JPS5353975A - Electronic beam exposure device - Google Patents
Electronic beam exposure deviceInfo
- Publication number
- JPS5353975A JPS5353975A JP12892476A JP12892476A JPS5353975A JP S5353975 A JPS5353975 A JP S5353975A JP 12892476 A JP12892476 A JP 12892476A JP 12892476 A JP12892476 A JP 12892476A JP S5353975 A JPS5353975 A JP S5353975A
- Authority
- JP
- Japan
- Prior art keywords
- exposure device
- beam exposure
- electronic beam
- electron beam
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 abstract 2
Landscapes
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To make the electron beam incident to a wafer always at a right angle from the center of the wafer to its outside circumferential part by using two deflectors and deflecting the onee deflected electron beam by the same amount in the opposite dorection.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12892476A JPS5353975A (en) | 1976-10-27 | 1976-10-27 | Electronic beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12892476A JPS5353975A (en) | 1976-10-27 | 1976-10-27 | Electronic beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5353975A true JPS5353975A (en) | 1978-05-16 |
Family
ID=14996737
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12892476A Pending JPS5353975A (en) | 1976-10-27 | 1976-10-27 | Electronic beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5353975A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5644003A (en) * | 1979-09-17 | 1981-04-23 | Teijin Ltd | Gas enriching device |
JPS6212041A (en) * | 1985-07-09 | 1987-01-21 | Nec Kyushu Ltd | Parallel scanner |
JPS62213122A (en) * | 1986-03-13 | 1987-09-19 | Fujitsu Ltd | Electron beam exposure method |
-
1976
- 1976-10-27 JP JP12892476A patent/JPS5353975A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5644003A (en) * | 1979-09-17 | 1981-04-23 | Teijin Ltd | Gas enriching device |
JPS6212041A (en) * | 1985-07-09 | 1987-01-21 | Nec Kyushu Ltd | Parallel scanner |
JPS62213122A (en) * | 1986-03-13 | 1987-09-19 | Fujitsu Ltd | Electron beam exposure method |
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