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JPS57114268A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS57114268A
JPS57114268A JP56000442A JP44281A JPS57114268A JP S57114268 A JPS57114268 A JP S57114268A JP 56000442 A JP56000442 A JP 56000442A JP 44281 A JP44281 A JP 44281A JP S57114268 A JPS57114268 A JP S57114268A
Authority
JP
Japan
Prior art keywords
capacitance element
type
mos
mos capacitance
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56000442A
Other languages
Japanese (ja)
Inventor
Kazuhiko Kuri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Ltd
Hitachi Microcomputer Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Microcomputer Engineering Ltd filed Critical Hitachi Ltd
Priority to JP56000442A priority Critical patent/JPS57114268A/en
Publication of JPS57114268A publication Critical patent/JPS57114268A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/62Capacitors having potential barriers
    • H10D1/66Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors

Landscapes

  • Bipolar Transistors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To reduce the area of an MOS capacitance element and to obtain a semiconductor device reduced in its chip size by forming a conductor layer via an insulating layer on the element and forming a parallel capacitor with the element. CONSTITUTION:An N<-> type epitaxial layer 3 is grown via an N<+> type buried layer 3 on a P type Si substrate 1, and is isolated into element via P<+> type isolation diffused region 4. An aluminum electrode 10 is covered via a thin SiO2 film 9 on an N<+> type diffused region 8 diffused simultaneously with an emitter 6 in capacitance element, and an ordinary MOS capacitor is formed. Further, an aluminum electrode 12 is formed on an MOS capacitance element, and is connected through the through hole of an interlayer insulating film 11 to the aluminum wire 13 of the MOS capacitance element. Accordingly, since a parallel capacitance is formed in the MOS capacitance element, the area of the MOS capacitance element can be reduced to reduce the chip size, and to improve the integration of the chip.
JP56000442A 1981-01-07 1981-01-07 Semiconductor device Pending JPS57114268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56000442A JPS57114268A (en) 1981-01-07 1981-01-07 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56000442A JPS57114268A (en) 1981-01-07 1981-01-07 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS57114268A true JPS57114268A (en) 1982-07-16

Family

ID=11473913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56000442A Pending JPS57114268A (en) 1981-01-07 1981-01-07 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS57114268A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60198753A (en) * 1983-12-13 1985-10-08 フェアチャイルド セミコンダクタ コーポレーション Method and device for reducing signal transmitting loss in super lsi integrated circuit
JPH03283459A (en) * 1990-03-30 1991-12-13 Hitachi Ltd Semiconductor integrated circuit device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60198753A (en) * 1983-12-13 1985-10-08 フェアチャイルド セミコンダクタ コーポレーション Method and device for reducing signal transmitting loss in super lsi integrated circuit
JPH03283459A (en) * 1990-03-30 1991-12-13 Hitachi Ltd Semiconductor integrated circuit device

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