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JPS5643620A - Production of blazed grating - Google Patents

Production of blazed grating

Info

Publication number
JPS5643620A
JPS5643620A JP11952679A JP11952679A JPS5643620A JP S5643620 A JPS5643620 A JP S5643620A JP 11952679 A JP11952679 A JP 11952679A JP 11952679 A JP11952679 A JP 11952679A JP S5643620 A JPS5643620 A JP S5643620A
Authority
JP
Japan
Prior art keywords
grating
substrate
photoresist
sio
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11952679A
Other languages
Japanese (ja)
Other versions
JPS612921B2 (en
Inventor
Takeji Fujiwara
Koichi Hamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11952679A priority Critical patent/JPS5643620A/en
Publication of JPS5643620A publication Critical patent/JPS5643620A/en
Publication of JPS612921B2 publication Critical patent/JPS612921B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE: To directly blaze a substrate of materials of a low rate of ion beam etching such as SiO2 and Si by beforehand forming a rectangular groove grating then blazing the same through ion beam etching.
CONSTITUTION: A photoresist holographic grating is formed through interference exposure of He-Cd laser or the like by using photoresist on an SiO2 or Si substrate 4 of guartz glass or the like. Next, with this grating as a mask, a grating of rectangular grooves is formed on the substrate 4 through plasma etching using CF4 gas as a reacting gas. Next, ion beams A are entered at angles of 50W80° to etch the substrate 4. Finally, an Au this film 5 is vapor-deposital in order to enhance reflecting efficiency, whereby the blazed grating is formed. In this way, the superior grating for spectroscopes, etc. is obtained.
COPYRIGHT: (C)1981,JPO&Japio
JP11952679A 1979-09-17 1979-09-17 Production of blazed grating Granted JPS5643620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11952679A JPS5643620A (en) 1979-09-17 1979-09-17 Production of blazed grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11952679A JPS5643620A (en) 1979-09-17 1979-09-17 Production of blazed grating

Publications (2)

Publication Number Publication Date
JPS5643620A true JPS5643620A (en) 1981-04-22
JPS612921B2 JPS612921B2 (en) 1986-01-29

Family

ID=14763455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11952679A Granted JPS5643620A (en) 1979-09-17 1979-09-17 Production of blazed grating

Country Status (1)

Country Link
JP (1) JPS5643620A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS608802A (en) * 1983-06-29 1985-01-17 Agency Of Ind Science & Technol Manufacture of blazed grating
US6514576B1 (en) * 1999-03-11 2003-02-04 Agency Of Industrial Science And Technology Method of manufacturing a diffraction grating
CN102323633A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
CN102323635A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
CN102323634A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
CN102360093A (en) * 2011-10-19 2012-02-22 苏州大学 Holographic blazed grating manufacturing method
CN102540301A (en) * 2012-02-16 2012-07-04 苏州大学 Method for manufacturing convex-surface double-blazed grating
CN102540302A (en) * 2012-02-16 2012-07-04 苏州大学 Manufacturing method of convex blazed grating
CN103185908A (en) * 2011-12-30 2013-07-03 台湾超微光学股份有限公司 Hybrid diffraction grating, mold, and manufacturing method of diffraction grating and mold thereof
CN109669323A (en) * 2018-12-11 2019-04-23 中国科学院光电技术研究所 One kind realizing large area super resolution lithography method based on structure of resonant cavity
US10302486B2 (en) 2016-07-12 2019-05-28 Oto Photonics Inc. Spectrometer module and fabrication method thereof
CN110456435A (en) * 2019-08-23 2019-11-15 上海集成电路研发中心有限公司 A kind of holographic grating template and its preparation method

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS608802A (en) * 1983-06-29 1985-01-17 Agency Of Ind Science & Technol Manufacture of blazed grating
JPH0374362B2 (en) * 1983-06-29 1991-11-26
US6514576B1 (en) * 1999-03-11 2003-02-04 Agency Of Industrial Science And Technology Method of manufacturing a diffraction grating
EP1420274A1 (en) * 1999-03-11 2004-05-19 Agency Of Industrial Science And Technology Method of manufacturing a diffraction grating
WO2013056637A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic blazed grating
US9864113B2 (en) 2011-10-19 2018-01-09 Soochow University Method for manufacturing holographic blazed grating
CN102323634A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
CN102360093A (en) * 2011-10-19 2012-02-22 苏州大学 Holographic blazed grating manufacturing method
CN102323635A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
CN102323633A (en) * 2011-10-19 2012-01-18 苏州大学 A method of manufacturing a holographic double blazed grating
WO2013056627A1 (en) * 2011-10-19 2013-04-25 苏州大学 Method for manufacturing holographic bi-blazed grating
US9075194B2 (en) 2011-10-19 2015-07-07 Soochow University Method for manufacturing holographic bi-blazed grating
US10551531B2 (en) 2011-12-30 2020-02-04 Oto Photonics Inc. Hybrid diffraction grating, mold insert and manufacturing methods thereof
CN103185908A (en) * 2011-12-30 2013-07-03 台湾超微光学股份有限公司 Hybrid diffraction grating, mold, and manufacturing method of diffraction grating and mold thereof
CN102540302A (en) * 2012-02-16 2012-07-04 苏州大学 Manufacturing method of convex blazed grating
CN102540301A (en) * 2012-02-16 2012-07-04 苏州大学 Method for manufacturing convex-surface double-blazed grating
US10302486B2 (en) 2016-07-12 2019-05-28 Oto Photonics Inc. Spectrometer module and fabrication method thereof
CN109669323A (en) * 2018-12-11 2019-04-23 中国科学院光电技术研究所 One kind realizing large area super resolution lithography method based on structure of resonant cavity
CN109669323B (en) * 2018-12-11 2020-10-23 中国科学院光电技术研究所 A method for realizing large-area super-resolution lithography based on resonant cavity structure
CN110456435A (en) * 2019-08-23 2019-11-15 上海集成电路研发中心有限公司 A kind of holographic grating template and its preparation method
CN110456435B (en) * 2019-08-23 2021-10-01 上海集成电路研发中心有限公司 A kind of holographic grating template and preparation method thereof

Also Published As

Publication number Publication date
JPS612921B2 (en) 1986-01-29

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