JPS56131966A - Method for bonding semiconductor chip - Google Patents
Method for bonding semiconductor chipInfo
- Publication number
- JPS56131966A JPS56131966A JP3402180A JP3402180A JPS56131966A JP S56131966 A JPS56131966 A JP S56131966A JP 3402180 A JP3402180 A JP 3402180A JP 3402180 A JP3402180 A JP 3402180A JP S56131966 A JPS56131966 A JP S56131966A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- chip
- bonding
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Pressure Sensors (AREA)
- Die Bonding (AREA)
Abstract
PURPOSE:To perform the titled bonding without heat distortion when an Si monocrystal is bonded on the substrate having almost the same thermal expansion coefficient, by ion implanting additive materials on at least one of the two to convert into the glass of low softening point and heating for fluidizing. CONSTITUTION:The bonding surface 9 of a BSG group glass substrate is mirror finished. The vitreous composition of the subface layer is denatured to be formed into a glass layer 10 of a low melting point in the manner that: the additive ion with Pb, B as the main component and contains Zn, V, Al, Si and the like if necessary is implanted to the depth of several thousands Angstrom together with a suitable amount of O. Then, on the surface of the glass player 10, the bonding surface of the Si chip is abutted, fluidizing the glass layer 10 to bond the chip 1 with the substrate 4 closely. The amount of the additive ion to be implanted will freely control the softening point of the bonding layer and also select the temperature which does not deteriorate the chip. For the purpose of decreasing the thermal expansion coefficient, V, Zn, etc. are added while for effective improvement of hygroscopic property, the addition of Al, Si and the like is preferable.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3402180A JPS56131966A (en) | 1980-03-19 | 1980-03-19 | Method for bonding semiconductor chip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3402180A JPS56131966A (en) | 1980-03-19 | 1980-03-19 | Method for bonding semiconductor chip |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56131966A true JPS56131966A (en) | 1981-10-15 |
Family
ID=12402720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3402180A Pending JPS56131966A (en) | 1980-03-19 | 1980-03-19 | Method for bonding semiconductor chip |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56131966A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5887880A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Semiconductor diaphragm sensor |
US5034044A (en) * | 1988-05-11 | 1991-07-23 | General Electric Company | Method of bonding a silicon package for a power semiconductor device |
JP2008221252A (en) * | 2007-03-09 | 2008-09-25 | Kurosaki Harima Corp | Sliding nozzle device and plate used in the device |
JP2010514172A (en) * | 2006-12-22 | 2010-04-30 | パルス・エムイーエムエス・アンパルトセルスカブ | Microphone assembly using underfill agent with low coefficient of thermal expansion |
US8152033B2 (en) | 2007-03-09 | 2012-04-10 | Krosakiharima Corporation | Sliding nozzle device and plate used for the device |
-
1980
- 1980-03-19 JP JP3402180A patent/JPS56131966A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5887880A (en) * | 1981-11-20 | 1983-05-25 | Hitachi Ltd | Semiconductor diaphragm sensor |
US5034044A (en) * | 1988-05-11 | 1991-07-23 | General Electric Company | Method of bonding a silicon package for a power semiconductor device |
JP2010514172A (en) * | 2006-12-22 | 2010-04-30 | パルス・エムイーエムエス・アンパルトセルスカブ | Microphone assembly using underfill agent with low coefficient of thermal expansion |
JP2008221252A (en) * | 2007-03-09 | 2008-09-25 | Kurosaki Harima Corp | Sliding nozzle device and plate used in the device |
US8152033B2 (en) | 2007-03-09 | 2012-04-10 | Krosakiharima Corporation | Sliding nozzle device and plate used for the device |
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