JPS5543822A - Semiconductor light emission device - Google Patents
Semiconductor light emission deviceInfo
- Publication number
- JPS5543822A JPS5543822A JP11628778A JP11628778A JPS5543822A JP S5543822 A JPS5543822 A JP S5543822A JP 11628778 A JP11628778 A JP 11628778A JP 11628778 A JP11628778 A JP 11628778A JP S5543822 A JPS5543822 A JP S5543822A
- Authority
- JP
- Japan
- Prior art keywords
- light
- layer
- absorbing
- semiconductor
- absorbing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 1
- 230000010355 oscillation Effects 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0281—Coatings made of semiconductor materials
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To conduct single laser oscillation, without allowing threshold value current density and radiation strength to increase, by forming a light-absorbing layer narrowing gain width by absorbing light from a part of the band region of the light naturally radiating onto a light radiation surface. CONSTITUTION:A light-absorbing layer 8, which narrowa a gain width by absorbing a part of naturally radiated light, is formed on at least one side of mirror surface which is to become a light-radiating surface of a semiconductor laser which is composed of s base board 1, a clad layer 2, on active layer 3, a clad layer 4, a cap layer 5 and metallic electrodes 6 and 7. While a colored glass or a semiconductor is to be used for this absorbing layer 8, if there is a fear of causing leak in the case of using a semiconductor, the absorbing layer 8 may be used in such a structure as to be sandwitched between silicon dioxide layers 9 and 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11628778A JPS5543822A (en) | 1978-09-21 | 1978-09-21 | Semiconductor light emission device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11628778A JPS5543822A (en) | 1978-09-21 | 1978-09-21 | Semiconductor light emission device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5543822A true JPS5543822A (en) | 1980-03-27 |
Family
ID=14683313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11628778A Pending JPS5543822A (en) | 1978-09-21 | 1978-09-21 | Semiconductor light emission device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5543822A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5721752A (en) * | 1995-12-15 | 1998-02-24 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser device |
WO2011023551A1 (en) * | 2009-08-26 | 2011-03-03 | Nanoplus Gmbh Nanosystems And Technologies | Semiconductor laser with absorber applied to a laser mirror |
-
1978
- 1978-09-21 JP JP11628778A patent/JPS5543822A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5721752A (en) * | 1995-12-15 | 1998-02-24 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser device |
WO2011023551A1 (en) * | 2009-08-26 | 2011-03-03 | Nanoplus Gmbh Nanosystems And Technologies | Semiconductor laser with absorber applied to a laser mirror |
US8879599B2 (en) | 2009-08-26 | 2014-11-04 | Nanoplus Gmbh Nanosystems And Technologies | Semiconductor laser with absorber applied to a laser mirror |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5726487A (en) | Semiconductor laser device | |
JPS5548926A (en) | Preparation of semiconductor device | |
JPS57130490A (en) | Semiconductor laser device | |
JPS5511310A (en) | Semiconductor laser element | |
JPS53112682A (en) | Photo thyristor | |
JPS5269285A (en) | Semiconductor laser device | |
JPS5543822A (en) | Semiconductor light emission device | |
JPS5366192A (en) | Oscillation wavelength stabilization method of semiconductor laser | |
JPS55108789A (en) | Semiconductor laser | |
JPS577984A (en) | Semiconductor light emitting device | |
JPS5727092A (en) | Semiconductor laser device | |
JPS6484776A (en) | Semiconductor laser | |
JPS5669879A (en) | Semiconductor luminous device with lens | |
JPS5713780A (en) | Manufacture of photodetector | |
JPS5643794A (en) | Semiconductor laser | |
JPS5425686A (en) | Semiconductor junction laser | |
JPS56112783A (en) | Semiconductor laser | |
JPS55107289A (en) | Semiconductor laser device | |
JPS57112090A (en) | Semiconductor laser | |
Krynicki | Annealing of ion implanted layers by laser beam | |
JPS57157587A (en) | Semiconductor laser device | |
JPS52112292A (en) | Semiconductor laser unit and its use | |
JPS55162289A (en) | Implanting type laser | |
JPS55153385A (en) | Current squeezing type semiconductor device | |
JPS5518037A (en) | Semiconductor laser |