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JPS55131730A - Concaved echelette grating and its process - Google Patents

Concaved echelette grating and its process

Info

Publication number
JPS55131730A
JPS55131730A JP3880279A JP3880279A JPS55131730A JP S55131730 A JPS55131730 A JP S55131730A JP 3880279 A JP3880279 A JP 3880279A JP 3880279 A JP3880279 A JP 3880279A JP S55131730 A JPS55131730 A JP S55131730A
Authority
JP
Japan
Prior art keywords
substrate
etching
film
concaved
grate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3880279A
Other languages
Japanese (ja)
Other versions
JPS6321128B2 (en
Inventor
Katsunobu Aoyanagi
Susumu Nanba
Kazuo Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
RIKEN
Original Assignee
Shimadzu Corp
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, RIKEN filed Critical Shimadzu Corp
Priority to JP3880279A priority Critical patent/JPS55131730A/en
Publication of JPS55131730A publication Critical patent/JPS55131730A/en
Publication of JPS6321128B2 publication Critical patent/JPS6321128B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To obtain an echelette grating with a single blaze angle by forming a lattice groove in a film provided on a concaved substrate, by making the grate- shaped film a mask for the substrate and by treating the substrate by ion or electron etching. CONSTITUTION:The film 3 is provided on the concaved grating substrate 2 and is coated with the photoresist 4. An interference fringe that is an original form of a diffraction grating is printed on the substrate, which is developed to leave the grate-shaped film 3. The film 3 plays a role of the mask in the ion or electron etching process. The etching rate is minimum when the process is performed in the direction perpendicular or approximately parallel to the incident direction of ions, and it is maximum in a face that makes a certain angle with the incident beam. Accordingly when the ion beam I is applied to the surface of the substrate at a proper angle beta as shown in Figure, the etching is carried out quickly in the direction perpendicular to the surface of substrate, and is carried out slowly in the direction perpendicular to the grate face, then the etching progresses as shown by (A), (B) and (C) in Figure, the asymmetric groove is formed. An alpha is a blaze angle.
JP3880279A 1979-03-31 1979-03-31 Concaved echelette grating and its process Granted JPS55131730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3880279A JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3880279A JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Publications (2)

Publication Number Publication Date
JPS55131730A true JPS55131730A (en) 1980-10-13
JPS6321128B2 JPS6321128B2 (en) 1988-05-02

Family

ID=12535420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3880279A Granted JPS55131730A (en) 1979-03-31 1979-03-31 Concaved echelette grating and its process

Country Status (1)

Country Link
JP (1) JPS55131730A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955221A (en) * 1997-11-21 1999-09-21 The Regents Of The University Of California Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
JP2008145898A (en) * 2006-12-13 2008-06-26 Shimadzu Corp Diffraction grating
JP2012141647A (en) * 2012-04-27 2012-07-26 Shimadzu Corp Diffraction grating manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038338A (en) * 1973-08-08 1975-04-09
JPS5540846A (en) * 1978-09-14 1980-03-22 Daishowa Eng Kk Dry crepe apparatus for making thin paper by assemblage of steel plate dryer and casted iron dryer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038338A (en) * 1973-08-08 1975-04-09
JPS5540846A (en) * 1978-09-14 1980-03-22 Daishowa Eng Kk Dry crepe apparatus for making thin paper by assemblage of steel plate dryer and casted iron dryer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5955221A (en) * 1997-11-21 1999-09-21 The Regents Of The University Of California Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
JP2008145898A (en) * 2006-12-13 2008-06-26 Shimadzu Corp Diffraction grating
JP2012141647A (en) * 2012-04-27 2012-07-26 Shimadzu Corp Diffraction grating manufacturing method

Also Published As

Publication number Publication date
JPS6321128B2 (en) 1988-05-02

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