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JPS53108286A - Etching control device - Google Patents

Etching control device

Info

Publication number
JPS53108286A
JPS53108286A JP2348977A JP2348977A JPS53108286A JP S53108286 A JPS53108286 A JP S53108286A JP 2348977 A JP2348977 A JP 2348977A JP 2348977 A JP2348977 A JP 2348977A JP S53108286 A JPS53108286 A JP S53108286A
Authority
JP
Japan
Prior art keywords
control device
etching control
etching
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2348977A
Other languages
Japanese (ja)
Other versions
JPS6211492B2 (en
Inventor
Katsuzou Ukai
Kunio Hanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICHIDEN VARIAN KK
Original Assignee
NICHIDEN VARIAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICHIDEN VARIAN KK filed Critical NICHIDEN VARIAN KK
Priority to JP2348977A priority Critical patent/JPS53108286A/en
Publication of JPS53108286A publication Critical patent/JPS53108286A/en
Publication of JPS6211492B2 publication Critical patent/JPS6211492B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2348977A 1977-03-03 1977-03-03 Etching control device Granted JPS53108286A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2348977A JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2348977A JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Publications (2)

Publication Number Publication Date
JPS53108286A true JPS53108286A (en) 1978-09-20
JPS6211492B2 JPS6211492B2 (en) 1987-03-12

Family

ID=12111915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2348977A Granted JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Country Status (1)

Country Link
JP (1) JPS53108286A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5723226A (en) * 1980-07-17 1982-02-06 Nippon Telegr & Teleph Corp <Ntt> Plasma etching device
JPS5759332A (en) * 1980-09-27 1982-04-09 Fujitsu Ltd Method for detecting finishing time of dry etching reaction
JPS57154147U (en) * 1981-03-20 1982-09-28
JPS5879722A (en) * 1981-11-06 1983-05-13 Fujitsu Ltd Controlling method of plasma etching
JPS58215030A (en) * 1982-06-08 1983-12-14 Kokusai Electric Co Ltd Detector for dry etching finishing time of semiconductor substrate
WO2018155425A1 (en) * 2017-02-21 2018-08-30 株式会社アルバック Method for manufacturing element structure

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5723226A (en) * 1980-07-17 1982-02-06 Nippon Telegr & Teleph Corp <Ntt> Plasma etching device
JPH0343772B2 (en) * 1980-07-17 1991-07-03 Nippon Telegraph & Telephone
JPS5759332A (en) * 1980-09-27 1982-04-09 Fujitsu Ltd Method for detecting finishing time of dry etching reaction
JPS57154147U (en) * 1981-03-20 1982-09-28
JPS5879722A (en) * 1981-11-06 1983-05-13 Fujitsu Ltd Controlling method of plasma etching
JPS58215030A (en) * 1982-06-08 1983-12-14 Kokusai Electric Co Ltd Detector for dry etching finishing time of semiconductor substrate
WO2018155425A1 (en) * 2017-02-21 2018-08-30 株式会社アルバック Method for manufacturing element structure
CN109892012A (en) * 2017-02-21 2019-06-14 株式会社爱发科 The manufacturing method of element structure

Also Published As

Publication number Publication date
JPS6211492B2 (en) 1987-03-12

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