JPS55166954A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS55166954A JPS55166954A JP7500479A JP7500479A JPS55166954A JP S55166954 A JPS55166954 A JP S55166954A JP 7500479 A JP7500479 A JP 7500479A JP 7500479 A JP7500479 A JP 7500479A JP S55166954 A JPS55166954 A JP S55166954A
- Authority
- JP
- Japan
- Prior art keywords
- type
- epitaxial layer
- high density
- coated
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 5
- 229910052710 silicon Inorganic materials 0.000 abstract 5
- 239000010703 silicon Substances 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 4
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To form a semiconductor device in a method of fabricating it easily and stably by connecting the grounding electrode of a transistor element through a metallic wiring layer directly electrically to a semiconductor substrate. CONSTITUTION:A low density P-type silicon epitaxial layer 2 having an opening exposing the silicon substrate 1 is formed partly on the high density P-type silicon substrate 1, and a mesa high density N-type silicon epitaxial layer 3 and a low density N-type epitaxial layer 4 are formed thereon. P-type resion 4' and high density N-type region are formed on an epitaxial layer 4. A source electrode is coated on the N-type high density region, and a gate electrode 5 is coated on the P-type region 4'. Drain electrodes 7, 8 are coated on the epitaxial layer 3, and connected to bonding pads 14, 15. The gate electrodes 5 is connected to the bonding pad 11, and the source electrode 6 is connected from the back surface electrode 10 on the back surface of the silicon substrate 1 to the external circuit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7500479A JPS55166954A (en) | 1979-06-14 | 1979-06-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7500479A JPS55166954A (en) | 1979-06-14 | 1979-06-14 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55166954A true JPS55166954A (en) | 1980-12-26 |
Family
ID=13563610
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7500479A Pending JPS55166954A (en) | 1979-06-14 | 1979-06-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55166954A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009038392A (en) * | 2003-05-15 | 2009-02-19 | Panasonic Corp | Semiconductor device |
-
1979
- 1979-06-14 JP JP7500479A patent/JPS55166954A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009038392A (en) * | 2003-05-15 | 2009-02-19 | Panasonic Corp | Semiconductor device |
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