JPS5380172A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5380172A JPS5380172A JP15677376A JP15677376A JPS5380172A JP S5380172 A JPS5380172 A JP S5380172A JP 15677376 A JP15677376 A JP 15677376A JP 15677376 A JP15677376 A JP 15677376A JP S5380172 A JPS5380172 A JP S5380172A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- misfet
- punch
- junction
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To avoid occurrence of the punch-through phenomenon of MISFET as well as to increase the switching velocity, by providing a high impurity concentration region right under the gate and near the area with more depth than that of the junction of the source and drain.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15677376A JPS5380172A (en) | 1976-12-25 | 1976-12-25 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15677376A JPS5380172A (en) | 1976-12-25 | 1976-12-25 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5380172A true JPS5380172A (en) | 1978-07-15 |
Family
ID=15634990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15677376A Pending JPS5380172A (en) | 1976-12-25 | 1976-12-25 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5380172A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4799098A (en) * | 1983-03-28 | 1989-01-17 | Hitachi, Ltd. | MOS/bipolar device with stepped buried layer under active regions |
US4966859A (en) * | 1982-03-09 | 1990-10-30 | Siemens Aktiengesellschaft | Voltage-stable sub-μm MOS transistor for VLSI circuits |
US5128739A (en) * | 1983-12-07 | 1992-07-07 | Fujitsu Limited | MIS type semiconductor device formed in a semiconductor substrate having a well region |
US5384476A (en) * | 1979-08-25 | 1995-01-24 | Zaidan Hojin Handotai Kenkyu Shinkokai | Short channel MOSFET with buried anti-punch through region |
-
1976
- 1976-12-25 JP JP15677376A patent/JPS5380172A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5384476A (en) * | 1979-08-25 | 1995-01-24 | Zaidan Hojin Handotai Kenkyu Shinkokai | Short channel MOSFET with buried anti-punch through region |
US5552623A (en) * | 1979-08-25 | 1996-09-03 | Handotai Kenkyu Shinkokai | Short channel mosfet with buried anti-punch through region |
US4966859A (en) * | 1982-03-09 | 1990-10-30 | Siemens Aktiengesellschaft | Voltage-stable sub-μm MOS transistor for VLSI circuits |
US4799098A (en) * | 1983-03-28 | 1989-01-17 | Hitachi, Ltd. | MOS/bipolar device with stepped buried layer under active regions |
US5128739A (en) * | 1983-12-07 | 1992-07-07 | Fujitsu Limited | MIS type semiconductor device formed in a semiconductor substrate having a well region |
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