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JPS5386169A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
JPS5386169A
JPS5386169A JP37777A JP37777A JPS5386169A JP S5386169 A JPS5386169 A JP S5386169A JP 37777 A JP37777 A JP 37777A JP 37777 A JP37777 A JP 37777A JP S5386169 A JPS5386169 A JP S5386169A
Authority
JP
Japan
Prior art keywords
exposure apparatus
exposure
conveying
cleaning
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP37777A
Other languages
Japanese (ja)
Other versions
JPS5943819B2 (en
Inventor
Yasuhiro Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52000377A priority Critical patent/JPS5943819B2/en
Publication of JPS5386169A publication Critical patent/JPS5386169A/en
Publication of JPS5943819B2 publication Critical patent/JPS5943819B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To perform exposure of accurate patterns by conveying the objects to be exposed by a contactless conveying mechanism, and cleaning the exposure surface by blowing gas on the way thereafter performing exposure.
COPYRIGHT: (C)1978,JPO&Japio
JP52000377A 1977-01-07 1977-01-07 exposure equipment Expired JPS5943819B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52000377A JPS5943819B2 (en) 1977-01-07 1977-01-07 exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52000377A JPS5943819B2 (en) 1977-01-07 1977-01-07 exposure equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP58184983A Division JPS5990854A (en) 1983-10-05 1983-10-05 Air blow mechanism for plate-like object

Publications (2)

Publication Number Publication Date
JPS5386169A true JPS5386169A (en) 1978-07-29
JPS5943819B2 JPS5943819B2 (en) 1984-10-24

Family

ID=11472095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52000377A Expired JPS5943819B2 (en) 1977-01-07 1977-01-07 exposure equipment

Country Status (1)

Country Link
JP (1) JPS5943819B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104231A (en) * 1980-12-19 1982-06-29 Fujitsu Ltd Attaching method of dice
JPS57109344A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Manufacture and its apparatus for semiconductor device
JPS57120936A (en) * 1981-01-21 1982-07-28 Hitachi Ltd Step and repeat camera device
JPS5990854A (en) * 1983-10-05 1984-05-25 Hitachi Ltd Air blow mechanism for plate-like object
JPS59195647A (en) * 1983-04-21 1984-11-06 Nec Corp Device for washing exposure mask
JPS62295053A (en) * 1986-06-16 1987-12-22 Sumio Yokoyama Photoplotter
JPH0283521U (en) * 1988-12-14 1990-06-28

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60182607U (en) * 1984-05-15 1985-12-04 シャープ株式会社 microwave oven
JP7258124B2 (en) 2019-04-09 2023-04-14 三菱電機株式会社 Semiconductor equipment and semiconductor modules

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104231A (en) * 1980-12-19 1982-06-29 Fujitsu Ltd Attaching method of dice
JPS57109344A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Manufacture and its apparatus for semiconductor device
JPH0330297B2 (en) * 1980-12-26 1991-04-26
JPS57120936A (en) * 1981-01-21 1982-07-28 Hitachi Ltd Step and repeat camera device
JPS6323539B2 (en) * 1981-01-21 1988-05-17 Hitachi Ltd
JPS59195647A (en) * 1983-04-21 1984-11-06 Nec Corp Device for washing exposure mask
JPS6319858B2 (en) * 1983-04-21 1988-04-25 Nippon Electric Co
JPS5990854A (en) * 1983-10-05 1984-05-25 Hitachi Ltd Air blow mechanism for plate-like object
JPS62295053A (en) * 1986-06-16 1987-12-22 Sumio Yokoyama Photoplotter
JPH0283521U (en) * 1988-12-14 1990-06-28

Also Published As

Publication number Publication date
JPS5943819B2 (en) 1984-10-24

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