JPS57115545A - Method for shielding far ultraviolet rays - Google Patents
Method for shielding far ultraviolet raysInfo
- Publication number
- JPS57115545A JPS57115545A JP169381A JP169381A JPS57115545A JP S57115545 A JPS57115545 A JP S57115545A JP 169381 A JP169381 A JP 169381A JP 169381 A JP169381 A JP 169381A JP S57115545 A JPS57115545 A JP S57115545A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- ultraviolet rays
- far ultraviolet
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To shield far ultraviolet rays with a long-life mask having high hardness and a thin film low is reflectivity, by using as a film for shielding far ultraviolet rays an alumina film containing >=1 kinds of metal, semimetal elements, or oxides of these elements, or an organic compound. CONSTITUTION:An alumina film 2 containing >=1 kinds selected from metal and semimetal elements, oxide and the like compound of these elements, and organic compounds are formed on a substrate 1 made of transparent synthetic quartz glass. On this film 2 a resist film pattern 3 is formed, and the film 2 is etched by reactive sputtering using the pattern 3 as a mask to form the pattern of the alumina film 2. The obtained mask has the substrate 1 and the pattern 2 both high in hardness, and the film 2 low in reflectivity, so the substrate 1 is insusceptible to scratching in repeated uses when using this resist pattern on a silicon substrate in the contact exposure system, and it can be used for a long term as a mask for shielding far ultraviolet rays.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP169381A JPS57115545A (en) | 1981-01-08 | 1981-01-08 | Method for shielding far ultraviolet rays |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP169381A JPS57115545A (en) | 1981-01-08 | 1981-01-08 | Method for shielding far ultraviolet rays |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57115545A true JPS57115545A (en) | 1982-07-19 |
Family
ID=11508601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP169381A Pending JPS57115545A (en) | 1981-01-08 | 1981-01-08 | Method for shielding far ultraviolet rays |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57115545A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5350960A (en) * | 1992-02-17 | 1994-09-27 | Mitsubishi Denki Kabushiki Kaisha | Electric motor with bobbin columns to prevent bulging coils |
-
1981
- 1981-01-08 JP JP169381A patent/JPS57115545A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5350960A (en) * | 1992-02-17 | 1994-09-27 | Mitsubishi Denki Kabushiki Kaisha | Electric motor with bobbin columns to prevent bulging coils |
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