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JPS52141179A - Method of selecting position of piece of solid plate and piece of solid plate employed in method thereof - Google Patents

Method of selecting position of piece of solid plate and piece of solid plate employed in method thereof

Info

Publication number
JPS52141179A
JPS52141179A JP5700177A JP5700177A JPS52141179A JP S52141179 A JPS52141179 A JP S52141179A JP 5700177 A JP5700177 A JP 5700177A JP 5700177 A JP5700177 A JP 5700177A JP S52141179 A JPS52141179 A JP S52141179A
Authority
JP
Japan
Prior art keywords
piece
solid plate
selecting position
employed
plate employed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5700177A
Other languages
English (en)
Inventor
Ritaaru Kurisuchiyan
Jiyanan Pieeru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of JPS52141179A publication Critical patent/JPS52141179A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/88—Lidar systems specially adapted for specific applications

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Electromagnetism (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5700177A 1976-05-19 1977-05-17 Method of selecting position of piece of solid plate and piece of solid plate employed in method thereof Pending JPS52141179A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762622283 DE2622283A1 (de) 1976-05-19 1976-05-19 Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens

Publications (1)

Publication Number Publication Date
JPS52141179A true JPS52141179A (en) 1977-11-25

Family

ID=5978395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5700177A Pending JPS52141179A (en) 1976-05-19 1977-05-17 Method of selecting position of piece of solid plate and piece of solid plate employed in method thereof

Country Status (6)

Country Link
US (1) US4153367A (ja)
JP (1) JPS52141179A (ja)
DE (1) DE2622283A1 (ja)
FR (1) FR2352309A1 (ja)
GB (1) GB1572667A (ja)
NL (1) NL7705501A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252136A (ja) * 1986-04-24 1987-11-02 Nikon Corp 加工装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2836924A1 (de) * 1978-08-24 1980-03-06 Blaupunkt Werke Gmbh Vorrichtung zur automatischen positionierung von elektronischen bauelementen
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
DE3024679A1 (de) * 1980-06-30 1982-01-21 Rainer 7602 Oberkirch Hess Optisches kantenerkennungsgeraet
US4333044A (en) * 1980-08-29 1982-06-01 Western Electric Co., Inc. Methods of and system for aligning a device with a reference target
JPS583227A (ja) * 1981-06-29 1983-01-10 Fujitsu Ltd チップアライメント方法
US4388386A (en) * 1982-06-07 1983-06-14 International Business Machines Corporation Mask set mismatch
GB2159939A (en) * 1984-03-02 1985-12-11 Hewlett Packard Co Detector apparatus
US4645338A (en) * 1985-04-26 1987-02-24 International Business Machines Corporation Optical system for focus correction for a lithographic tool
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
US6665070B1 (en) 2001-04-20 2003-12-16 Nanometrics Incorporated Alignment of a rotatable polarizer with a sample
US6522406B1 (en) 2001-04-20 2003-02-18 Nanometrics Incorporated Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer
US7440091B2 (en) * 2004-10-26 2008-10-21 Applied Materials, Inc. Sensors for dynamically detecting substrate breakage and misalignment of a moving substrate
US8276959B2 (en) 2008-08-08 2012-10-02 Applied Materials, Inc. Magnetic pad for end-effectors

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3269254A (en) * 1962-12-31 1966-08-30 Ibm Optical apparatus for indicating and measuring the roll angular orientation of a movable body
US3544801A (en) * 1969-05-01 1970-12-01 Fairchild Camera Instr Co Mask design for optical alignment systems
NL7100212A (ja) * 1971-01-08 1972-07-11
US3861798A (en) * 1972-05-22 1975-01-21 Hitachi Ltd Mask for aligning patterns
DE2240968A1 (de) * 1972-08-21 1974-03-07 Leitz Ernst Gmbh Optisches verfahren zur messung der relativen verschiebung eines beugungsgitters sowie einrichtungen zu seiner durchfuehrung
US3885877A (en) * 1973-10-11 1975-05-27 Ibm Electro-optical fine alignment process
US3996463A (en) * 1975-08-28 1976-12-07 Western Electric Company, Inc. Method and apparatus for monitoring the relative position of a light beam and a grating using Fraunhofer diffraction effects

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252136A (ja) * 1986-04-24 1987-11-02 Nikon Corp 加工装置

Also Published As

Publication number Publication date
US4153367A (en) 1979-05-08
NL7705501A (nl) 1977-11-22
GB1572667A (en) 1980-07-30
FR2352309A1 (fr) 1977-12-16
DE2622283A1 (de) 1977-12-08

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