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JPS5542231A - Reduced pressure vapor phase growing device - Google Patents

Reduced pressure vapor phase growing device

Info

Publication number
JPS5542231A
JPS5542231A JP11395078A JP11395078A JPS5542231A JP S5542231 A JPS5542231 A JP S5542231A JP 11395078 A JP11395078 A JP 11395078A JP 11395078 A JP11395078 A JP 11395078A JP S5542231 A JPS5542231 A JP S5542231A
Authority
JP
Japan
Prior art keywords
vapor phase
horizontal type
substrates
semiconductor substrates
growing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11395078A
Other languages
Japanese (ja)
Inventor
Yukinobu Tanno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP11395078A priority Critical patent/JPS5542231A/en
Publication of JPS5542231A publication Critical patent/JPS5542231A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To enable many semiconductor substrates to be treated to grow films of superior uniformity in a horizontal type vapor phase growing device by setting a plurality of reaction chambers connected to the same system in the device.
CONSTITUTION: The horizontal type vapor phase growing device for growing semiconductor substrates by vapor phase reaction mainly consists of a plurality of horizontal type quartz reaction furnaces 1, 1', substrate mounting holders 14, and heaters 3. Silicon substrates 4, 4' are stood upright on quartz holders 14 in parallel with gas currents introduced from feed gas inlets 5, 6, 7, 8, and substrates 4, 4' are heated with heaters 3 to induce reduced press. vapor phase epitaxial growth while evacuating the device through exhaust port 9. Thus, epitaxial thin films of superior uniformity are obtd., and many semiconductor substrates can be treated.
COPYRIGHT: (C)1980,JPO&Japio
JP11395078A 1978-09-14 1978-09-14 Reduced pressure vapor phase growing device Pending JPS5542231A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11395078A JPS5542231A (en) 1978-09-14 1978-09-14 Reduced pressure vapor phase growing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11395078A JPS5542231A (en) 1978-09-14 1978-09-14 Reduced pressure vapor phase growing device

Publications (1)

Publication Number Publication Date
JPS5542231A true JPS5542231A (en) 1980-03-25

Family

ID=14625261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11395078A Pending JPS5542231A (en) 1978-09-14 1978-09-14 Reduced pressure vapor phase growing device

Country Status (1)

Country Link
JP (1) JPS5542231A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5772317A (en) * 1980-10-24 1982-05-06 Semiconductor Energy Lab Co Ltd Manufacture of covering film
JPS61163717U (en) * 1985-03-30 1986-10-11
JPS6254011U (en) * 1985-09-26 1987-04-03
JPH02129584U (en) * 1989-03-29 1990-10-25
US6698243B1 (en) 1998-12-03 2004-03-02 Nippon Sheet Glass Co., Ltd. Method and apparatus for manufacturing bent glass sheet

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5772317A (en) * 1980-10-24 1982-05-06 Semiconductor Energy Lab Co Ltd Manufacture of covering film
JPH0325929B2 (en) * 1980-10-24 1991-04-09 Handotai Energy Kenkyusho
JPS61163717U (en) * 1985-03-30 1986-10-11
JPH0513615Y2 (en) * 1985-03-30 1993-04-12
JPS6254011U (en) * 1985-09-26 1987-04-03
JPH02129584U (en) * 1989-03-29 1990-10-25
JPH0645030Y2 (en) * 1989-03-29 1994-11-16 アイシン精機株式会社 Wind Regulator Device
US6698243B1 (en) 1998-12-03 2004-03-02 Nippon Sheet Glass Co., Ltd. Method and apparatus for manufacturing bent glass sheet

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