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JPS56146876A - Adhering method and apparatus - Google Patents

Adhering method and apparatus

Info

Publication number
JPS56146876A
JPS56146876A JP393381A JP393381A JPS56146876A JP S56146876 A JPS56146876 A JP S56146876A JP 393381 A JP393381 A JP 393381A JP 393381 A JP393381 A JP 393381A JP S56146876 A JPS56146876 A JP S56146876A
Authority
JP
Japan
Prior art keywords
adhering method
adhering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP393381A
Other languages
English (en)
Other versions
JPH036223B2 (ja
Inventor
Uiriamu Guriin Jiefuri
Harorirudo Reteinguton Aran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAT RES DEV
Original Assignee
NAT RES DEV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10510662&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS56146876(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by NAT RES DEV filed Critical NAT RES DEV
Publication of JPS56146876A publication Critical patent/JPS56146876A/ja
Publication of JPH036223B2 publication Critical patent/JPH036223B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Physical Vapour Deposition (AREA)
JP393381A 1980-01-16 1981-01-16 Adhering method and apparatus Granted JPS56146876A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8001383 1980-01-16

Publications (2)

Publication Number Publication Date
JPS56146876A true JPS56146876A (en) 1981-11-14
JPH036223B2 JPH036223B2 (ja) 1991-01-29

Family

ID=10510662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP393381A Granted JPS56146876A (en) 1980-01-16 1981-01-16 Adhering method and apparatus

Country Status (5)

Country Link
US (1) US4394400A (ja)
EP (1) EP0032788B2 (ja)
JP (1) JPS56146876A (ja)
DE (1) DE3167761D1 (ja)
GB (1) GB2069008B (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117868A (ja) * 1981-12-28 1983-07-13 Toshiba Corp 皮膜形成装置
JPS5930709A (ja) * 1982-08-13 1984-02-18 Toa Nenryo Kogyo Kk 炭素膜及び／又は炭素粒子の製造方法
JPS5966343A (ja) * 1982-10-08 1984-04-14 バ−・アンド・ストラウド・リミテツド 光学的被膜の製造方法
JPS61196538A (ja) * 1985-02-27 1986-08-30 Hitachi Ltd 真空処理方法及び装置
JP2010532919A (ja) * 2007-07-07 2010-10-14 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 高ニュートラル密度プラズマ注入を用いるコンフォーマルドーピング
WO2018123620A1 (ja) * 2016-12-28 2018-07-05 国立大学法人京都大学 被膜付き化合物および被膜付き化合物の製造方法

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GB7910479D0 (en) * 1979-03-26 1999-12-01 Secr Defence Camouflage
DE3175345D1 (en) * 1980-08-21 1986-10-23 Nat Res Dev Coating insulating materials by glow discharge
FR2514743B1 (fr) * 1981-10-21 1986-05-09 Rca Corp Pellicule amorphe a base de carbone, du type diamant, et son procede de fabrication
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
GB2119278B (en) * 1982-04-13 1987-04-15 Michael Paul Neary Improvements in or relating to a chemical method
GB2164581A (en) * 1982-04-13 1986-03-26 Michael Paul Neary Chemical method
GB2122224B (en) * 1982-06-23 1986-06-11 Atomic Energy Authority Uk Ion beam carbon layers
GB2165266B (en) * 1982-10-12 1987-09-23 Nat Res Dev Infra red transparent optical components
EP0106638A1 (en) * 1982-10-12 1984-04-25 National Research Development Corporation Method and apparatus for growing material in a glow discharge
DE3375700D1 (en) * 1982-10-12 1988-03-24 Nat Res Dev Infra red transparent optical components
US4704339A (en) * 1982-10-12 1987-11-03 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Infra-red transparent optical components
JPH0674504B2 (ja) * 1983-07-21 1994-09-21 キヤノン株式会社 堆積膜の製造方法
DE3335623A1 (de) * 1983-09-30 1985-04-11 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer kohlenstoff enthaltenden schicht, kohlenstoff enthaltende schicht, verwendung einer kohlenstoff enthaltenden schicht und vorrichtung zur durchfuehrung eines verfahrens zur herstellung einer kohlenstoff enthaltenden schicht
CA1235087A (en) * 1983-11-28 1988-04-12 Akio Hiraki Diamond-like thin film and method for making the same
GB2291888B (en) * 1984-06-08 1996-06-26 Barr & Stroud Ltd Optical coating
US4607193A (en) * 1984-10-10 1986-08-19 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Textured carbon surfaces on copper by sputtering
GB8431422D0 (en) * 1984-12-13 1985-01-23 Standard Telephones Cables Ltd Plasma reactor vessel
GB8504458D0 (en) * 1985-02-21 1985-03-27 Gen Eng Radcliffe Ltd Producing multi-layered coatings
GB2175016B (en) * 1985-05-11 1990-01-24 Barr & Stroud Ltd Optical coating
DE3664791D1 (en) * 1985-06-05 1989-09-07 Plessey Overseas Methods of depositing germanium carbide
EP0209972A1 (en) * 1985-06-05 1987-01-28 Plessey Overseas Limited Methods of depositing germanium hydrogen carbide
US4626448A (en) * 1985-07-18 1986-12-02 The United States Of America As Represented By The United States Department Of Energy Plasma deposition of amorphous metal alloys
DE3538261A1 (de) * 1985-10-28 1987-04-30 Battelle Institut E V Gegeneinander abdichtende ventilelemente fuer mischarmaturen
US4690830A (en) * 1986-02-18 1987-09-01 Solarex Corporation Activation by dehydrogenation or dehalogenation of deposition feedstock and dopant materials useful in the fabrication of hydrogenated amorphous silicon alloys for photovoltaic devices and other semiconductor devices
US4910153A (en) * 1986-02-18 1990-03-20 Solarex Corporation Deposition feedstock and dopant materials useful in the fabrication of hydrogenated amorphous silicon alloys for photovoltaic devices and other semiconductor devices
US4756964A (en) * 1986-09-29 1988-07-12 The Dow Chemical Company Barrier films having an amorphous carbon coating and methods of making
US4902531A (en) * 1986-10-30 1990-02-20 Nihon Shinku Gijutsu Kabushiki Kaisha Vacuum processing method and apparatus
US4926791A (en) * 1987-04-27 1990-05-22 Semiconductor Energy Laboratory Co., Ltd. Microwave plasma apparatus employing helmholtz coils and ioffe bars
GB8713922D0 (en) * 1987-06-15 1994-06-22 Secr Defence Infra red transparent windows
US4911795A (en) * 1987-08-14 1990-03-27 Morton Thiokol, Inc. Method of preserving a composite material cased solid propellant rocket motor
JPH03163820A (ja) * 1989-11-22 1991-07-15 Tokai Univ ダイヤモンドｎ型半導体およびダイヤモンドｐ―ｎ接合ダイオードの製造方法
DE69111493T2 (de) * 1990-03-12 1996-03-21 Ngk Insulators Ltd Wafer-Heizgeräte für Apparate, zur Halbleiterherstellung Heizanlage mit diesen Heizgeräten und Herstellung von Heizgeräten.
GB9019219D0 (en) * 1990-09-01 1990-10-17 Atomic Energy Authority Uk Diamond-like carbon coatings
US5397428A (en) * 1991-12-20 1995-03-14 The University Of North Carolina At Chapel Hill Nucleation enhancement for chemical vapor deposition of diamond
BE1006967A3 (fr) * 1993-04-16 1995-02-07 Cockerill Rech & Dev Procede pour la formation d'un revetement sur un substrat par pulverisation cathodique reactive.
EP0741584A1 (en) * 1994-02-01 1996-11-13 Howmedica Inc. Coated femoral stem prosthesis
US5688557A (en) * 1995-06-07 1997-11-18 Lemelson; Jerome H. Method of depositing synthetic diamond coatings with intermediates bonding layers
US5951773A (en) * 1996-03-18 1999-09-14 Hyundai Electronics Industries Co., Ltd. Inductively coupled plasma chemical vapor deposition apparatus
US6320261B1 (en) 1998-04-21 2001-11-20 Micron Technology, Inc. High aspect ratio metallization structures for shallow junction devices, and methods of forming the same
US6121134A (en) 1998-04-21 2000-09-19 Micron Technology, Inc. High aspect ratio metallization structures and processes for fabricating the same
ATE528421T1 (de) 2000-11-30 2011-10-15 Univ North Carolina State Verfahren zur herstellung von gruppe-iii- metallnitrid-materialien
US6787010B2 (en) 2000-11-30 2004-09-07 North Carolina State University Non-thermionic sputter material transport device, methods of use, and materials produced thereby
US7866343B2 (en) 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
US7866342B2 (en) 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US6904935B2 (en) 2002-12-18 2005-06-14 Masco Corporation Of Indiana Valve component with multiple surface layers
JP4660241B2 (ja) * 2005-03-25 2011-03-30 株式会社昭和真空 スパッタ装置
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
CN102426790B (zh) * 2011-08-21 2015-02-04 苏以捷 平面交叉路口通行控制系统和方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328576A (en) * 1976-08-13 1978-03-16 Nat Res Dev Surface coating process with cargonaceous material and apparatus therefor
JPS5419662A (en) * 1977-07-15 1979-02-14 Hitachi Ltd Forming method of plasma cvd film
JPS5468169A (en) * 1977-11-11 1979-06-01 Hitachi Ltd Plasma processor of capacitor type

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
GB1104935A (en) * 1964-05-08 1968-03-06 Standard Telephones Cables Ltd Improvements in or relating to a method of forming a layer of an inorganic compound
US3472751A (en) * 1965-06-16 1969-10-14 Ion Physics Corp Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
DE1621358A1 (de) * 1966-11-08 1971-04-29 Texas Instruments Inc Verfahren zur Aufbringung duenner Filme aus dielektrischem Material auf ein Substrat
US3471396A (en) * 1967-04-10 1969-10-07 Ibm R.f. cathodic sputtering apparatus having an electrically conductive housing
US3650737A (en) * 1968-03-25 1972-03-21 Ibm Imaging method using photoconductive element having a protective coating
US3600218A (en) * 1968-05-15 1971-08-17 Ibm Method for depositing insulating films of silicon nitride and aluminum nitride
JPS5123393B2 (ja) * 1972-10-03 1976-07-16
IT1203089B (it) * 1976-03-03 1989-02-15 Int Plasma Corp Procedimento ed apparecchiatura per eseguire reazioni chimiche nella regione della scarica luminescente di un plasma
DE2624005C2 (de) * 1976-05-28 1982-04-08 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zum Aufbringen von dünnen Schichten auf ein Substrat nach dem "Ion-plating"-Verfahren.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328576A (en) * 1976-08-13 1978-03-16 Nat Res Dev Surface coating process with cargonaceous material and apparatus therefor
JPS5419662A (en) * 1977-07-15 1979-02-14 Hitachi Ltd Forming method of plasma cvd film
JPS5468169A (en) * 1977-11-11 1979-06-01 Hitachi Ltd Plasma processor of capacitor type

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117868A (ja) * 1981-12-28 1983-07-13 Toshiba Corp 皮膜形成装置
JPS5930709A (ja) * 1982-08-13 1984-02-18 Toa Nenryo Kogyo Kk 炭素膜及び／又は炭素粒子の製造方法
JPH0333641B2 (ja) * 1982-08-13 1991-05-17 Tonen Kk
JPS5966343A (ja) * 1982-10-08 1984-04-14 バ−・アンド・ストラウド・リミテツド 光学的被膜の製造方法
JPS61196538A (ja) * 1985-02-27 1986-08-30 Hitachi Ltd 真空処理方法及び装置
JPH0476492B2 (ja) * 1985-02-27 1992-12-03 Hitachi Ltd
JP2010532919A (ja) * 2007-07-07 2010-10-14 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 高ニュートラル密度プラズマ注入を用いるコンフォーマルドーピング
WO2018123620A1 (ja) * 2016-12-28 2018-07-05 国立大学法人京都大学 被膜付き化合物および被膜付き化合物の製造方法

Also Published As

Publication number Publication date
EP0032788B1 (en) 1984-12-19
GB2069008B (en) 1984-09-12
US4394400A (en) 1983-07-19
EP0032788A1 (en) 1981-07-29
DE3167761D1 (en) 1985-01-31
EP0032788B2 (en) 1989-12-06
JPH036223B2 (ja) 1991-01-29
GB2069008A (en) 1981-08-19

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