JPS55123139A - Integrated circuit device - Google Patents
Integrated circuit deviceInfo
- Publication number
- JPS55123139A JPS55123139A JP3023379A JP3023379A JPS55123139A JP S55123139 A JPS55123139 A JP S55123139A JP 3023379 A JP3023379 A JP 3023379A JP 3023379 A JP3023379 A JP 3023379A JP S55123139 A JPS55123139 A JP S55123139A
- Authority
- JP
- Japan
- Prior art keywords
- pad
- width
- pattern
- potential
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004020 conductor Substances 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Abstract
PURPOSE:To measure width of a slender conductor pattern easily without using a layer resistance by a method wherein a wide pattern is connected in series to a parallel-connected slender conductor pattern, and a pad for potential measuring and voltage feeding is provided at each contact and the pattern end. CONSTITUTION:There are a conductor W1 in width and L1 in length and another conductor W2 in width and L2 in length on an insulating film of a semiconductor substrate, an Al common potential measuring pad 24 is provided through a window opened on the insulating film, and voltage feeding pads 23, 25 are provided on the other ends of both conductors. The pad 25 is earthed and when +10V is applied on the pad 23, a potential of the pad 24 is obtained at VX<R2/(R1+R2)X10. Where a layer resistance is rhoS, R1=rhoSXL1/W1 and R2=rhoSXL2/W2, and VX has nothing to do with rhoS. To maximize a change of VX against width fluctuation DELTAW, VX at a design center value will have to be selected at 1/2 of the voltage on both ends with R1=R2. According to this method, potential of the pad 24 is measured on an automatic measuring equipment to obtain a discrepancy of the pattern width easily, thus serving for production management.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3023379A JPS55123139A (en) | 1979-03-15 | 1979-03-15 | Integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3023379A JPS55123139A (en) | 1979-03-15 | 1979-03-15 | Integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55123139A true JPS55123139A (en) | 1980-09-22 |
JPS6157698B2 JPS6157698B2 (en) | 1986-12-08 |
Family
ID=12297987
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3023379A Granted JPS55123139A (en) | 1979-03-15 | 1979-03-15 | Integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55123139A (en) |
-
1979
- 1979-03-15 JP JP3023379A patent/JPS55123139A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6157698B2 (en) | 1986-12-08 |
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