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JPS54149341A - Etching apparatus - Google Patents

Etching apparatus

Info

Publication number
JPS54149341A
JPS54149341A JP5780378A JP5780378A JPS54149341A JP S54149341 A JPS54149341 A JP S54149341A JP 5780378 A JP5780378 A JP 5780378A JP 5780378 A JP5780378 A JP 5780378A JP S54149341 A JPS54149341 A JP S54149341A
Authority
JP
Japan
Prior art keywords
soln
etching
products
loss
pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5780378A
Other languages
Japanese (ja)
Inventor
Hiroshi Koshimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5780378A priority Critical patent/JPS54149341A/en
Publication of JPS54149341A publication Critical patent/JPS54149341A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To enable even etching to be carried out and to minimize the amt. of an etching soln. to be supplied, in an apparatus for spraying the soln. while moving products to be etched, by dividing an etching soln. loss into evaporation loss and adhesion loss and by supplying the soln. separately.
CONSTITUTION: An etching soln. in etching soln. storage tank 3 is sprayed from spray nozzles 1 with pump 2 to etch products to be etched. At this time, a soln. loss due to evaporation is constant to time. A soln. loss due to adhesion to the products, however, depends upon the no. and size of the products. Accordingly, etching soln. supply pump 4 is used as a constant rate pump to constantly supply the soln. evaporated, and the soln. reduced by adhesion is constantly supplied with auxiliary pump 5 every no. of the products.
COPYRIGHT: (C)1979,JPO&Japio
JP5780378A 1978-05-15 1978-05-15 Etching apparatus Pending JPS54149341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5780378A JPS54149341A (en) 1978-05-15 1978-05-15 Etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5780378A JPS54149341A (en) 1978-05-15 1978-05-15 Etching apparatus

Publications (1)

Publication Number Publication Date
JPS54149341A true JPS54149341A (en) 1979-11-22

Family

ID=13066063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5780378A Pending JPS54149341A (en) 1978-05-15 1978-05-15 Etching apparatus

Country Status (1)

Country Link
JP (1) JPS54149341A (en)

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