JPS5641342A - Electrode material for sputtering ion pump - Google Patents
Electrode material for sputtering ion pumpInfo
- Publication number
- JPS5641342A JPS5641342A JP11577279A JP11577279A JPS5641342A JP S5641342 A JPS5641342 A JP S5641342A JP 11577279 A JP11577279 A JP 11577279A JP 11577279 A JP11577279 A JP 11577279A JP S5641342 A JPS5641342 A JP S5641342A
- Authority
- JP
- Japan
- Prior art keywords
- matrix
- electrode material
- ion pump
- intermetallic compounds
- sputtering ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 108010083687 Ion Pumps Proteins 0.000 title abstract 2
- 239000007772 electrode material Substances 0.000 title abstract 2
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 239000011159 matrix material Substances 0.000 abstract 5
- 229910052751 metal Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- 229910000765 intermetallic Inorganic materials 0.000 abstract 3
- 150000002739 metals Chemical class 0.000 abstract 3
- 229910052782 aluminium Inorganic materials 0.000 abstract 2
- 229910052790 beryllium Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Landscapes
- Heat Treatment Of Nonferrous Metals Or Alloys (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To obtain the titled material having remarkably increased H2 capturing capacity without lowering the capacity of capturing gases other than H2 by dispersing the phase of one or more kinds of intermetallic compounds each consisting of a matrix forming metal and one of Al, Be, Si, etc. in the matrix.
CONSTITUTION: The whole or at least part of the surface part of each of the anode and cathode or the cathode alone of a sputtering ion pump is made of material obtd. by dispersing the phase of one or more kinds of intermetallic compounds in Ti, Zr, Hf or their alloy as a matrix. The intermetallic compounds each consist of one of the matrix forming metals and Al, Be, Si, Ge, Sn or Cr. This electrode material is manufactured by heat treating one of the matrix forming metals and one of the additive metals in a vacuum or other atmosphere.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11577279A JPS5641342A (en) | 1979-09-11 | 1979-09-11 | Electrode material for sputtering ion pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11577279A JPS5641342A (en) | 1979-09-11 | 1979-09-11 | Electrode material for sputtering ion pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5641342A true JPS5641342A (en) | 1981-04-18 |
Family
ID=14670666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11577279A Pending JPS5641342A (en) | 1979-09-11 | 1979-09-11 | Electrode material for sputtering ion pump |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5641342A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6098218A (en) * | 1983-11-01 | 1985-06-01 | N D C Kk | Manufacture of bearing metal |
| US4730884A (en) * | 1982-09-30 | 1988-03-15 | Fujitsu Limited | Bipolar voltage controlled optical switch using intersecting waveguides |
| KR20180115679A (en) * | 2016-02-19 | 2018-10-23 | 사에스 게터스 에스.페.아. | A sintered non-porous cathode and a sputter ion vacuum pump containing the same |
-
1979
- 1979-09-11 JP JP11577279A patent/JPS5641342A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4730884A (en) * | 1982-09-30 | 1988-03-15 | Fujitsu Limited | Bipolar voltage controlled optical switch using intersecting waveguides |
| JPS6098218A (en) * | 1983-11-01 | 1985-06-01 | N D C Kk | Manufacture of bearing metal |
| JPS6330525B2 (en) * | 1983-11-01 | 1988-06-20 | Ndc Kk | |
| KR20180115679A (en) * | 2016-02-19 | 2018-10-23 | 사에스 게터스 에스.페.아. | A sintered non-porous cathode and a sputter ion vacuum pump containing the same |
| JP2019517094A (en) * | 2016-02-19 | 2019-06-20 | サエス・ゲッターズ・エッセ・ピ・ア | Sintered non-porous cathode and sputter ion vacuum pump including the same |
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