation of the electrode 11 is measured as the relation between a polarization value eta and a time t and is sent to comparators 21 and 22 set at the different polarization values eta1 and eta2. These comparators 21 and 22 are connected with a clock 23 and the time difference at the time of each comparator has got polarization value, is measured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56038631A JPS57153255A (en) | 1981-03-19 | 1981-03-19 | Measuring method for nonelectrolytic plating reaction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56038631A JPS57153255A (en) | 1981-03-19 | 1981-03-19 | Measuring method for nonelectrolytic plating reaction |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57153255A true JPS57153255A (en) | 1982-09-21 |
Family
ID=12530581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56038631A Pending JPS57153255A (en) | 1981-03-19 | 1981-03-19 | Measuring method for nonelectrolytic plating reaction |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57153255A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015011026A (en) * | 2013-07-02 | 2015-01-19 | アンコーシーズ・ゲーエムベーハー | Electrochemical analysis method for in-situ fingerprinting for electrochemical deposition and/or electrochemical etching |
-
1981
- 1981-03-19 JP JP56038631A patent/JPS57153255A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015011026A (en) * | 2013-07-02 | 2015-01-19 | アンコーシーズ・ゲーエムベーハー | Electrochemical analysis method for in-situ fingerprinting for electrochemical deposition and/or electrochemical etching |
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