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JPS564152A - Elecrtrophotographic copying paper - Google Patents

Elecrtrophotographic copying paper

Info

Publication number
JPS564152A
JPS564152A JP7915679A JP7915679A JPS564152A JP S564152 A JPS564152 A JP S564152A JP 7915679 A JP7915679 A JP 7915679A JP 7915679 A JP7915679 A JP 7915679A JP S564152 A JPS564152 A JP S564152A
Authority
JP
Japan
Prior art keywords
copying paper
sizing agent
pal
soluble binder
amide derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7915679A
Other languages
Japanese (ja)
Inventor
Iwao Honda
Koichi Moriya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Carlit Co Ltd
Original Assignee
Japan Carlit Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Carlit Co Ltd filed Critical Japan Carlit Co Ltd
Priority to JP7915679A priority Critical patent/JPS564152A/en
Publication of JPS564152A publication Critical patent/JPS564152A/en
Pending legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE: To obtain the captioned copying paper which is suited for offset printing original plate and is superior in printing endurance by forming the size layer to be interposed between substrate surface and photosensitive layer by the sizing agent composed of water-soluble binder and polyvinyl amide derivative.
CONSTITUTION: The polyvinyl amide derivative (PAL) of about 100W1,000 in the degree of polymerization in which the structure units shown by general formulas I, II, III, IV (R1, R2, R6 are H, methyl; R3, R4 are alkyl of C1W3; Z is alkylene of C2W6; M is H, alkali metal, ammonium salt; R5 is H, COOM; X is Cl, Br, I; Y is anion) are arrayed in linear form at proportions of molar ratios p, q, r, s [q/(p+ q)=0.1W1; r/(p+q+r+s)=0.001W0.1; s/r=0W5] respectively, is used. More specifically, the sizing agent composed of the above-mentioned PAL and water- soluble binder (starch, gelatine, etc.) is coated on the surface of the substrate which has undergone conduction treatment on the back side, to form the size layer, on which is then provided a photosensitive layer, whereby the copying paper is provided.
COPYRIGHT: (C)1981,JPO&Japio
JP7915679A 1979-06-25 1979-06-25 Elecrtrophotographic copying paper Pending JPS564152A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7915679A JPS564152A (en) 1979-06-25 1979-06-25 Elecrtrophotographic copying paper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7915679A JPS564152A (en) 1979-06-25 1979-06-25 Elecrtrophotographic copying paper

Publications (1)

Publication Number Publication Date
JPS564152A true JPS564152A (en) 1981-01-17

Family

ID=13682093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7915679A Pending JPS564152A (en) 1979-06-25 1979-06-25 Elecrtrophotographic copying paper

Country Status (1)

Country Link
JP (1) JPS564152A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262494A (en) * 1987-04-21 1988-10-28 Mitsubishi Metal Corp Plate processing method in electrolytic smelting
US5071723A (en) * 1989-07-13 1991-12-10 Canon Kabushiki Kaisha Electrophotographic photosensitive member with grafted polyamide interlayer
KR100680424B1 (en) 2004-06-18 2007-02-08 주식회사 하이닉스반도체 Water-soluble negative photoresist polymers and compositions comprising same
US7399570B2 (en) 2004-06-18 2008-07-15 Hynix Semiconductor Inc. Water-soluble negative photoresist polymer and composition containing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262494A (en) * 1987-04-21 1988-10-28 Mitsubishi Metal Corp Plate processing method in electrolytic smelting
US5071723A (en) * 1989-07-13 1991-12-10 Canon Kabushiki Kaisha Electrophotographic photosensitive member with grafted polyamide interlayer
KR100680424B1 (en) 2004-06-18 2007-02-08 주식회사 하이닉스반도체 Water-soluble negative photoresist polymers and compositions comprising same
US7399570B2 (en) 2004-06-18 2008-07-15 Hynix Semiconductor Inc. Water-soluble negative photoresist polymer and composition containing the same

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