JPS56105661A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS56105661A JPS56105661A JP906180A JP906180A JPS56105661A JP S56105661 A JPS56105661 A JP S56105661A JP 906180 A JP906180 A JP 906180A JP 906180 A JP906180 A JP 906180A JP S56105661 A JPS56105661 A JP S56105661A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- resistance
- diffusion
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 238000000926 separation method Methods 0.000 abstract 2
- 230000002159 abnormal effect Effects 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To prevent a rupture of a transistor element caused when an abnormal voltage is applied to a resistance element by a method wherein when the transistor element and resistance element are formed on a same semiconductor device, the resistance element is formed in a region of high impurity density rather than in a base region of the transistor element. CONSTITUTION:An N<+> type region 10 for decreasing a collector series resistance is diffusion-formed in an NPN-transistor forming region of a P type Si substrate 9, and an N type layer 11 is epitaxially grown on the whole surface including the region 10. Then, the layer 11 is separated in island-shape by a P<+> type insulated separation region 12 reaching the substrate 9, and the P<+> type insulated separation region 12a made a groundwork of the resistance element is diffusion-formed in the same way in the island-shaped layer 11 until reaching the substrate 9. Thereafter, a P<+> type base region 13b is formed corresponded to a region 11a in the layer 11, a P type region 13a for steepening a backward yielding characteristic of a P-N junction of a resistance region being formed in the region 12a, an N<+> type emitter region 14b being diffusion-formed in the region 13b and a resistance element 14a of an N<+> type low resistance being diffusion-formed in the region 13a, respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP906180A JPS56105661A (en) | 1980-01-29 | 1980-01-29 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP906180A JPS56105661A (en) | 1980-01-29 | 1980-01-29 | Semiconductor integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56105661A true JPS56105661A (en) | 1981-08-22 |
JPH0368537B2 JPH0368537B2 (en) | 1991-10-28 |
Family
ID=11710093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP906180A Granted JPS56105661A (en) | 1980-01-29 | 1980-01-29 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56105661A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6086857A (en) * | 1983-10-19 | 1985-05-16 | Matsushita Electronics Corp | semiconductor integrated circuit |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5013076A (en) * | 1973-06-04 | 1975-02-10 | ||
JPS53140981A (en) * | 1977-04-27 | 1978-12-08 | Rca Corp | Ic protector |
JPS5496382A (en) * | 1978-01-17 | 1979-07-30 | Toshiba Corp | Semiconductor integrated circuit device |
-
1980
- 1980-01-29 JP JP906180A patent/JPS56105661A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5013076A (en) * | 1973-06-04 | 1975-02-10 | ||
JPS53140981A (en) * | 1977-04-27 | 1978-12-08 | Rca Corp | Ic protector |
JPS5496382A (en) * | 1978-01-17 | 1979-07-30 | Toshiba Corp | Semiconductor integrated circuit device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6086857A (en) * | 1983-10-19 | 1985-05-16 | Matsushita Electronics Corp | semiconductor integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JPH0368537B2 (en) | 1991-10-28 |
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