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JPS55133537A - Temperature controlling device for electron beam appliance - Google Patents

Temperature controlling device for electron beam appliance

Info

Publication number
JPS55133537A
JPS55133537A JP4109779A JP4109779A JPS55133537A JP S55133537 A JPS55133537 A JP S55133537A JP 4109779 A JP4109779 A JP 4109779A JP 4109779 A JP4109779 A JP 4109779A JP S55133537 A JPS55133537 A JP S55133537A
Authority
JP
Japan
Prior art keywords
cover plate
conductor
heating
temperature
outside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4109779A
Other languages
Japanese (ja)
Inventor
Tomohiro Kuni
Nobuhiko Aoki
Yukio Kenbo
Kazushi Yoshimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4109779A priority Critical patent/JPS55133537A/en
Publication of JPS55133537A publication Critical patent/JPS55133537A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Temperature (AREA)

Abstract

PURPOSE:To keep a uniform temperature at the section surrounded by a cover plate by providing a cover plate covering the sample room and its supporting structure so that the main heating source is located on the outside of the cover plate, and by controlling the heating power of the heating element with the output temperature detecting substance provided on the cover plate. CONSTITUTION:A cylinder 4 to be used as a heating source, a driving motor 6, a diffusion pump 8 and the like are provided on the outside of the cover plate 13 consisting of a good conductor of heat made of metal or the like. A sample room 7, a base plate 10 and a leg 11 etc. are covered by the cover plate 13 maintaining a proper gap G, and conductors 14 and 15 are pasted in zigzags and in parallel with a proper gap between them inside the cover plate 13. Then the cover plate is heated by applying an electrical current to a conductor 14, thereby heating the cover plate 13, the change in resistance due to variation of temperature of the other conductor 15 is detected, and the interior temperature of the cover plate 13 can be kept uniformly by giving a feed back on the current value spplied to the conductor 14.
JP4109779A 1979-04-06 1979-04-06 Temperature controlling device for electron beam appliance Pending JPS55133537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4109779A JPS55133537A (en) 1979-04-06 1979-04-06 Temperature controlling device for electron beam appliance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4109779A JPS55133537A (en) 1979-04-06 1979-04-06 Temperature controlling device for electron beam appliance

Publications (1)

Publication Number Publication Date
JPS55133537A true JPS55133537A (en) 1980-10-17

Family

ID=12598969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4109779A Pending JPS55133537A (en) 1979-04-06 1979-04-06 Temperature controlling device for electron beam appliance

Country Status (1)

Country Link
JP (1) JPS55133537A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5815232A (en) * 1981-07-20 1983-01-28 Toshiba Corp Apparatus for exposing charged particle beam
CN107885253A (en) * 2017-11-21 2018-04-06 中国工程物理研究院电子工程研究所 A kind of precise temperature control device for the experiment of semiconductor devices dose rate effect

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5815232A (en) * 1981-07-20 1983-01-28 Toshiba Corp Apparatus for exposing charged particle beam
JPS634698B2 (en) * 1981-07-20 1988-01-30 Tokyo Shibaura Electric Co
CN107885253A (en) * 2017-11-21 2018-04-06 中国工程物理研究院电子工程研究所 A kind of precise temperature control device for the experiment of semiconductor devices dose rate effect
CN107885253B (en) * 2017-11-21 2024-05-03 中国工程物理研究院电子工程研究所 Precise temperature control device for semiconductor device dose rate effect experiment

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