JPS55102280A - Infrared charge transfer device - Google Patents
Infrared charge transfer deviceInfo
- Publication number
- JPS55102280A JPS55102280A JP1021379A JP1021379A JPS55102280A JP S55102280 A JPS55102280 A JP S55102280A JP 1021379 A JP1021379 A JP 1021379A JP 1021379 A JP1021379 A JP 1021379A JP S55102280 A JPS55102280 A JP S55102280A
- Authority
- JP
- Japan
- Prior art keywords
- region
- electrode
- band width
- impurity density
- charge transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/15—Charge-coupled device [CCD] image sensors
- H10F39/157—CCD or CID infrared image sensors
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
PURPOSE:To simplify the bonding process of an infrared charge transfer device by forming a semiconductor substrate of multi-semiconductor material having a high impurity density layer including a narrow inhibiting band width and a low impurity density layer including a wide inhibiting band width and forming a transfer electrode at the low density layer side and bias electrodes at both layers. CONSTITUTION:A HgCdTe substrate 4 is formed of an n-type region 1 having approx. 10<15>/cm<3> of impurity density and 0.1eV of narrow forbidden band width and an n-type region 2 having approx. 10<12>/cm<3> of impurity density and 0.3eV of wide forbidden band width, and a hetero junction 3 is formed in the boundary between the regions 1 and 2. Then, a ZnS layer 5 becoming a surface protective layer is coated on the region 2, transfer gate electrodes 6a-6c are formed on the layer 5, and the electrodes 6a-6c are simultaneously connected to the electrode 11 of the region 2. The electrode 1 is connected through a power supply V to the electrode 9 on the surface of the region 1, infrared rays are irradiated to the surface of the region 1, and a potential well 7 is thus formed in the region 2. Since the photoelectric converting portion and a charge transfer portion are thus completely integrated, the bonding process may be largely simplified.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54010213A JPS5846069B2 (en) | 1979-01-30 | 1979-01-30 | Infrared charge transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54010213A JPS5846069B2 (en) | 1979-01-30 | 1979-01-30 | Infrared charge transfer device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55102280A true JPS55102280A (en) | 1980-08-05 |
JPS5846069B2 JPS5846069B2 (en) | 1983-10-14 |
Family
ID=11743978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54010213A Expired JPS5846069B2 (en) | 1979-01-30 | 1979-01-30 | Infrared charge transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5846069B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138186A (en) * | 1981-02-20 | 1982-08-26 | Fujitsu Ltd | Infrared ray detector |
JPS57204684A (en) * | 1981-06-08 | 1982-12-15 | Texas Instruments Inc | Method and device for forming infrared image |
JPS60183767A (en) * | 1984-03-01 | 1985-09-19 | Mitsubishi Electric Corp | Photodetection semiconductor device |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61203271U (en) * | 1985-06-11 | 1986-12-20 | ||
JPH0426856Y2 (en) * | 1985-09-06 | 1992-06-26 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50125626A (en) * | 1974-03-19 | 1975-10-02 |
-
1979
- 1979-01-30 JP JP54010213A patent/JPS5846069B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50125626A (en) * | 1974-03-19 | 1975-10-02 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138186A (en) * | 1981-02-20 | 1982-08-26 | Fujitsu Ltd | Infrared ray detector |
JPS57204684A (en) * | 1981-06-08 | 1982-12-15 | Texas Instruments Inc | Method and device for forming infrared image |
JPH0338794B2 (en) * | 1981-06-08 | 1991-06-11 | Texas Instruments Inc | |
JPS60183767A (en) * | 1984-03-01 | 1985-09-19 | Mitsubishi Electric Corp | Photodetection semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5846069B2 (en) | 1983-10-14 |
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