JPS55128832A - Method of making minute pattern - Google Patents
Method of making minute patternInfo
- Publication number
- JPS55128832A JPS55128832A JP3664279A JP3664279A JPS55128832A JP S55128832 A JPS55128832 A JP S55128832A JP 3664279 A JP3664279 A JP 3664279A JP 3664279 A JP3664279 A JP 3664279A JP S55128832 A JPS55128832 A JP S55128832A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- make
- pitch
- patterns
- bmm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make an opening with a sharp edge when exposing a photosensitive material coated on the surface of a substrate, to light to make a prescribed pattern, by using diferent patterns and effecting overlap exposure.
CONSTITUTION: A pair of pattern chips 12a, 12b, each of which is Amm long in one side and Bmm long in the other, are placed in contact with each other on a reticle 1 to make an opening. The tips 12a, 12b are provided with main patterns 13a, 13b, which are made different from each other so that the prescribed square opening is not made until the main patterns are moved pitch by pitch and overlapped with each other. The paterns 13a, 13b are sequentially moved by a pitch of Bmm stepwise repeatedly to perform exposure to manufacture a master mask 14. Since the two different patterns 13a, 13b are overlapped with each other to make the single opening, the edge around the opening is not round but sharp.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3664279A JPS55128832A (en) | 1979-03-27 | 1979-03-27 | Method of making minute pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3664279A JPS55128832A (en) | 1979-03-27 | 1979-03-27 | Method of making minute pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55128832A true JPS55128832A (en) | 1980-10-06 |
Family
ID=12475493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3664279A Pending JPS55128832A (en) | 1979-03-27 | 1979-03-27 | Method of making minute pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55128832A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57106128A (en) * | 1980-12-24 | 1982-07-01 | Nec Corp | Forming method for pattern |
JPH06137341A (en) * | 1992-10-23 | 1994-05-17 | Daikin Mfg Co Ltd | Bent leaf spring and damper disk |
US6559956B2 (en) * | 1999-05-27 | 2003-05-06 | Xerox Corporation | Butted sensor array with supplemental chip in abutment region |
JP2007205039A (en) * | 2006-02-02 | 2007-08-16 | Taisei Corp | Anti-vibration floor structure |
-
1979
- 1979-03-27 JP JP3664279A patent/JPS55128832A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57106128A (en) * | 1980-12-24 | 1982-07-01 | Nec Corp | Forming method for pattern |
JPH06137341A (en) * | 1992-10-23 | 1994-05-17 | Daikin Mfg Co Ltd | Bent leaf spring and damper disk |
US6559956B2 (en) * | 1999-05-27 | 2003-05-06 | Xerox Corporation | Butted sensor array with supplemental chip in abutment region |
JP2007205039A (en) * | 2006-02-02 | 2007-08-16 | Taisei Corp | Anti-vibration floor structure |
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