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JPS56131928A - Method of electron beam exposure - Google Patents

Method of electron beam exposure

Info

Publication number
JPS56131928A
JPS56131928A JP3504880A JP3504880A JPS56131928A JP S56131928 A JPS56131928 A JP S56131928A JP 3504880 A JP3504880 A JP 3504880A JP 3504880 A JP3504880 A JP 3504880A JP S56131928 A JPS56131928 A JP S56131928A
Authority
JP
Japan
Prior art keywords
field
stage
electron beam
calculated
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3504880A
Other languages
Japanese (ja)
Other versions
JPS5821420B2 (en
Inventor
Tetsuo Yuasa
Hitoshi Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP3504880A priority Critical patent/JPS5821420B2/en
Publication of JPS56131928A publication Critical patent/JPS56131928A/en
Publication of JPS5821420B2 publication Critical patent/JPS5821420B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To sharply shorten the time needed for exposure by determining the amount and direction of stage movement and the width and direction of electron beam deflection, by twice stage movements. CONSTITUTION:The stage 8 is moved twice so that the mark on the first field of a chip on a wafer W is positioned at the right-lower side and the left-upper side of the deflection field, and the amount of stage movement and the coordinates attained by beam scanning of the mark are measured by an arithmetic circuit (inside CPU5). The conversion coefficient between the stage system and the field system is calculated from the results of measurement by this circuit. And also, the amount of stage movement in X and Y direction is calculated from coordinates of other marks in this field. Also, the width and direction of electron beam deflection are calculated. From results of these calculations, required pattern is drawn in the first field controlled by orders from CPU5. Hereon, drawings are made in the same way.
JP3504880A 1980-03-19 1980-03-19 Electron beam exposure method Expired JPS5821420B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3504880A JPS5821420B2 (en) 1980-03-19 1980-03-19 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3504880A JPS5821420B2 (en) 1980-03-19 1980-03-19 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS56131928A true JPS56131928A (en) 1981-10-15
JPS5821420B2 JPS5821420B2 (en) 1983-04-30

Family

ID=12431147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3504880A Expired JPS5821420B2 (en) 1980-03-19 1980-03-19 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5821420B2 (en)

Also Published As

Publication number Publication date
JPS5821420B2 (en) 1983-04-30

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