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JPS4841440B1 - - Google Patents

Info

Publication number
JPS4841440B1
JPS4841440B1 JP44055511A JP5551169A JPS4841440B1 JP S4841440 B1 JPS4841440 B1 JP S4841440B1 JP 44055511 A JP44055511 A JP 44055511A JP 5551169 A JP5551169 A JP 5551169A JP S4841440 B1 JPS4841440 B1 JP S4841440B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44055511A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4841440B1 publication Critical patent/JPS4841440B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/311Etching the insulating layers by chemical or physical means
    • H01L21/31105Etching inorganic layers
    • H01L21/31111Etching inorganic layers by chemical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
JP44055511A 1968-07-16 1969-07-15 Pending JPS4841440B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74529268A 1968-07-16 1968-07-16

Publications (1)

Publication Number Publication Date
JPS4841440B1 true JPS4841440B1 (ja) 1973-12-06

Family

ID=24996075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44055511A Pending JPS4841440B1 (ja) 1968-07-16 1969-07-15

Country Status (5)

Country Link
US (1) US3706612A (ja)
JP (1) JPS4841440B1 (ja)
DE (1) DE1934743B2 (ja)
FR (1) FR2014621A1 (ja)
GB (1) GB1209889A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1423448A (en) * 1973-07-18 1976-02-04 Plessey Co Ltd Method of selectively etching silicon nitride
US4075367A (en) * 1976-03-18 1978-02-21 Ncr Corporation Semiconductor processing of silicon nitride
US5341805A (en) * 1993-04-06 1994-08-30 Cedars-Sinai Medical Center Glucose fluorescence monitor and method
US5456252A (en) * 1993-09-30 1995-10-10 Cedars-Sinai Medical Center Induced fluorescence spectroscopy blood perfusion and pH monitor and method
US5503559A (en) * 1993-09-30 1996-04-02 Cedars-Sinai Medical Center Fiber-optic endodontic apparatus and method
CA2385527A1 (en) * 2002-05-09 2003-11-09 Neks Recherche & Developpement Inc. Device and method to detect dental root canal apical foramina and other structures
DE102004025000A1 (de) 2004-05-21 2005-12-08 Bayer Technology Services Gmbh Verfahren zur Herstellung von chemischen und pharmazeutischen Produkten mit integrierter Mehrsäulen-Chromatographie

Also Published As

Publication number Publication date
DE1934743A1 (de) 1970-01-22
US3706612A (en) 1972-12-19
GB1209889A (en) 1970-10-21
DE1934743B2 (de) 1971-04-29
FR2014621A1 (ja) 1970-04-17

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