JPS55110126A - Preparation of antireflection film - Google Patents
Preparation of antireflection filmInfo
- Publication number
- JPS55110126A JPS55110126A JP1764979A JP1764979A JPS55110126A JP S55110126 A JPS55110126 A JP S55110126A JP 1764979 A JP1764979 A JP 1764979A JP 1764979 A JP1764979 A JP 1764979A JP S55110126 A JPS55110126 A JP S55110126A
- Authority
- JP
- Japan
- Prior art keywords
- film
- ionized
- antireflection film
- substance
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 239000000126 substance Substances 0.000 abstract 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229920003002 synthetic resin Polymers 0.000 abstract 2
- 239000000057 synthetic resin Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 230000000694 effects Effects 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000003475 lamination Methods 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To obtain an antireflection film of the lamination type, having improved antireflection effect and durability, by evaporating a film-forming substance in a vacuum vessel under heating, and by applying the ionized substance to a transparent optical synthetic resin part at a negative potential.
CONSTITUTION: A film-forming substance is evaporated in the vacuum deposition vessel 1 at a pressure ≤ 5×10-5 Torr evacuated by the exhaust system 2 with the electron beam heating evaporation source 3, and ionized by the discharge electrode 4, connected to the radio frequency power source 5, near the source 3. The ionized substance is then accelerated and applied to the base board 7 (transparent optical synthetic resin part) attached to the support 6 at a negative potential to form an antireflection film comprision low-refractive index layers, e.g. SiO2, and high-refractive index layers, e.g. ZrO2, on a hard surface layer (SiO2 or glass 1W 10μm thick) alternately.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1764979A JPS55110126A (en) | 1979-02-16 | 1979-02-16 | Preparation of antireflection film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1764979A JPS55110126A (en) | 1979-02-16 | 1979-02-16 | Preparation of antireflection film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55110126A true JPS55110126A (en) | 1980-08-25 |
JPS6149387B2 JPS6149387B2 (en) | 1986-10-29 |
Family
ID=11949694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1764979A Granted JPS55110126A (en) | 1979-02-16 | 1979-02-16 | Preparation of antireflection film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55110126A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60225101A (en) * | 1984-04-23 | 1985-11-09 | Minolta Camera Co Ltd | Optical member made of plastics |
JPS6243601A (en) * | 1985-08-22 | 1987-02-25 | Kyowa Gas Chem Ind Co Ltd | Formation of multilayered reflection preventive film of optical parts made of synthetic resin |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114882U (en) * | 1990-03-09 | 1991-11-26 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50118978A (en) * | 1974-03-04 | 1975-09-18 | ||
JPS50148285A (en) * | 1974-05-02 | 1975-11-27 | ||
JPS51117984A (en) * | 1975-04-10 | 1976-10-16 | Matsushita Electric Ind Co Ltd | Ionization plating apparatus |
-
1979
- 1979-02-16 JP JP1764979A patent/JPS55110126A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50118978A (en) * | 1974-03-04 | 1975-09-18 | ||
JPS50148285A (en) * | 1974-05-02 | 1975-11-27 | ||
JPS51117984A (en) * | 1975-04-10 | 1976-10-16 | Matsushita Electric Ind Co Ltd | Ionization plating apparatus |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60225101A (en) * | 1984-04-23 | 1985-11-09 | Minolta Camera Co Ltd | Optical member made of plastics |
JPS6243601A (en) * | 1985-08-22 | 1987-02-25 | Kyowa Gas Chem Ind Co Ltd | Formation of multilayered reflection preventive film of optical parts made of synthetic resin |
Also Published As
Publication number | Publication date |
---|---|
JPS6149387B2 (en) | 1986-10-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5842003A (en) | Polarizing plate | |
JPS55110126A (en) | Preparation of antireflection film | |
JPS5619030A (en) | Production of liquid crystal display element | |
JPS5761644A (en) | Cover glass having diamond coating layer and its preparation | |
JPS54141111A (en) | Method and apparatus for production of magnetic recording medium | |
CA2103085A1 (en) | Method for Preparing Superconducting Thin Film Formed of High Temperature Superconductor Oxide | |
JPS5633475A (en) | Manufacture of exterior ornamental parts | |
JPS6443915A (en) | Manufacture of superconductive material | |
JPS6462458A (en) | Thin titanium oxide film | |
JPS5288600A (en) | Production of titanium oxide film | |
JPS5657001A (en) | Reflection preventing film | |
JPS5591971A (en) | Thin film forming method | |
JPS5572031A (en) | Electron beam contraction projection exposure device | |
JPS5341240A (en) | Production of thin film optical waveguide | |
JPS57833A (en) | Target for image pick-up tube | |
JPS559502A (en) | Substrate for electrophotographic material | |
JPS5795050A (en) | Output surface for x ray fluorescence-intensifier tube and its production | |
JPS5575322A (en) | Piezoelectric oscillator unit | |
JPS5514667A (en) | Gas discharging panel | |
JPS5670636A (en) | Gas plasma etching of transparent conductive film | |
JPS5553421A (en) | Composite mask for ion etching | |
JPS5670501A (en) | Manufacture of material with function of polarization | |
JPS57119434A (en) | Manufacture of photoelectric conversion target | |
JPS55115966A (en) | Production of optical lens of projection type braun tube | |
JPS56158334A (en) | Manufacture of hard mask |