[go: up one dir, main page]

JPS5698474A - Evaporator for substance - Google Patents

Evaporator for substance

Info

Publication number
JPS5698474A
JPS5698474A JP29080A JP29080A JPS5698474A JP S5698474 A JPS5698474 A JP S5698474A JP 29080 A JP29080 A JP 29080A JP 29080 A JP29080 A JP 29080A JP S5698474 A JPS5698474 A JP S5698474A
Authority
JP
Japan
Prior art keywords
substance
vapor
container
discharge port
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29080A
Other languages
Japanese (ja)
Inventor
Masanari Shindo
Isao Myokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP29080A priority Critical patent/JPS5698474A/en
Publication of JPS5698474A publication Critical patent/JPS5698474A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To prevent coarse grains from mixing into a vacuum-deposited film by a method wherein a droplet-shielding member having passing ports for vapor is provided above the substance to be evaporated which is placed at the bottom of a container so as to prevent the upper surface of the substance from being exposed to a discharge port for vapor. CONSTITUTION:The substance to be evaporated 14 is filled in the bottom part of a container 12 having the discharge port for vapor 11 at the upper end thereof, and the droplet shielding member 15 which has the passing ports for vapor 17 consisting of plural through-holes at its open-bottomed cylindrical peripheral wall is placed on a stepped part 13. Accordingly, the upper surface of the substance 14 is prevented from being exposed to the discharge port 11. Therefore, even when the molten substance 14 boils and droplets are splashed, the droplets collide with the member 15, are deposited on the member 15 and then fall again into the molten substance 14. The materials for the container 12 and the member 15 are selected from the group consisting of graphite, beryllia, silicon nitride and quartz.
JP29080A 1980-01-08 1980-01-08 Evaporator for substance Pending JPS5698474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29080A JPS5698474A (en) 1980-01-08 1980-01-08 Evaporator for substance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29080A JPS5698474A (en) 1980-01-08 1980-01-08 Evaporator for substance

Publications (1)

Publication Number Publication Date
JPS5698474A true JPS5698474A (en) 1981-08-07

Family

ID=11469769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29080A Pending JPS5698474A (en) 1980-01-08 1980-01-08 Evaporator for substance

Country Status (1)

Country Link
JP (1) JPS5698474A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2582319A1 (en) * 1985-05-22 1986-11-28 Barbier Benard & Turenne Plant for nickel deposition by vacuum evaporation, especially for the preparation of neutron guides
EP1342808A1 (en) * 2002-03-08 2003-09-10 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2582319A1 (en) * 1985-05-22 1986-11-28 Barbier Benard & Turenne Plant for nickel deposition by vacuum evaporation, especially for the preparation of neutron guides
EP1342808A1 (en) * 2002-03-08 2003-09-10 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device

Similar Documents

Publication Publication Date Title
ES8401720A1 (en) Solid shaped articles.
JPS52123172A (en) Spin coating method
JPS5698474A (en) Evaporator for substance
US3016873A (en) Coating
CA2121439A1 (en) Automatic Replenishment, Calibration and Metering System for a Photographic Processing Apparatus
JPS5667873A (en) Liquid replenishing device
JPS5645706A (en) Distiller
JPS5521805A (en) Fluorescent image multiplicating tube
JPS5943876A (en) Evaporation source
JPS5524471A (en) Formation of electrodes
JPS5756399A (en) Manufacture of single crystal of compound with high decomposition pressure
JPS5682381A (en) Direct type heat exchanger
SU1169991A1 (en) Crystallizer
JPS61176257U (en)
JPS54145383A (en) Liquid phase growing boat for semiconductor compound crystal
JPS54115062A (en) Liquid phase epitaxial growth unit
NICOL Vapor deposition apparatus(semiconductors and gallium arsenides)[Patent]
JPS5496813A (en) Liquid storage tank
JPS55161546A (en) Casting method of casting having no deposition and inclusion of scum
SU783374A1 (en) Device for making films under vacuum
JPS5321415A (en) Transporting or storing tank for powder-liquid mixture
JPS57123887A (en) Preparation of single crystal
JPS53125276A (en) Liquid phase epitaxial growth apparatus
JPS57166400A (en) Vessel for liquid-phase growing of semiconductor material
JPS56152753A (en) Sludge dehydrating and separating device for purification tank