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JPS5556656A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5556656A
JPS5556656A JP13021378A JP13021378A JPS5556656A JP S5556656 A JPS5556656 A JP S5556656A JP 13021378 A JP13021378 A JP 13021378A JP 13021378 A JP13021378 A JP 13021378A JP S5556656 A JPS5556656 A JP S5556656A
Authority
JP
Japan
Prior art keywords
layer
voltage
collector
emitter
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13021378A
Other languages
Japanese (ja)
Inventor
Fumiyoshi Matsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP13021378A priority Critical patent/JPS5556656A/en
Publication of JPS5556656A publication Critical patent/JPS5556656A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE: To prevent damage due to high voltage between a collector and an emitter, by forming a constant-voltage diode by the junction of an inverted layer in the collector under a base electrode and a high concentration layer.
CONSTITUTION: An N+-layer 2 is provided in an N-type collector layer 1, and the concentration is adjusted. The breakdown voltage of a constant-voltage diode, which is formed by an inverted layer 3 resulted from the high-voltage application to the collector due to an inductance load and the layer 2, is made lower than the withstanding voltage between the collector and a base. Then, a P-type base layer 5 and an N+ emitter layer 6 are formed. A base electrode 4 is formed on an insulating film 7 along a portion of the layers 5 and 2, and an emitter electrode 8 is formed at the same time. Thereafter, lead wires 9 and 10 are attached, and a collector electrode 11 is attached to the layer 1. In this constitution, since the collector voltage is limited by the sum of the breakdown voltage of the constant voltage diode and the threshold voltage between the base and emitter, the transistor is not damaged by inverse high voltages.
COPYRIGHT: (C)1980,JPO&Japio
JP13021378A 1978-10-23 1978-10-23 Semiconductor device Pending JPS5556656A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13021378A JPS5556656A (en) 1978-10-23 1978-10-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13021378A JPS5556656A (en) 1978-10-23 1978-10-23 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5556656A true JPS5556656A (en) 1980-04-25

Family

ID=15028786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13021378A Pending JPS5556656A (en) 1978-10-23 1978-10-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5556656A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58500679A (en) * 1981-05-06 1983-04-28 ロ−ベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング planar transistor structure
JPS58111369A (en) * 1981-12-24 1983-07-02 Nippon Denso Co Ltd semiconductor equipment
JPS58134467A (en) * 1982-02-05 1983-08-10 Nippon Denso Co Ltd semiconductor equipment
US5596217A (en) * 1981-12-24 1997-01-21 Nippondenso Co., Ltd. Semiconductor device including overvoltage protection diode

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58500679A (en) * 1981-05-06 1983-04-28 ロ−ベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング planar transistor structure
JPS58111369A (en) * 1981-12-24 1983-07-02 Nippon Denso Co Ltd semiconductor equipment
JPH0312458B2 (en) * 1981-12-24 1991-02-20 Nippon Denso Co
US5596217A (en) * 1981-12-24 1997-01-21 Nippondenso Co., Ltd. Semiconductor device including overvoltage protection diode
JPS58134467A (en) * 1982-02-05 1983-08-10 Nippon Denso Co Ltd semiconductor equipment

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