JPS5664343A - Preparation of photosensitive resin printing master - Google Patents
Preparation of photosensitive resin printing masterInfo
- Publication number
- JPS5664343A JPS5664343A JP14012779A JP14012779A JPS5664343A JP S5664343 A JPS5664343 A JP S5664343A JP 14012779 A JP14012779 A JP 14012779A JP 14012779 A JP14012779 A JP 14012779A JP S5664343 A JPS5664343 A JP S5664343A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- substrate
- resin layer
- active light
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To obtain a photosensitive resin printing master high in master thickness precision, by feeding a liquid photosensitive resin on a substrate to be moved together with an image carrier at an equal speed on 2 roller surfaces disposed in parallel and illuminating the obtained photosensitive resin layer with an active light. CONSTITUTION:Two rollers 1, 2 is disposed at a specified interval, the circumferential wall is made of a material transmitting an active light and provided with active light source 3 in its inside. Image carrier 4 and substrate 5 for photosensitive resin layer are moved along the circumferential surfaces of rollers 1 and 2 in the same direction according to each arrow at the same peripheral speed, respectively, and photosensitive resin fluid 6 is continuously supplied in the proper position of a space between carrier 4 and substrate 5 to form a photosensitive resin layer of thickness similar to the width of the gap on substrate 5. This photosensitive resin layer is illuminated by the active light from the backside of carrier 4 to form hardened areas A and nonhardened areas B corresponding to the image, and the desired printing master is obtained by processing areas A, B in the subsequent developing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14012779A JPS5664343A (en) | 1979-10-30 | 1979-10-30 | Preparation of photosensitive resin printing master |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14012779A JPS5664343A (en) | 1979-10-30 | 1979-10-30 | Preparation of photosensitive resin printing master |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5664343A true JPS5664343A (en) | 1981-06-01 |
Family
ID=15261519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14012779A Pending JPS5664343A (en) | 1979-10-30 | 1979-10-30 | Preparation of photosensitive resin printing master |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5664343A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4548884A (en) * | 1982-06-11 | 1985-10-22 | E. I. Du Pont De Nemours And Company | Registering and exposing sheet substrates using photosensitive liquid |
| WO2002067058A1 (en) * | 2001-02-21 | 2002-08-29 | Siemens Aktiengesellschaft | Assembly for the continuous production of a structured, coated substrate |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| CN108351605A (en) * | 2016-01-27 | 2018-07-31 | 株式会社Lg化学 | Film mask, preparation method, the pattern forming method using film mask and the pattern that is formed by film mask |
| CN108351603A (en) * | 2016-01-27 | 2018-07-31 | 株式会社Lg化学 | Film mask, preparation method and the pattern forming method using film mask |
-
1979
- 1979-10-30 JP JP14012779A patent/JPS5664343A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4548884A (en) * | 1982-06-11 | 1985-10-22 | E. I. Du Pont De Nemours And Company | Registering and exposing sheet substrates using photosensitive liquid |
| WO2002067058A1 (en) * | 2001-02-21 | 2002-08-29 | Siemens Aktiengesellschaft | Assembly for the continuous production of a structured, coated substrate |
| CN103229105A (en) * | 2010-11-23 | 2013-07-31 | 彩虹科技系统有限公司 | Photoimaging |
| CN108351605A (en) * | 2016-01-27 | 2018-07-31 | 株式会社Lg化学 | Film mask, preparation method, the pattern forming method using film mask and the pattern that is formed by film mask |
| CN108351603A (en) * | 2016-01-27 | 2018-07-31 | 株式会社Lg化学 | Film mask, preparation method and the pattern forming method using film mask |
| JP2018535446A (en) * | 2016-01-27 | 2018-11-29 | エルジー・ケム・リミテッド | Film mask, manufacturing method thereof, and pattern forming method using the same |
| EP3410213A4 (en) * | 2016-01-27 | 2019-01-16 | LG Chem, Ltd. | FILM MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR FORMING A PATTERN USING THE FILM MASK |
| US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
| US11029596B2 (en) | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
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