JPS5316396A - Gaseous phase growing method for single crystalline alumina - Google Patents
Gaseous phase growing method for single crystalline aluminaInfo
- Publication number
- JPS5316396A JPS5316396A JP9152576A JP9152576A JPS5316396A JP S5316396 A JPS5316396 A JP S5316396A JP 9152576 A JP9152576 A JP 9152576A JP 9152576 A JP9152576 A JP 9152576A JP S5316396 A JPS5316396 A JP S5316396A
- Authority
- JP
- Japan
- Prior art keywords
- gaseous phase
- single crystalline
- growing method
- crystalline alumina
- phase growing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To grow a uniform single crystal line alumina film with good crystallinity at gaseous phase by supplying CHe and CO2 gases in a prescribed molar ratio into a reaction tube provided with a heated single crystal line silicon substrate and Al.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9152576A JPS5316396A (en) | 1976-07-30 | 1976-07-30 | Gaseous phase growing method for single crystalline alumina |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9152576A JPS5316396A (en) | 1976-07-30 | 1976-07-30 | Gaseous phase growing method for single crystalline alumina |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5316396A true JPS5316396A (en) | 1978-02-15 |
JPS5617317B2 JPS5617317B2 (en) | 1981-04-21 |
Family
ID=14028829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9152576A Granted JPS5316396A (en) | 1976-07-30 | 1976-07-30 | Gaseous phase growing method for single crystalline alumina |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5316396A (en) |
-
1976
- 1976-07-30 JP JP9152576A patent/JPS5316396A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5617317B2 (en) | 1981-04-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5316396A (en) | Gaseous phase growing method for single crystalline alumina | |
JPS538374A (en) | Growing method for single crystal of semiconductor | |
JPS542300A (en) | Methdo and apparatus for vapor phase growth of magnespinel | |
JPS53105371A (en) | Crystal growing method for potassium arsenide | |
JPS5469062A (en) | Vapor growth method for magnespinel | |
JPS5429560A (en) | Gas phase growth method for semiconductor | |
JPS5649520A (en) | Vapor growth of compound semiconductor | |
JPS5461463A (en) | Vapor phase growth method for semiconductor | |
JPS5234668A (en) | Gaseous phase growing process of semiconductor | |
JPS53147684A (en) | Method of and apparatus for liquid phase epitaxial growth | |
JPS5316391A (en) | Method and apparatus for growing single crystalline alumina at gaseous phase | |
JPS53108766A (en) | Vapor phase growth method of sos film | |
JPS51114383A (en) | Liquid phase epitaxial crystal growth | |
JPS5387985A (en) | Gaseous phase epitaxial growth method for compound semiconductor crystal | |
JPS56120600A (en) | Vapor phase growing method | |
JPS5267573A (en) | Manufacturing device for semiconductor | |
JPS5288276A (en) | Liquid-phase epitaxial growth | |
JPS52135264A (en) | Liquid phase epitaxial growth method | |
JPS5659697A (en) | Vapor phase epitaxial growing method for magnesia spinel | |
JPS52155188A (en) | Liquid phase growth of semiconductor crystal | |
JPS5364465A (en) | Semiconductor crystal production apparatus | |
JPS5553414A (en) | Semiconductor crystal growing device | |
JPS5591815A (en) | Silicon epitaxial growth | |
JPS57200291A (en) | Vapor-phase growing method of compound semiconductor | |
JPS5267571A (en) | Crystallization method for semiconductor |