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JPS51131280A - Dielectric insulation separation base manufacturing process - Google Patents

Dielectric insulation separation base manufacturing process

Info

Publication number
JPS51131280A
JPS51131280A JP5458575A JP5458575A JPS51131280A JP S51131280 A JPS51131280 A JP S51131280A JP 5458575 A JP5458575 A JP 5458575A JP 5458575 A JP5458575 A JP 5458575A JP S51131280 A JPS51131280 A JP S51131280A
Authority
JP
Japan
Prior art keywords
manufacturing process
dielectric insulation
insulation separation
separation base
base manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5458575A
Other languages
Japanese (ja)
Other versions
JPS5411231B2 (en
Inventor
Akio Mimura
Takaya Suzuki
Setsuro Yagyu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5458575A priority Critical patent/JPS51131280A/en
Priority to CA251,240A priority patent/CA1059647A/en
Priority to DE19762620814 priority patent/DE2620814C3/en
Publication of JPS51131280A publication Critical patent/JPS51131280A/en
Priority to US05/888,981 priority patent/US4173674A/en
Publication of JPS5411231B2 publication Critical patent/JPS5411231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)

Abstract

PURPOSE: To obtain a dielectric insulation separation base manufacturing process which provides a level-surfaced, less-curved base and high efficiency circuit element configuration.
COPYRIGHT: (C)1976,JPO&Japio
JP5458575A 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process Granted JPS51131280A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5458575A JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process
CA251,240A CA1059647A (en) 1975-05-12 1976-04-27 Method of preparing dielectric insulator separated substrate for semiconductor integrated circuits
DE19762620814 DE2620814C3 (en) 1975-05-12 1976-05-11 Process for the production of a dielectrically insulated support for integrated semiconductor circuits
US05/888,981 US4173674A (en) 1975-05-12 1978-03-22 Dielectric insulator separated substrate for semiconductor integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5458575A JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process

Publications (2)

Publication Number Publication Date
JPS51131280A true JPS51131280A (en) 1976-11-15
JPS5411231B2 JPS5411231B2 (en) 1979-05-12

Family

ID=12974774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5458575A Granted JPS51131280A (en) 1975-05-12 1975-05-12 Dielectric insulation separation base manufacturing process

Country Status (3)

Country Link
JP (1) JPS51131280A (en)
CA (1) CA1059647A (en)
DE (1) DE2620814C3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57102044A (en) * 1980-12-17 1982-06-24 Hitachi Ltd Insulating isolation substrate
JPS61166039A (en) * 1985-09-20 1986-07-26 Hitachi Ltd Dielectric isolation substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138229A (en) * 1979-04-13 1980-10-28 Hitachi Ltd Manufacture of dielectric material for insulation- separation substrate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57102044A (en) * 1980-12-17 1982-06-24 Hitachi Ltd Insulating isolation substrate
JPH0137851B2 (en) * 1980-12-17 1989-08-09 Hitachi Ltd
JPS61166039A (en) * 1985-09-20 1986-07-26 Hitachi Ltd Dielectric isolation substrate
JPH0342698B2 (en) * 1985-09-20 1991-06-28

Also Published As

Publication number Publication date
DE2620814B2 (en) 1978-04-06
DE2620814A1 (en) 1976-11-25
JPS5411231B2 (en) 1979-05-12
CA1059647A (en) 1979-07-31
DE2620814C3 (en) 1978-11-30

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