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FR2014621A1 - - Google Patents

Info

Publication number
FR2014621A1
FR2014621A1 FR6921607A FR6921607A FR2014621A1 FR 2014621 A1 FR2014621 A1 FR 2014621A1 FR 6921607 A FR6921607 A FR 6921607A FR 6921607 A FR6921607 A FR 6921607A FR 2014621 A1 FR2014621 A1 FR 2014621A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6921607A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2014621A1 publication Critical patent/FR2014621A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
FR6921607A 1968-07-16 1969-06-25 Withdrawn FR2014621A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74529268A 1968-07-16 1968-07-16

Publications (1)

Publication Number Publication Date
FR2014621A1 true FR2014621A1 (fr) 1970-04-17

Family

ID=24996075

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6921607A Withdrawn FR2014621A1 (fr) 1968-07-16 1969-06-25

Country Status (5)

Country Link
US (1) US3706612A (fr)
JP (1) JPS4841440B1 (fr)
DE (1) DE1934743B2 (fr)
FR (1) FR2014621A1 (fr)
GB (1) GB1209889A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1423448A (en) * 1973-07-18 1976-02-04 Plessey Co Ltd Method of selectively etching silicon nitride
US4075367A (en) * 1976-03-18 1978-02-21 Ncr Corporation Semiconductor processing of silicon nitride
US5341805A (en) * 1993-04-06 1994-08-30 Cedars-Sinai Medical Center Glucose fluorescence monitor and method
US5456252A (en) * 1993-09-30 1995-10-10 Cedars-Sinai Medical Center Induced fluorescence spectroscopy blood perfusion and pH monitor and method
US5503559A (en) * 1993-09-30 1996-04-02 Cedars-Sinai Medical Center Fiber-optic endodontic apparatus and method
CA2385527A1 (fr) * 2002-05-09 2003-11-09 Neks Recherche & Developpement Inc. Dispositif et methode de localisation du foramen apical du canal radiculaire et d'autres structures
DE102004025000A1 (de) 2004-05-21 2005-12-08 Bayer Technology Services Gmbh Verfahren zur Herstellung von chemischen und pharmazeutischen Produkten mit integrierter Mehrsäulen-Chromatographie

Also Published As

Publication number Publication date
DE1934743A1 (de) 1970-01-22
US3706612A (en) 1972-12-19
JPS4841440B1 (fr) 1973-12-06
GB1209889A (en) 1970-10-21
DE1934743B2 (de) 1971-04-29

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Legal Events

Date Code Title Description
ST Notification of lapse