JPS5318970A - Method of aligning relative position of substrate and photo mask - Google Patents

Method of aligning relative position of substrate and photo mask

Info

Publication number: JPS5318970A
Authority: JP; Japan
Prior art keywords: substrate; relative position; photo mask; aligning relative; aligning
Prior art date: 1976-08-05
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP9330377A

Other languages

English (en)

Inventor

Furiidoritsuhi Hansu

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Siemens Corp

Original Assignee

Siemens Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1976-08-05

Filing date

1977-08-03

Publication date

1978-02-21

1977-08-03 Application filed by Siemens Corp filed Critical Siemens Corp

1978-02-21 Publication of JPS5318970A publication Critical patent/JPS5318970A/ja

Status Pending legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP9330377A 1976-08-05 1977-08-03 Method of aligning relative position of substrate and photo mask Pending JPS5318970A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19762635275 DE2635275C2 (de)	1976-08-05	1976-08-05	Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät

Publications (1)

Publication Number	Publication Date
JPS5318970A true JPS5318970A (en)	1978-02-21

Family

ID=5984815

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP9330377A Pending JPS5318970A (en)	1976-08-05	1977-08-03	Method of aligning relative position of substrate and photo mask

Country Status (7)

Country	Link
JP (1)	JPS5318970A (ja)
BE (1)	BE857539A (ja)
DE (1)	DE2635275C2 (ja)
FR (1)	FR2360916A1 (ja)
GB (1)	GB1589286A (ja)
IT (1)	IT1081184B (ja)
NL (1)	NL7708652A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5655041A (en) *	1979-10-11	1981-05-15	Nippon Telegr & Teleph Corp <Ntt>	Positioning exposure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3657545A (en) *	1967-10-27	1972-04-18	Rank Organisation Ltd	Method and apparatus for reproducing a pattern from one planar element upon another planar element
US3745358A (en) *	1971-05-10	1973-07-10	Radiant Energy Systems	Alignment method and apparatus for electron projection systems
US3743842A (en) *	1972-01-14	1973-07-03	Massachusetts Inst Technology	Soft x-ray lithographic apparatus and process
US3742229A (en) *	1972-06-29	1973-06-26	Massachusetts Inst Technology	Soft x-ray mask alignment system
DE2460914C2 (de) *	1974-12-21	1983-08-18	Ibm Deutschland Gmbh, 7000 Stuttgart	Photolithographische Projektionsvorrichtung
US4085329A (en) *	1976-05-03	1978-04-18	Hughes Aircraft Company	Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

1976
- 1976-08-05 DE DE19762635275 patent/DE2635275C2/de not_active Expired
1977
- 1977-07-27 IT IT2616277A patent/IT1081184B/it active
- 1977-08-02 FR FR7723760A patent/FR2360916A1/fr active Granted
- 1977-08-03 JP JP9330377A patent/JPS5318970A/ja active Pending
- 1977-08-04 GB GB3267977A patent/GB1589286A/en not_active Expired
- 1977-08-04 NL NL7708652A patent/NL7708652A/xx not_active Application Discontinuation
- 1977-08-05 BE BE179952A patent/BE857539A/xx unknown

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5655041A (en) *	1979-10-11	1981-05-15	Nippon Telegr & Teleph Corp <Ntt>	Positioning exposure
JPS6214935B2 (ja) *	1979-10-11	1987-04-04	Nippon Telegraph & Telephone

Also Published As

Publication number	Publication date
FR2360916B1 (ja)	1982-05-21
DE2635275A1 (de)	1978-02-09
IT1081184B (it)	1985-05-16
NL7708652A (nl)	1978-02-07
FR2360916A1 (fr)	1978-03-03
GB1589286A (en)	1981-05-07
BE857539A (fr)	1977-12-01
DE2635275C2 (de)	1984-09-06

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