JPS5431281A - Optical exposure mask - Google Patents
Optical exposure maskInfo
- Publication number
- JPS5431281A JPS5431281A JP9737377A JP9737377A JPS5431281A JP S5431281 A JPS5431281 A JP S5431281A JP 9737377 A JP9737377 A JP 9737377A JP 9737377 A JP9737377 A JP 9737377A JP S5431281 A JPS5431281 A JP S5431281A
- Authority
- JP
- Japan
- Prior art keywords
- exposure mask
- optical exposure
- light shielding
- shielding layer
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To obtain a light shielding layer with low resistance by using the impurity-doped semiconductor layer as the light shielding layer.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9737377A JPS5431281A (en) | 1977-08-12 | 1977-08-12 | Optical exposure mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9737377A JPS5431281A (en) | 1977-08-12 | 1977-08-12 | Optical exposure mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5431281A true JPS5431281A (en) | 1979-03-08 |
Family
ID=14190697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9737377A Pending JPS5431281A (en) | 1977-08-12 | 1977-08-12 | Optical exposure mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5431281A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012063585A (en) * | 2010-09-16 | 2012-03-29 | Toppan Printing Co Ltd | Photomask blank and photomask |
| WO2022004456A1 (en) * | 2020-06-30 | 2022-01-06 | アルバック成膜株式会社 | Mask blank manufacturing method, mask blank, photomask manufacturing method, and photomask |
-
1977
- 1977-08-12 JP JP9737377A patent/JPS5431281A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012063585A (en) * | 2010-09-16 | 2012-03-29 | Toppan Printing Co Ltd | Photomask blank and photomask |
| WO2022004456A1 (en) * | 2020-06-30 | 2022-01-06 | アルバック成膜株式会社 | Mask blank manufacturing method, mask blank, photomask manufacturing method, and photomask |
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