JPS53124078A - Electron beam device - Google Patents

Electron beam device

Info

Publication number: JPS53124078A
Authority: JP; Japan
Prior art keywords: electron beam; beam device; electron
Prior art date: 1977-02-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP1548478A

Other languages

English (en)

Japanese (ja)

Other versions

JPS5424833B2 (pt

Inventor

Shii Pufueifuaa Hansu

Emu Raian Fuiritsupu

Bui Ueebaa Edowaado

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Business Machines Corp

Original Assignee

International Business Machines Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-02-23

Filing date

1978-02-15

Publication date

1978-10-30

1978-02-15 Application filed by International Business Machines Corp filed Critical International Business Machines Corp

1978-10-30 Publication of JPS53124078A publication Critical patent/JPS53124078A/ja

1979-08-23 Publication of JPS5424833B2 publication Critical patent/JPS5424833B2/ja

Status Granted legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)

JP1548478A 1977-02-23 1978-02-15 Electron beam device Granted JPS53124078A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US77123577A	1977-02-23	1977-02-23

Publications (2)

Publication Number	Publication Date
JPS53124078A true JPS53124078A (en)	1978-10-30
JPS5424833B2 JPS5424833B2 (pt)	1979-08-23

Family

ID=25091155

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP1548478A Granted JPS53124078A (en)	1977-02-23	1978-02-15	Electron beam device

Country Status (9)

Country	Link
JP (1)	JPS53124078A (pt)
BR (1)	BR7801031A (pt)
CA (1)	CA1166766A (pt)
DE (1)	DE2805371C2 (pt)
FR (1)	FR2382091A1 (pt)
GB (1)	GB1587852A (pt)
IT (1)	IT1158434B (pt)
NL (1)	NL7802010A (pt)
SE (1)	SE437441B (pt)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS543476A (en) *	1977-06-09	1979-01-11	Jeol Ltd	Electron beam exposure device
JPS5679429A (en) *	1979-12-03	1981-06-30	Chiyou Lsi Gijutsu Kenkyu Kumiai	Electron beam exposure process
JPS5793528A (en) *	1980-11-28	1982-06-10	Ibm	Electron beam device
JPS5823155A (ja) *	1981-07-30	1983-02-10	インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン	荷電粒子ビ−ムの整列制御装置
JPS5928336A (ja) *	1982-08-09	1984-02-15	Nippon Telegr & Teleph Corp <Ntt>	パタ−ン形成法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1598219A (en) *	1977-08-10	1981-09-16	Ibm	Electron beam system
CN116441562B (zh) *	2023-06-16	2023-08-15	西安赛隆增材技术股份有限公司	一种电子束的束斑的校准装置及校准方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3801792A (en) *	1973-05-23	1974-04-02	Bell Telephone Labor Inc	Electron beam apparatus
JPS5283177A (en) *	1975-12-31	1977-07-11	Fujitsu Ltd	Electron beam exposure device
JPS52103967A (en) *	1976-02-05	1977-08-31	Western Electric Co	Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) *	1976-05-14	1978-01-25	Thomson Csf	Particle optical device
JPS5320391A (en) *	1976-08-09	1978-02-24	Becton Dickinson Co	Blood inspection apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL6807439A (pt) *	1968-05-27	1969-12-01
US3644700A (en) *	1969-12-15	1972-02-22	Ibm	Method and apparatus for controlling an electron beam
JPS5251871A (en) *	1975-10-23	1977-04-26	Rikagaku Kenkyusho	Projecting method for charge particle beams
FR2351497A1 (fr) *	1976-05-14	1977-12-09	Thomson Csf	Dispositif permettant le trace programme de figures de formes differentes
DE2627632A1 (de) *	1976-06-19	1977-12-22	Jenoptik Jena Gmbh	Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung

1977
- 1977-11-29 CA CA000291957A patent/CA1166766A/en not_active Expired
1978
- 1978-01-05 FR FR7800742A patent/FR2382091A1/fr active Granted
- 1978-01-20 GB GB2456/78A patent/GB1587852A/en not_active Expired
- 1978-02-09 DE DE2805371A patent/DE2805371C2/de not_active Expired
- 1978-02-10 IT IT20143/78A patent/IT1158434B/it active
- 1978-02-15 SE SE7801728A patent/SE437441B/sv not_active IP Right Cessation
- 1978-02-15 JP JP1548478A patent/JPS53124078A/ja active Granted
- 1978-02-21 BR BR7801031A patent/BR7801031A/pt unknown
- 1978-02-22 NL NL7802010A patent/NL7802010A/xx not_active Application Discontinuation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3801792A (en) *	1973-05-23	1974-04-02	Bell Telephone Labor Inc	Electron beam apparatus
JPS5283177A (en) *	1975-12-31	1977-07-11	Fujitsu Ltd	Electron beam exposure device
JPS52103967A (en) *	1976-02-05	1977-08-31	Western Electric Co	Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) *	1976-05-14	1978-01-25	Thomson Csf	Particle optical device
JPS5320391A (en) *	1976-08-09	1978-02-24	Becton Dickinson Co	Blood inspection apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS543476A (en) *	1977-06-09	1979-01-11	Jeol Ltd	Electron beam exposure device
JPS5415665B2 (pt) *	1977-06-09	1979-06-16
JPS5679429A (en) *	1979-12-03	1981-06-30	Chiyou Lsi Gijutsu Kenkyu Kumiai	Electron beam exposure process
JPS5793528A (en) *	1980-11-28	1982-06-10	Ibm	Electron beam device
JPS5823155A (ja) *	1981-07-30	1983-02-10	インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン	荷電粒子ビ−ムの整列制御装置
JPS5928336A (ja) *	1982-08-09	1984-02-15	Nippon Telegr & Teleph Corp <Ntt>	パタ−ン形成法

Also Published As

Publication number	Publication date
IT1158434B (it)	1987-02-18
FR2382091B1 (pt)	1982-04-09
BR7801031A (pt)	1978-12-12
DE2805371C2 (de)	1984-02-16
SE7801728L (sv)	1978-08-24
JPS5424833B2 (pt)	1979-08-23
NL7802010A (nl)	1978-08-25
DE2805371A1 (de)	1978-08-24
IT7820143A0 (it)	1978-02-10
GB1587852A (en)	1981-04-08
CA1166766A (en)	1984-05-01
FR2382091A1 (fr)	1978-09-22
SE437441B (sv)	1985-02-25

Publication	Publication Date	Title
GB2010985B (en)	1982-10-20	Rotary-anode
JPS53147458A (en)	1978-12-22	Electron microscope
GB2001799B (en)	1982-03-17	Electron lens
JPS5463681A (en)	1979-05-22	Electron beam exposure device
GB2006809B (en)	1982-03-17	Electron detector devices
GB2011125B (en)	1982-02-24	Apparatus for electron beam lithograhy
JPS5373064A (en)	1978-06-29	Device for deflecting electron beam
JPS5429981A (en)	1979-03-06	Device for radiating electron beam
JPS56107455A (en)	1981-08-26	Device for affecting electron beam
JPS53121574A (en)	1978-10-24	Electron beam exposing device
JPS53124078A (en)	1978-10-30	Electron beam device
JPS5468149A (en)	1979-06-01	Electron ray application device
JPS5638757A (en)	1981-04-14	Electron beam device
JPS5435680A (en)	1979-03-15	Device for exposing electron beam
GB2032684B (en)	1983-03-30	Electron beam aperture device
ZA762611B (en)	1977-12-28	An electron beam device
JPS5222547A (en)	1977-02-19	Electron beam device
JPS5442980A (en)	1979-04-05	Electron beam unit
JPS5472685A (en)	1979-06-11	Electron beam exposure device
JPS5651700A (en)	1981-05-09	Electron beam irradiation device
JPS545663A (en)	1979-01-17	Device for exposing electron beam
CS193322B1 (en)	1979-10-31	Electron resisit
JPS5475117A (en)	1979-06-15	Perforrated beam
JPS5458366A (en)	1979-05-11	Electron beam unit
JPS53126597A (en)	1978-11-04	Electron ray exposing device