JPS55125276A - Controlling unit for etching - Google Patents
Controlling unit for etchingInfo
- Publication number
- JPS55125276A JPS55125276A JP3275679A JP3275679A JPS55125276A JP S55125276 A JPS55125276 A JP S55125276A JP 3275679 A JP3275679 A JP 3275679A JP 3275679 A JP3275679 A JP 3275679A JP S55125276 A JPS55125276 A JP S55125276A
- Authority
- JP
- Japan
- Prior art keywords
- light
- etching
- etched
- transparent substrate
- detecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE:To make possible uniform, correct, fine processing without causing variation, by setting an etching means, a light-irradiating means, and a light-detecting means etc. to a material to be etched which is mounted on a transparent substrate, and by controlling the etching time according to the output of the light- detecting means. CONSTITUTION:Over a metallic, inorg., or org. material 2 to be etched, which is mounted on a transparent substrate 1, and on which are placed resists 3 of prescribed shapes, are installed a spraying means for the etching fluid 4 (immersion type may also be available), an irradiating means for light 5 etc., and under the substrate 1 are arranged light-detecting means 6, 7, 8 etc. The material 2 is etched with etchig soln. 4 little by little, and the parts where the material 2 has been removed is detected with the light 5' having permeated through the transparent substrate 1 by means of the detecting elements 6-8. Plates 9 for intercepting the etching fluid 4 injecting on the parts described above according to the output of the detecting element 6-8 are installed above the material 2 to be etched. Etching is successively conducted to remove the material 2 to be etched uniformly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3275679A JPS55125276A (en) | 1979-03-20 | 1979-03-20 | Controlling unit for etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3275679A JPS55125276A (en) | 1979-03-20 | 1979-03-20 | Controlling unit for etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55125276A true JPS55125276A (en) | 1980-09-26 |
Family
ID=12367679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3275679A Pending JPS55125276A (en) | 1979-03-20 | 1979-03-20 | Controlling unit for etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55125276A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0611483A1 (en) * | 1991-11-07 | 1994-08-24 | ATOTECH USA INC. (a Delaware corp.) | Method and apparatus for controlled spray etching |
-
1979
- 1979-03-20 JP JP3275679A patent/JPS55125276A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0611483A1 (en) * | 1991-11-07 | 1994-08-24 | ATOTECH USA INC. (a Delaware corp.) | Method and apparatus for controlled spray etching |
EP0611483A4 (en) * | 1991-11-07 | 1995-05-03 | Chemcut Corp | Method and apparatus for controlled spray etching. |
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