[go: up one dir, main page]

JPS5519881A - Fieldeffect transistor - Google Patents

Fieldeffect transistor

Info

Publication number
JPS5519881A
JPS5519881A JP9293278A JP9293278A JPS5519881A JP S5519881 A JPS5519881 A JP S5519881A JP 9293278 A JP9293278 A JP 9293278A JP 9293278 A JP9293278 A JP 9293278A JP S5519881 A JPS5519881 A JP S5519881A
Authority
JP
Japan
Prior art keywords
recess
gate
electrode
drain
center section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9293278A
Other languages
Japanese (ja)
Inventor
Michihiro Kobiki
Manabu Watase
Yasuro Mitsui
Mutsuyuki Otsubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9293278A priority Critical patent/JPS5519881A/en
Publication of JPS5519881A publication Critical patent/JPS5519881A/en
Pending legal-status Critical Current

Links

Landscapes

  • Junction Field-Effect Transistors (AREA)

Abstract

PURPOSE: To obtain a shot key barrier gate FET that has high withstand voltage and performance characteristics by forming a recess in the center section of an active layer that is located between a source electrode and a drain electrode, and providing a gate electrode at the bottom of the recess.
CONSTITUTION: An active layer 2a is grown on a semiinsulating GaAs substrate 1. Then a source electrode 3 and a drain electrode 4 are covered on the layer 2a with a given interval. Making use of these electrodes as a mask, the first recess 6 is formed by means of etching. Another recess 7 is etched in the center section of the recess 6 with a resistor film 8 as a mask that has a hole which corresponds to the center section of the recess 6, thus further reducing the thickness of the layer 2a. Then a gate electrode 5a is covered on the bottom of the recess 7. By so doing, withstand gate voltage and drain voltage are increased, as well as resistance between the source and gate, and resistance between the gate and drain are reduced, thus improving high frequency characteristics.
COPYRIGHT: (C)1980,JPO&Japio
JP9293278A 1978-07-28 1978-07-28 Fieldeffect transistor Pending JPS5519881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9293278A JPS5519881A (en) 1978-07-28 1978-07-28 Fieldeffect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9293278A JPS5519881A (en) 1978-07-28 1978-07-28 Fieldeffect transistor

Publications (1)

Publication Number Publication Date
JPS5519881A true JPS5519881A (en) 1980-02-12

Family

ID=14068257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9293278A Pending JPS5519881A (en) 1978-07-28 1978-07-28 Fieldeffect transistor

Country Status (1)

Country Link
JP (1) JPS5519881A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251502A (en) * 1985-04-30 1986-11-08 Jgc Corp Treatment of waste sulfuric acid
JPS63173330A (en) * 1986-11-17 1988-07-16 モトローラ・インコーポレーテッド Slant contact etching
JPH01187978A (en) * 1988-01-22 1989-07-27 Mitsubishi Electric Corp Field-effect transistor
EP0332373A2 (en) * 1988-03-09 1989-09-13 Exxon Research And Engineering Company Process for removing sulfur moieties from claus tail-gas
JPH023938A (en) * 1988-06-20 1990-01-09 Mitsubishi Electric Corp Field effect transistor
JPH047844A (en) * 1990-04-25 1992-01-13 Mitsubishi Electric Corp Semiconductor device
US8933497B2 (en) 2009-05-19 2015-01-13 Murata Manufacturing Co., Ltd. Semiconductor switch device and method of manufacturing semiconductor switch device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251502A (en) * 1985-04-30 1986-11-08 Jgc Corp Treatment of waste sulfuric acid
JPS63173330A (en) * 1986-11-17 1988-07-16 モトローラ・インコーポレーテッド Slant contact etching
JPH01187978A (en) * 1988-01-22 1989-07-27 Mitsubishi Electric Corp Field-effect transistor
EP0332373A2 (en) * 1988-03-09 1989-09-13 Exxon Research And Engineering Company Process for removing sulfur moieties from claus tail-gas
JPH023938A (en) * 1988-06-20 1990-01-09 Mitsubishi Electric Corp Field effect transistor
JPH047844A (en) * 1990-04-25 1992-01-13 Mitsubishi Electric Corp Semiconductor device
US8933497B2 (en) 2009-05-19 2015-01-13 Murata Manufacturing Co., Ltd. Semiconductor switch device and method of manufacturing semiconductor switch device
JP5652392B2 (en) * 2009-05-19 2015-01-14 株式会社村田製作所 Semiconductor switch device and method of manufacturing semiconductor switch device

Similar Documents

Publication Publication Date Title
JPS56125868A (en) Thin-film semiconductor device
JPS6482676A (en) Iii-v compound semiconductor field-effect transistor and manufacture thereof
JPS57176772A (en) Semiconductor device and manufacture thereof
JPS5519881A (en) Fieldeffect transistor
JPS56155531A (en) Manufacture of semiconductor device
JPS5676577A (en) Gaas schottky gate field effect transistor
JPS6472567A (en) Manufacture of semiconductor device
JPS5676571A (en) Mos field effect transistor and manufacture thereof
JPS53125777A (en) Manufacture for field effect transistor
JPS5643768A (en) Fet transistor and method of producing the same
JPS5291382A (en) Insulating gate type field effect transistor
JPS6431471A (en) Semiconductor device
JPS52100877A (en) Field effect transistor of junction type
JPS5287990A (en) Semiconductor device
JPS5650572A (en) Field effect transistor and manufacture thereof
JPS6439065A (en) Thin film field-effect transistor
JPS5632723A (en) Semiconductor device
JPS5721866A (en) Manufacture of insulated gate type field effect transistor
JPS57154877A (en) Schottky barrier gate type field effect transistor
JPS5586164A (en) Manufacture of crossover gate type field-effect transistor
JPS53135582A (en) Semiconductor device and its manufacture
JPS55162270A (en) Semiconductor device
JPS647571A (en) Manufacture of semiconductor device
JPS57202782A (en) Formation of gate electrode
JPS5730377A (en) Semiconductor device and manufacture thereof