JPS4916460A - - Google Patents
Info
- Publication number
- JPS4916460A JPS4916460A JP4991672A JP4991672A JPS4916460A JP S4916460 A JPS4916460 A JP S4916460A JP 4991672 A JP4991672 A JP 4991672A JP 4991672 A JP4991672 A JP 4991672A JP S4916460 A JPS4916460 A JP S4916460A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4991672A JPS5240953B2 (es) | 1972-05-22 | 1972-05-22 | |
| US362361A US3861798A (en) | 1972-05-22 | 1973-05-21 | Mask for aligning patterns |
| DE19732326059 DE2326059C3 (de) | 1972-05-22 | 1973-05-22 | Anordnung und Verfahren zum Ausrichten von Mustern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4991672A JPS5240953B2 (es) | 1972-05-22 | 1972-05-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4916460A true JPS4916460A (es) | 1974-02-13 |
| JPS5240953B2 JPS5240953B2 (es) | 1977-10-15 |
Family
ID=12844323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4991672A Expired JPS5240953B2 (es) | 1972-05-22 | 1972-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5240953B2 (es) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5381083A (en) * | 1976-12-27 | 1978-07-18 | Fujitsu Ltd | Focusing method of projection exposure apparatus |
| JPS5911619A (ja) * | 1982-07-12 | 1984-01-21 | Nec Corp | 半導体装置の非接触試験方法 |
| JPS60257450A (ja) * | 1984-05-29 | 1985-12-19 | エヌ・ベー・フイリツプス・フルーイランペンフアブリケン | マスクパターン結像装置 |
| JPS61187343A (ja) * | 1985-02-15 | 1986-08-21 | Nec Corp | 半導体基板 |
-
1972
- 1972-05-22 JP JP4991672A patent/JPS5240953B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5381083A (en) * | 1976-12-27 | 1978-07-18 | Fujitsu Ltd | Focusing method of projection exposure apparatus |
| JPS6037615B2 (ja) * | 1976-12-27 | 1985-08-27 | 富士通株式会社 | 投影露光装置のピント合せ方法 |
| JPS5911619A (ja) * | 1982-07-12 | 1984-01-21 | Nec Corp | 半導体装置の非接触試験方法 |
| JPS6330780B2 (es) * | 1982-07-12 | 1988-06-21 | Nippon Electric Co | |
| JPS60257450A (ja) * | 1984-05-29 | 1985-12-19 | エヌ・ベー・フイリツプス・フルーイランペンフアブリケン | マスクパターン結像装置 |
| JPS61187343A (ja) * | 1985-02-15 | 1986-08-21 | Nec Corp | 半導体基板 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5240953B2 (es) | 1977-10-15 |