JPS5358775A - Production of diaphragm for electron beam exposure apparatus - Google Patents
Production of diaphragm for electron beam exposure apparatusInfo
- Publication number
- JPS5358775A JPS5358775A JP13396876A JP13396876A JPS5358775A JP S5358775 A JPS5358775 A JP S5358775A JP 13396876 A JP13396876 A JP 13396876A JP 13396876 A JP13396876 A JP 13396876A JP S5358775 A JPS5358775 A JP S5358775A
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- production
- electron beam
- exposure apparatus
- beam exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: The opening of a diaphragm composed of a substrate and metal layers is formed at higher accuracy.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13396876A JPS5358775A (en) | 1976-11-08 | 1976-11-08 | Production of diaphragm for electron beam exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13396876A JPS5358775A (en) | 1976-11-08 | 1976-11-08 | Production of diaphragm for electron beam exposure apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5358775A true JPS5358775A (en) | 1978-05-26 |
Family
ID=15117281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13396876A Pending JPS5358775A (en) | 1976-11-08 | 1976-11-08 | Production of diaphragm for electron beam exposure apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5358775A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61187234A (en) * | 1985-02-12 | 1986-08-20 | シーメンス、アクチエンゲゼルシヤフト | Aperture stop for lithography equipment and its manufacturing method |
-
1976
- 1976-11-08 JP JP13396876A patent/JPS5358775A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61187234A (en) * | 1985-02-12 | 1986-08-20 | シーメンス、アクチエンゲゼルシヤフト | Aperture stop for lithography equipment and its manufacturing method |
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