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JPS5285035A - Method of partially etching semiiconductors - Google Patents

Method of partially etching semiiconductors

Info

Publication number
JPS5285035A
JPS5285035A JP154376A JP154376A JPS5285035A JP S5285035 A JPS5285035 A JP S5285035A JP 154376 A JP154376 A JP 154376A JP 154376 A JP154376 A JP 154376A JP S5285035 A JPS5285035 A JP S5285035A
Authority
JP
Japan
Prior art keywords
semiiconductors
partially etching
etching
partially
etching semiiconductors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP154376A
Other languages
Japanese (ja)
Inventor
Kiyoo Nishida
Yoshimichi Hirobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP154376A priority Critical patent/JPS5285035A/en
Publication of JPS5285035A publication Critical patent/JPS5285035A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
JP154376A 1976-01-09 1976-01-09 Method of partially etching semiiconductors Pending JPS5285035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP154376A JPS5285035A (en) 1976-01-09 1976-01-09 Method of partially etching semiiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP154376A JPS5285035A (en) 1976-01-09 1976-01-09 Method of partially etching semiiconductors

Publications (1)

Publication Number Publication Date
JPS5285035A true JPS5285035A (en) 1977-07-15

Family

ID=11504425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP154376A Pending JPS5285035A (en) 1976-01-09 1976-01-09 Method of partially etching semiiconductors

Country Status (1)

Country Link
JP (1) JPS5285035A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673440A (en) * 1979-11-21 1981-06-18 Toshiba Corp Manufacture of semiconductor device
CN103165416A (en) * 2011-12-13 2013-06-19 中芯国际集成电路制造(上海)有限公司 Hard mask for corrosion and manufacturing method thereof and manufacturing method of metal oxide semiconductor (MOS) device
JP2015211138A (en) * 2014-04-25 2015-11-24 ルネサスエレクトロニクス株式会社 Semiconductor device and manufacturing method of the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673440A (en) * 1979-11-21 1981-06-18 Toshiba Corp Manufacture of semiconductor device
CN103165416A (en) * 2011-12-13 2013-06-19 中芯国际集成电路制造(上海)有限公司 Hard mask for corrosion and manufacturing method thereof and manufacturing method of metal oxide semiconductor (MOS) device
JP2015211138A (en) * 2014-04-25 2015-11-24 ルネサスエレクトロニクス株式会社 Semiconductor device and manufacturing method of the same

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