JPH1161088A - Adhesive for connecting circuit member - Google Patents
Adhesive for connecting circuit memberInfo
- Publication number
- JPH1161088A JPH1161088A JP22823097A JP22823097A JPH1161088A JP H1161088 A JPH1161088 A JP H1161088A JP 22823097 A JP22823097 A JP 22823097A JP 22823097 A JP22823097 A JP 22823097A JP H1161088 A JPH1161088 A JP H1161088A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- parts
- connecting circuit
- connection
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 title claims abstract description 41
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 41
- 239000002245 particle Substances 0.000 claims abstract description 35
- 239000004840 adhesive resin Substances 0.000 claims abstract description 24
- 229920006223 adhesive resin Polymers 0.000 claims abstract description 24
- 229920000800 acrylic rubber Polymers 0.000 claims abstract description 18
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 18
- 239000003822 epoxy resin Substances 0.000 claims abstract description 10
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims description 28
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 239000011256 inorganic filler Substances 0.000 claims description 10
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 10
- 238000003825 pressing Methods 0.000 claims description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 3
- 238000013329 compounding Methods 0.000 abstract description 4
- 239000000945 filler Substances 0.000 abstract description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052796 boron Inorganic materials 0.000 abstract description 3
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 abstract description 3
- 229920000768 polyamine Polymers 0.000 abstract description 3
- 150000003839 salts Chemical class 0.000 abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 30
- 239000010931 gold Substances 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 239000002313 adhesive film Substances 0.000 description 18
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 239000000758 substrate Substances 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000010408 film Substances 0.000 description 12
- 239000005350 fused silica glass Substances 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 10
- -1 hydrazide Chemical compound 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 8
- 239000013034 phenoxy resin Substances 0.000 description 8
- 229920006287 phenoxy resin Polymers 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 230000035939 shock Effects 0.000 description 6
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 5
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 5
- 239000007888 film coating Substances 0.000 description 5
- 238000009501 film coating Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000002923 metal particle Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Landscapes
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Wire Bonding (AREA)
- Die Bonding (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、例えばフリップチ
ップ実装方式により半導体チップを基板と接着剤で接着
固定すると共に両者の電極同士を電気的に接続するため
に使用される回路部材接続用接着剤に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive for connecting circuit members, which is used for bonding a semiconductor chip to a substrate with an adhesive and electrically connecting both electrodes by, for example, a flip chip mounting method. About.
【0002】[0002]
【従来の技術】半導体実装分野では、低コスト化・高精
化に対応した新しい実装形態としてICチップを直接プ
リント基板やフレキシブル配線板に搭載するフリップチ
ップ実装が注目されている。フリップチップ実装方式と
しては、チップの端子にはんだバンプを設け、はんだ接
続を行う方式や導電性接着剤を介して電気的接続を行う
方式が知られている。これらの方式では、接続するチッ
プと基板の熱膨張係数差に基づくストレスが、各種環境
下に曝した場合、接続界面で発生し接続信頼性が低下す
るという問題がある。このため、接続界面のストレスを
緩和する目的で一般にエポキシ樹脂系のアンダフィル材
をチップ/基板の間隙に注入する方式が検討されてい
る。しかし、このアンダフィルの注入工程は、プロセス
を煩雑化し、生産性、コストの面で不利になるという問
題がある。このような問題を解決すべく最近では、異方
導電性と封止機能を有する異方導電性接着剤を用いたフ
リップチップ実装が、プロセス簡易性という観点から注
目されている。2. Description of the Related Art In the field of semiconductor mounting, flip chip mounting, in which an IC chip is directly mounted on a printed circuit board or a flexible wiring board, has attracted attention as a new mounting mode corresponding to cost reduction and high precision. As a flip-chip mounting method, a method of providing a solder bump on a terminal of a chip and performing solder connection or a method of performing electrical connection via a conductive adhesive is known. In these methods, there is a problem in that when exposed to various environments, stress based on the difference in thermal expansion coefficient between the chip to be connected and the substrate is generated at the connection interface and connection reliability is reduced. For this reason, a method of injecting an epoxy resin-based underfill material into a gap between a chip and a substrate is generally studied for the purpose of reducing stress at a connection interface. However, there is a problem that the underfill injection step complicates the process and is disadvantageous in terms of productivity and cost. In order to solve such a problem, flip-chip mounting using an anisotropic conductive adhesive having anisotropic conductivity and a sealing function has recently attracted attention from the viewpoint of process simplicity.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、チップ
を異方導電接着剤を介して直接基板に搭載する場合、温
度サイクル試験下ではチップと基板の熱膨張係数差に基
づくストレスが接続部において生じ、熱衝撃試験、PC
T試験、はんだバス浸漬試験などの信頼性試験を行うと
接続抵抗の増大や接着剤の剥離が生じるという問題があ
る。また、チップの接続端子に突起電極が形成されてい
る場合では、信頼性試験においてチップと基板の熱膨張
係数差に基づくストレスが突起電極とチップ界面に集中
し、突起電極がチップ電極界面から剥離し、導通不良が
生じるという問題がある。本発明は、接続部での接続抵
抗の増大や接着剤の剥離がなく、接続信頼性が大幅に向
上する回路板を提供するものである。However, when a chip is directly mounted on a substrate via an anisotropic conductive adhesive, a stress based on a difference in thermal expansion coefficient between the chip and the substrate occurs in a connection portion under a temperature cycle test. Thermal shock test, PC
When a reliability test such as a T test or a solder bath immersion test is performed, there is a problem that the connection resistance increases and the adhesive is peeled off. In the case where a protruding electrode is formed on the connection terminal of the chip, stress based on the difference in thermal expansion coefficient between the chip and the substrate is concentrated on the interface between the protruding electrode and the chip in the reliability test, and the protruding electrode is separated from the interface of the chip electrode. However, there is a problem that conduction failure occurs. An object of the present invention is to provide a circuit board which does not increase the connection resistance at the connection portion or peels off the adhesive, and greatly improves the connection reliability.
【0004】[0004]
【課題を解決するための手段】本発明の回路部材接続用
接着剤は、相対向する回路電極間に介在され、相対向す
る回路電極を加圧し加圧方向の電極間を電気的に接続す
る回路部材接続用接着剤であって、接着剤樹脂組成物1
00重量部に無機質充填材が5〜200重量部含有され
ることを特徴とするものである。The adhesive for connecting circuit members of the present invention is interposed between circuit electrodes facing each other, presses the circuit electrodes facing each other, and electrically connects the electrodes in the pressing direction. An adhesive for connecting circuit members, comprising: an adhesive resin composition 1
It is characterized in that 5 to 200 parts by weight of an inorganic filler is contained in 00 parts by weight.
【0005】無機質充填材の平均粒径は3ミクロン以下
が好ましく、接着剤には無機充填材の平均粒径に比べて
平均粒径の大きい導電粒子が0.1〜30体積%含有さ
れていても良い。接着剤樹脂組成物は硬化後の40℃で
の弾性率が30〜2000MPaであるものが好まし
く、接着剤樹脂組成物は少なくともエポキシ樹脂、アク
リルゴム、潜在性硬化剤を含有し、フィルム状である回
路部材接続用接着剤が好ましい。アクリルゴムは、その
分子中にグリシジルエーテル基を含有しているものが使
用される。The average particle size of the inorganic filler is preferably 3 μm or less, and the adhesive contains 0.1 to 30% by volume of conductive particles having an average particle size larger than the average particle size of the inorganic filler. Is also good. The adhesive resin composition preferably has an elastic modulus at 40 ° C. after curing of 30 to 2000 MPa. The adhesive resin composition contains at least an epoxy resin, an acrylic rubber, and a latent curing agent, and is in the form of a film. Adhesives for connecting circuit members are preferred. Acrylic rubber having a glycidyl ether group in its molecule is used.
【0006】[0006]
【発明の実施の形態】本発明において用いられる回路部
材として半導体チップ、プリント基板、ポリイミドやポ
リエステルを基材としたフレキシル配線板があげられ
る。半導体チップや基板の電極パッド上には、めっきで
形成されるバンプや金ワイヤの先端をトーチ等により溶
融させ、金ボールを形成し、このボールを電極パッド上
に圧着した後、ワイヤを切断して得られるワイヤバンプ
などの突起電極を設け、接続端子として用いることがで
きる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Circuit members used in the present invention include a semiconductor chip, a printed circuit board, and a flexible wiring board based on polyimide or polyester. On the electrode pads of the semiconductor chip and the substrate, the bumps formed by plating and the tips of the gold wires are melted with a torch or the like to form gold balls, and the balls are pressed on the electrode pads, and then the wires are cut. A protruding electrode such as a wire bump obtained by the above method can be provided and used as a connection terminal.
【0007】本発明において用いられる接着剤樹脂組成
物としては、エポキシ樹脂とイミダゾール系、ヒドラジ
ド系、三フッ化ホウ素−アミン錯体、スルホニウム塩、
アミンイミド、ポリアミンの塩、ジシアンジアミド等の
潜在性硬化剤の混合物が用いられ、回路部材の熱膨張係
数差に基づくストレスを緩和するためには、接着後の4
0℃での弾性率が30〜2000MPaの接着剤樹脂組
成物が好ましい。例えば、接続時の良好な流動性や高接
続信頼性を得られる接着剤樹脂組成物として、エポキシ
樹脂とイミダゾール系、ヒドラジド系、三フッ化ホウ素
−アミン錯体、スルホニウム塩、アミンイミド、ポリア
ミンの塩、ジシアンジアミド等の潜在性硬化剤の混合物
に、接着後の40℃での弾性率が30〜2000MPa
になるようにアクリルゴムを配合した接着剤があげられ
る。接着フィルム硬化物の弾性率は、例えば、レオロジ
(株)製レオスペクトラDVE−4(引っぱりモード、
周波数10Hz、5℃/minで昇温)を使用して測定
できる。The adhesive resin composition used in the present invention includes epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt,
A mixture of a latent curing agent such as an amine imide, a polyamine salt, and dicyandiamide is used.
An adhesive resin composition having an elastic modulus at 0 ° C. of 30 to 2000 MPa is preferred. For example, as an adhesive resin composition capable of obtaining good fluidity and high connection reliability at the time of connection, epoxy resin and imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt, amine imide, salt of polyamine, A mixture of a latent curing agent such as dicyandiamide has an elastic modulus at 40 ° C. after bonding of 30 to 2000 MPa.
An adhesive containing an acrylic rubber so that The elastic modulus of the adhesive film cured product is, for example, Rheology Co., Ltd. Rheospectra DVE-4 (pulling mode,
It can be measured using a frequency of 10 Hz and a temperature rise at 5 ° C./min).
【0008】本発明で用いるアクリルゴムとしては、ア
クリル酸、アクリル酸エステル、メタクリル酸エステル
またはアクリロニトリルのうち少なくともひとつをモノ
マー成分とした重合体または共重合体があげられ、中で
もグリシジルエーテル基を含有するグリシジルアクリレ
ートやグリシジルメタクリレートを含む共重合体系アク
リルゴムが好適に用いられる。これらアクリルゴムの分
子量は、接着剤の凝集力を高める点から20万以上が好
ましい。アクリルゴムの接着剤中の配合量は、15wt
%以下であると接着後の40℃での弾性率が2000M
Paを越えてしまい、また40wt%以上になると低弾
性率化は図れるが接続時の溶融粘度が高くなり接続電極
界間、または接続電極と導電粒子界面の溶融接着剤の排
除性が低下するため、接続電極間または接続電極と導電
粒子間の電気的導通を確保できなくなる。このため、ア
クリル配合量としては15〜40wt%が好ましい。接
着剤に配合されたこれらのアクリルゴムは、ゴム成分に
起因する誘電正接のピーク温度が40〜60℃付近にあ
るため、接着剤の低弾性率化を図ることができる。ま
た、接着剤にはフィルム形成性を容易にするためにフェ
ノキシ樹脂などの熱可塑性樹脂を配合することもでき
る。特に、フェノキシ樹脂は、エポキシ樹脂と構造が類
似しているため、エポキシ樹脂との相溶性、接着性に優
れるなどの特徴を有するので好ましい。フィルム形成
は、これら少なくともエポキシ樹脂、アクリルゴム、フ
ェノキシ樹脂、潜在性硬化剤からなる接着剤樹脂組成物
と導電粒子を有機溶剤に溶解あるいは分散により液状化
して、剥離性基材上に塗布し、硬化剤の活性温度以下で
溶剤を除去することにより行われれる。この時用いる溶
剤は、芳香族炭化水素系と含酸素系の混合溶剤が材料の
溶解性を向上させるため好ましい。The acrylic rubber used in the present invention includes a polymer or a copolymer containing at least one of acrylic acid, acrylic acid ester, methacrylic acid ester and acrylonitrile as a monomer component, and particularly contains a glycidyl ether group. A copolymer acrylic rubber containing glycidyl acrylate or glycidyl methacrylate is preferably used. The molecular weight of these acrylic rubbers is preferably 200,000 or more from the viewpoint of increasing the cohesive strength of the adhesive. The amount of acrylic rubber in the adhesive is 15 wt.
% Or less, the elastic modulus at 40 ° C. after bonding is 2000M.
If it exceeds Pa, and if it exceeds 40 wt%, the modulus of elasticity can be reduced, but the melt viscosity at the time of connection increases, and the removability of the molten adhesive between the connection electrode boundaries or at the interface between the connection electrode and the conductive particles decreases. As a result, it becomes impossible to secure electrical continuity between the connection electrodes or between the connection electrodes and the conductive particles. Therefore, the acrylic compounding amount is preferably 15 to 40% by weight. These acrylic rubbers compounded in the adhesive have a peak temperature of dielectric loss tangent due to the rubber component in the vicinity of 40 to 60 ° C., so that the elastic modulus of the adhesive can be reduced. In addition, a thermoplastic resin such as a phenoxy resin can be blended with the adhesive to facilitate film formation. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin, and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesiveness. Film formation, at least these epoxy resin, acrylic rubber, phenoxy resin, an adhesive resin composition comprising a latent curing agent and conductive particles are dissolved or dispersed in an organic solvent and liquefied, and applied on a peelable substrate, This is done by removing the solvent below the activation temperature of the curing agent. As the solvent used at this time, a mixed solvent of an aromatic hydrocarbon type and an oxygen-containing type is preferable because the solubility of the material is improved.
【0009】本発明に用いられる無機質充填材として
は、特に限定するものではなく、例えば、溶融シリカ、
結晶質シリカ、ケイ酸カルシウム、アルミナ、炭酸カル
シウム等の粉体があげられる。無機充填材の配合量は、
接着剤樹脂組成物100重量部に対して5〜200重量
部であり、熱膨張係数を低下させるには配合量が大きい
ほど効果的であるが、多量に配合すると接着性や接続部
での接着剤の排除性低下に基づく導通不良が発生し、配
合量が小さいと熱膨張係数を充分低下できないため、7
〜90重量部が好ましく、7〜40重量部が最も好まし
い。無機充填材は、接着剤樹脂組成物100重量部に対
して5〜10未満重量部使用することができる。また、
その平均粒径は、接続部での導通不良を防止する目的で
3ミクロン以下にするのが好ましい。また接続時の樹脂
の流動性の低下及びチップのパッシベーション膜のダメ
ージを防ぐ目的で球状フィラを用いることが望ましい。The inorganic filler used in the present invention is not particularly limited, and examples thereof include fused silica,
Powders such as crystalline silica, calcium silicate, alumina, calcium carbonate and the like can be mentioned. The compounding amount of the inorganic filler is
The amount is 5 to 200 parts by weight with respect to 100 parts by weight of the adhesive resin composition. The larger the amount is, the more effective the lowering of the coefficient of thermal expansion is. Insufficient conduction due to a decrease in the exclusion of the agent occurs, and if the amount is small, the coefficient of thermal expansion cannot be sufficiently reduced.
It is preferably from 90 to 90 parts by weight, most preferably from 7 to 40 parts by weight. The inorganic filler can be used in an amount of 5 to less than 10 parts by weight based on 100 parts by weight of the adhesive resin composition. Also,
The average particle size is preferably 3 microns or less for the purpose of preventing poor conduction at the connection. In addition, it is desirable to use a spherical filler for the purpose of preventing a decrease in the fluidity of the resin at the time of connection and damage to the passivation film of the chip.
【0010】本発明の接着剤には、チップのバンプや回
路電極の高さばらつきを吸収するために、異方導電性を
積極的に付与する目的で導電粒子を分散することもでき
る。本発明において導電粒子は例えばAu、Ni、A
g、Cu、Wやはんだなどの金属粒子またはこれらの金
属粒子表面に金やパラジウムなどの薄膜をめっきや蒸着
によって形成した金属粒子であり、ポリスチレン等の高
分子の球状の核材にNi、Cu、Au、はんだ等の導電
層を設けた導電粒子を用いることができる。粒径は基板
の電極の最小の間隔よりも小さいことが必要で、電極の
高さばらつきがある場合、高さばらつきよりも大きいこ
とが好ましく、かつ無機質充填材の平均粒径より大きい
ことが好ましく、1μm〜10μmが好ましい。また、
接着剤に分散される導電粒子量は、0.1〜30体積%
であり、好ましくは0.2〜15体積%である。本発明
の回路部材接続用接着剤がフィルム状接着剤の場合膜厚
は、特に限定するものではないが、第一及び第二の回路
部材間のギャップに比べ、厚いほうが好ましく、一般に
はギャップに対して5μm以上厚い膜厚が望ましい。In the adhesive of the present invention, conductive particles can be dispersed for the purpose of positively imparting anisotropic conductivity in order to absorb height variations of chip bumps and circuit electrodes. In the present invention, the conductive particles are, for example, Au, Ni, A
g, Cu, W or metal particles such as solder or metal particles formed by plating or depositing a thin film of gold or palladium on the surface of these metal particles. Conductive particles provided with a conductive layer of Au, solder, or the like can be used. It is necessary that the particle size is smaller than the minimum distance between the electrodes of the substrate, and if there is a height variation of the electrodes, it is preferably larger than the height variation, and preferably larger than the average particle size of the inorganic filler. And 1 μm to 10 μm are preferred. Also,
The amount of conductive particles dispersed in the adhesive is 0.1 to 30% by volume.
And preferably 0.2 to 15% by volume. When the adhesive for connecting circuit members of the present invention is a film adhesive, the film thickness is not particularly limited, but is preferably larger than the gap between the first and second circuit members, and generally the gap is larger. On the other hand, a film thickness of 5 μm or more is desirable.
【0011】[0011]
実施例1 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)125gを
酢酸エチル400gに溶解し、30%溶液を得た。つい
で、マイクロカプセル型潜在性硬化剤を含有する液状エ
ポキシ(エポキシ当量185)325gをこの溶液に加
え、撹拌し、溶融シリカ(平均粒子径:0.5μm)を
接着剤樹脂組成物100重量部に対して20重量部、さ
らにニッケル粒子(直径:3μm)を2vol%分散し
てフィルム塗工用溶液を得た。この溶液をセパレータ
(シリコーン処理したポリエチレンテレフタレートフィ
ルム、厚み40μm)にロールコータで塗布し、100
℃、10分乾燥し厚み45μmの接着フィルム1を作製
した。なお、この接着フィルム1の溶融シリカ及びニッ
ケル粒子を除いた接着剤樹脂組成物のみの動的粘弾性測
定器で測定した40℃の弾性率は、800MPaであっ
た。次に作製した接着フィルム1を用いて金バンプ(面
積:80μmx80μm、スペース30μm、高さ:1
5μm、バンプ数288)付きチップ(10mmx10
mm、厚み:0.5mm)とNi/AuめっきCu回路
プリント基板の接続を以下に示すように行った。接着フ
ィルム(12mmx12mm)をNi/AuめっきCu
回路プリント基板(電極高さ:20μm、厚み:0.8
mm)に80℃、10kgf/cm2で貼りつけた後、
セパレータを剥離し、チップのバンプとNi/Auめっ
きCu回路プリント基板(厚み:0.8mm)の位置あ
わせを行った。ついで、180℃、30g/バンプ、2
0秒の条件でチップ上方から加熱、加圧を行い、本接続
を行った。本接続後の接続抵抗は、1バンプあたり最高
で6mΩ、平均で2mΩ、絶縁抵抗は108Ω以上であ
り、これらの値は−55〜125℃の熱衝撃試験100
0サイクル処理、PCT試験(121℃、2気圧)20
0時間、260℃のはんだバス浸漬10秒後においても
変化がなく、良好な接続信頼性を示した。Example 1 50 g of a phenoxy resin and butyl acrylate (40
Parts), 125 g of an acrylic rubber (molecular weight: 850,000) obtained by copolymerizing ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 400 g of ethyl acetate to obtain a 30% solution. Next, 325 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution and stirred, and fused silica (average particle diameter: 0.5 μm) was added to 100 parts by weight of the adhesive resin composition. 20 parts by weight, and further 2% by volume of nickel particles (diameter: 3 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
It dried at 10 degreeC for 10 minutes, and produced the adhesive film 1 of 45 micrometers in thickness. The elastic modulus at 40 ° C. of this adhesive film 1 measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica and nickel particles was 800 MPa. Next, gold bumps (area: 80 μm × 80 μm, space: 30 μm, height: 1) were formed by using the produced adhesive film 1.
Chip with 5 μm, 288 bumps (10 mm × 10
mm, thickness: 0.5 mm) and a Ni / Au plated Cu circuit printed circuit board were connected as shown below. Adhesive film (12mm x 12mm) is Ni / Au plated Cu
Circuit printed circuit board (electrode height: 20 μm, thickness: 0.8
mm) at 80 ° C and 10 kgf / cm 2 ,
The separator was peeled off, and the bumps of the chip and the Ni / Au plated Cu circuit printed circuit board (thickness: 0.8 mm) were aligned. Then, at 180 ° C., 30 g / bump, 2
Heating and pressurizing were performed from above the chip under the condition of 0 second, and the main connection was performed. The connection resistance after the actual connection is 6 mΩ at the maximum per bump, 2 mΩ on average, and the insulation resistance is 10 8 Ω or more.
0 cycle treatment, PCT test (121 ° C, 2 atm) 20
There was no change even after 10 hours of immersion in the solder bath at 260 ° C. for 0 hour, indicating good connection reliability.
【0012】実施例2 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)175gを
酢酸エチル525gに溶解し、30%溶液を得た。つい
で、マイクロカプセル型潜在性硬化剤を含有する液状エ
ポキシ(エポキシ当量185)275gをこの溶液に加
え、撹拌し、溶融シリカ(平均粒子径:0.5μm)を
接着樹脂組成物100重量部に対して40重量部、さら
にニッケル粒子(直径:3μm)を2vol%分散して
フィルム塗工用溶液を得た。この溶液をセパレータ(シ
リコーン処理したポリエチレンテレフタレートフィル
ム、厚み40μm)にロールコータで塗布し、100
℃、10分乾燥し厚み45μmの接着フィルム2を作製
した。この接着フィルム2の溶融シリカ及びニッケル粒
子を除いた接着剤樹脂組成物のみの動的粘弾性測定器で
測定した40℃の弾性率は、400MPaであった。次
に作製した接着フィルム2を用いて金バンプ(面積:8
0μmx80μm、スペース30μm、高さ:15μ
m、バンプ数288)付きチップ(10mmx10m
m)とNi/AuめっきCu回路プリント基板(電極高
さ:20μm、厚み:0.8mm)の接続を以下に示す
ように行った。接着フィルム(12mmx12mm)を
Ni/AuめっきCu回路プリント基板に80℃、10
kgf/cm2で貼りつけた後、セパレータを剥離し、
チップのバンプとNi/AuめっきCu回路プリント基
板の位置あわせを行った。ついで、170℃、30g/
バンプ、20秒の条件でチップ上方から加熱、加圧を行
い、本接続を行った。本接続後の接続抵抗は、1バンプ
あたり最高で18mΩ、平均で8mΩ、絶縁抵抗は10
8Ω以上であり、これらの値は−55〜125℃の熱衝
撃試験1000サイクル処理、PCT試験(121℃、
2気圧)200時間、260℃のはんだバス浸漬10秒
後においても変化がなく、良好な接続信頼性を示した。Example 2 50 g of a phenoxy resin and butyl acrylate (40
Parts), ethyl acrylate (30 parts), 175 g of an acrylic rubber (molecular weight: 850,000) copolymerized with acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 525 g of ethyl acetate to obtain a 30% solution. Next, 275 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred, and fused silica (average particle diameter: 0.5 μm) was added to 100 parts by weight of the adhesive resin composition. 40 parts by weight and further 2% by volume of nickel particles (diameter: 3 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
It dried at 10 degreeC for 10 minutes, and produced the adhesive film 2 of 45 micrometers in thickness. The elastic modulus at 40 ° C. of this adhesive film 2 measured at 40 ° C. by a dynamic viscoelasticity measuring instrument only from the adhesive resin composition excluding the fused silica and nickel particles was 400 MPa. Next, gold bumps (area: 8
0 μm × 80 μm, space 30 μm, height: 15 μ
m, number of bumps 288) with chip (10mm x 10m)
m) and a Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) were connected as shown below. An adhesive film (12 mm x 12 mm) is applied to a Ni / Au plated Cu circuit printed circuit board at 80 ° C.
After attaching at kgf / cm 2 , the separator was peeled off,
The bumps of the chip and the Ni / Au plated Cu circuit printed circuit board were aligned. Then, at 170 ° C., 30 g /
The main connection was performed by heating and pressing from above the chip under the conditions of the bump and 20 seconds. The connection resistance after this connection is up to 18 mΩ per bump, 8 mΩ on average, and the insulation resistance is 10 mΩ.
8 Ω or more, and these values are 1000 cycles of thermal shock test at −55 to 125 ° C., PCT test (121 ° C.,
There was no change even after immersion in a solder bath at 260 ° C. for 2 hours for 200 hours and good connection reliability was exhibited.
【0013】実施例3 フェノキシ樹脂50g、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)100gを
酢酸エチル350gに溶解し、30%溶液を得た。つい
で、マイクロカプセル型潜在性硬化剤を含有する液状エ
ポキシ(エポキシ当量185)350gをこの溶液に加
え、撹拌し、溶融シリカ(平均粒子径:0.5μm)を
接着剤樹脂組成物100重量部に対して10重量部、さ
らにポリスチレン系核体(直径:5μm)の表面にAu
層を形成した導電粒子を5vol%分散してフィルム塗
工用溶液を得た。この溶液をセパレータ(シリコーン処
理したポリエチレンテレフタレートフィルム、厚み40
μm)にロールコータで塗布し、100℃10分乾燥し
厚み45μmの接着フィルム3を作製した。この接着フ
ィルム3の溶融シリカ及びニッケル粒子を除いた接着剤
樹脂組成物のみの動的粘弾性測定器で測定した40℃の
弾性率は、1000MPaであった。次に作製した接着
フィルム3を用いて金バンプ(面積:80μmx80μ
m、スペース30μm、高さ:15μm、バンプ数28
8)付きチップ(10mmx10mm、厚み:0.5m
m)とNi/AuめっきCu回路プリント基板(電極高
さ:20μm、厚み:0.8mm)の接続を以下に示す
ように行った。接着フィルム3(12mmx12mm)
をNi/AuめっきCu回路プリント基板に80℃、1
0kgf/cm2で貼りつけた後、セパレータを剥離
し、チップのバンプとNi/AuめっきCu回路プリン
ト基板の位置あわせを行った。ついで、170℃、30
g/バンプ、20秒の条件でチップ上方から加熱、加圧
を行い、本接続を行った。接続抵抗は、1バンプあたり
最高で5mΩ、平均で1.5mΩ、絶縁抵抗は108Ω
以上であり、これらの値は−55〜125℃の熱衝撃試
験1000サイクル処理、PCT試験(121℃、2気
圧)200時間、260℃のはんだバス浸漬10秒後に
おいても変化がなく、良好な接続信頼性を示した。EXAMPLE 3 50 g of a phenoxy resin, butyl acrylate (40
Parts), ethyl acrylate (30 parts), acrylonitrile (30 parts), and 100 g of an acrylic rubber (molecular weight: 850,000) copolymerized with glycidyl methacrylate (3 parts) were dissolved in 350 g of ethyl acetate to obtain a 30% solution. Next, 350 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred, and fused silica (average particle diameter: 0.5 μm) was added to 100 parts by weight of the adhesive resin composition. On the surface of a polystyrene core (diameter: 5 μm).
The conductive particles having the layer formed were dispersed at 5 vol% to obtain a film coating solution. This solution was separated with a separator (silicone-treated polyethylene terephthalate film, thickness 40).
μm) with a roll coater and dried at 100 ° C. for 10 minutes to produce an adhesive film 3 having a thickness of 45 μm. The modulus of elasticity at 40 ° C. of this adhesive film 3 measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica and nickel particles was 1000 MPa. Next, using the produced adhesive film 3, gold bumps (area: 80 μm × 80 μm)
m, space 30 μm, height: 15 μm, number of bumps 28
8) With tip (10mm x 10mm, thickness: 0.5m)
m) and a Ni / Au plated Cu circuit printed circuit board (electrode height: 20 μm, thickness: 0.8 mm) were connected as shown below. Adhesive film 3 (12mm x 12mm)
80 ° C, 1 on Ni / Au plated Cu circuit printed circuit board
After sticking at 0 kgf / cm 2 , the separator was peeled off and the bumps of the chip and the Ni / Au plated Cu circuit printed circuit board were aligned. Then, at 170 ° C, 30
Heating and pressurizing were performed from above the chip under the conditions of g / bump and 20 seconds, and the actual connection was performed. Connection resistance is up to 5 mΩ per bump, 1.5 mΩ on average, and insulation resistance is 10 8 Ω
These values are not changed even after 1000 cycles of thermal shock test at −55 to 125 ° C., 200 hours of PCT test (121 ° C., 2 atm), and 10 seconds after immersion in a solder bath at 260 ° C. Demonstrated connection reliability.
【0014】実施例4 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)100gを
酢酸エチル350gに溶解し、30%溶液を得た。つい
で、、マイクロカプセル型潜在性硬化剤を含有する液状
エポキシ(エポキシ当量185)350g部をこの溶液
に加え、撹拌し、溶融シリカ(平均粒子径:0.5μ
m)を接着剤樹脂組成物100重量部に対して20重量
部、さらにポリスチレン系核体(直径:5μm)の表面
にAu層を形成した導電粒子を5vol%分散してフィ
ルム塗工用溶液を得た。この溶液をセパレータ(シリコ
ーン処理したポリエチレンテレフタレートフィルム、厚
み40μm)にロールコータで塗布し、100℃10分
乾燥し厚み45μmの接着フィルム4を作製した。この
接着フィルム4の溶融シリカ及びニッケル粒子を除いた
接着樹脂組成物のみの動的粘弾性測定器で測定した40
℃の弾性率は、1000MPaであった。次に作製した
接着フィルム4を用いて金バンプ(面積:50μmx5
0μm、362バンプ、スペース:20μm、高さ:1
5μm)付きチップ(1.7mmx17mm、厚み:
0.5mm)とITO回路付ガラス基板(厚み:1.1
mm)の接続を以下に示すように行った。接着フィルム
4(12mmx12mm)をITO回路付ガラス基板に
80℃、10kgf/cm2で貼りつけた後、セパレー
タを剥離し、チップのバンプとITO回路付ガラス基板
の位置あわせを行った。ついで、180℃、40g/バ
ンプ、20秒の条件でチップ上方から加熱、加圧を行
い、本接続を行った。接続抵抗は、1バンプあたり最高
で150mΩ、平均で80mΩ、絶縁抵抗は108Ω以
上であり、これらの値は−40〜100℃の熱衝撃試験
1000サイクル処理、PCT試験(105℃、1.2
気圧)100時間においても変化がなく、良好な接続信
頼性を示した。Example 4 50 g of a phenoxy resin and butyl acrylate (40
Parts), ethyl acrylate (30 parts), acrylonitrile (30 parts), and 100 g of an acrylic rubber (molecular weight: 850,000) copolymerized with glycidyl methacrylate (3 parts) were dissolved in 350 g of ethyl acetate to obtain a 30% solution. Next, 350 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred and fused silica (average particle diameter: 0.5 μm).
20 parts by weight of m) with respect to 100 parts by weight of the adhesive resin composition, and 5 vol% of conductive particles having an Au layer formed on the surface of a polystyrene core (diameter: 5 μm) were dispersed at 5 vol% to give a film coating solution. Obtained. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater, and dried at 100 ° C. for 10 minutes to produce an adhesive film 4 having a thickness of 45 μm. This adhesive film 4 was measured with a dynamic viscoelasticity measuring device of only the adhesive resin composition excluding the fused silica and nickel particles.
The elastic modulus at ℃ was 1000 MPa. Next, a gold bump (area: 50 μm × 5
0 μm, 362 bumps, space: 20 μm, height: 1
5μm) with tip (1.7mm × 17mm, thickness:
0.5 mm) and a glass substrate with an ITO circuit (thickness: 1.1)
mm) was performed as shown below. After bonding the adhesive film 4 (12 mm × 12 mm) to a glass substrate with an ITO circuit at 80 ° C. and 10 kgf / cm 2 , the separator was peeled off, and the bumps of the chip and the glass substrate with the ITO circuit were aligned. Then, heating and pressurization were performed from above the chip under the conditions of 180 ° C., 40 g / bump, and 20 seconds, and the actual connection was performed. The connection resistance is 150 mΩ at maximum per bump, 80 mΩ on average, and the insulation resistance is 10 8 Ω or more. These values are 1000 cycles of thermal shock test at −40 to 100 ° C., and PCT test (105 ° C., 1. 2
There was no change even after 100 hours (atmospheric pressure), indicating good connection reliability.
【0015】実施例5 フェノキシ樹脂50gと、ブチルアクリレート(40
部)、エチルアクリレート(30部)、アクリロニトリ
ル(30部)及びグリシジルメタクリレート(3部)を
共重合したアクリルゴム(分子量:85万)125gを
酢酸エチル400gに溶解し、30%溶液を得た。つい
で、、マイクロカプセル型潜在性硬化剤を含有する液状
エポキシ(エポキシ当量185)325gをこの溶液に
加え、撹拌し、溶融シリカ(平均粒子径:0.5μm)
を接着剤樹脂組成物100重量部に対して60重量部、
さらにニッケル粒子(直径:3μm)を2vol%分散
してフィルム塗工用溶液を得た。この溶液をセパレータ
(シリコーン処理したポリエチレンテレフタレートフィ
ルム、厚み40μm)にロールコータで塗布し、100
℃10分乾燥し厚み45μmの接着フィルム5を作製し
た。この接着フィルム5の溶融シリカ及びニッケル粒子
を除いた接着剤樹脂組成物のみの動的粘弾性測定器で測
定した40℃の弾性率は、800MPaであった。次に
作製した接着フィルム5を用いてバンプレスチップ(1
0mmx10mm、厚み:0.5mm、パッド電極:A
l、パッド径:120μm)と回路上にNi/Auめっ
きCuバンプ(直径:100μm、スペース50μm、
高さ:15μm、バンプ数200)を形成したNi/A
uめっきCu回路プリント基板の接続を以下に示すよう
に行った。接着フィルム5(12mmx12mm)をN
i/AuめっきCu回路プリント基板(電極高さ:20
μm、厚み:0.8mm)に80℃、10kgf/cm
2で貼りつけた後、セパレータを剥離し、チップのAl
パッドとNi/AuめっきCuバンプ付Ni/Auめっ
きCu回路プリント基板(厚み:0.8mm)の位置あ
わせを行った。ついで、180℃、30g/バンプ、2
0秒の条件でチップ上方から加熱、加圧を行い、本接続
を行った。本接続後の接続抵抗は、1バンプあたり最高
で8mΩ、平均で4mΩ、絶縁抵抗は108Ω以上であ
り、これらの値は−55〜125℃の熱衝撃試験100
0サイクル処理、PCT試験(121℃、2気圧)20
0時間、260℃のはんだバス浸漬10秒後においても
変化がなく、良好な接続信頼性を示した。EXAMPLE 5 50 g of a phenoxy resin and butyl acrylate (40
Parts), 125 g of an acrylic rubber (molecular weight: 850,000) obtained by copolymerizing ethyl acrylate (30 parts), acrylonitrile (30 parts) and glycidyl methacrylate (3 parts) was dissolved in 400 g of ethyl acetate to obtain a 30% solution. Next, 325 g of a liquid epoxy (epoxy equivalent: 185) containing a microcapsule-type latent curing agent was added to this solution, and the mixture was stirred and fused silica (average particle diameter: 0.5 μm)
60 parts by weight based on 100 parts by weight of the adhesive resin composition,
Further, 2 vol% of nickel particles (diameter: 3 μm) were dispersed to obtain a film coating solution. This solution was applied to a separator (silicone-treated polyethylene terephthalate film, thickness 40 μm) using a roll coater.
After drying at 10 ° C. for 10 minutes, an adhesive film 5 having a thickness of 45 μm was prepared. The elastic modulus at 40 ° C. of this adhesive film 5 measured by a dynamic viscoelasticity measuring instrument using only the adhesive resin composition excluding the fused silica and nickel particles was 800 MPa. Next, a bumpless chip (1
0 mm x 10 mm, thickness: 0.5 mm, pad electrode: A
1, pad diameter: 120 μm) and Ni / Au plated Cu bumps on the circuit (diameter: 100 μm, space 50 μm,
Height: 15 μm, number of bumps 200) Ni / A formed
The connection of the u-plated Cu circuit printed circuit board was performed as shown below. Adhesive film 5 (12 mm x 12 mm)
i / Au plated Cu circuit printed circuit board (electrode height: 20
μm, thickness: 0.8 mm) at 80 ° C, 10 kgf / cm
After attaching in step 2 , the separator is peeled off, and the Al
The positioning of the pad and the Ni / Au-plated Cu circuit printed circuit board (thickness: 0.8 mm) with the Ni / Au-plated Cu bump was performed. Then, at 180 ° C., 30 g / bump, 2
Heating and pressurizing were performed from above the chip under the condition of 0 second, and the main connection was performed. The connection resistance after this connection is 8 mΩ at the maximum per bump, 4 mΩ on average, and the insulation resistance is 10 8 Ω or more. These values are the values of the thermal shock test at −55 to 125 ° C. 100
0 cycle treatment, PCT test (121 ° C, 2 atm) 20
There was no change even after 10 hours of immersion in the solder bath at 260 ° C. for 0 hour, indicating good connection reliability.
【0016】[0016]
【発明の効果】本発明の接着剤によれば、従来の接着剤
のように熱膨張係数が大きくないため、チップとACF
界面でのストレスを緩和できる他、さらに接着樹脂組成
物として40℃での弾性率が30〜2000MPaであ
る場合にはさらに接着樹脂組成物によって熱衝撃、PC
Tやはんだバス浸漬試験などの信頼性試験において生じ
るストレスを吸収できるため、信頼性試験後においても
接続部での接続抵抗の増大や接着剤の剥離がなく、接続
信頼性が大幅に向上する。また、本発明の接着剤は、熱
膨張係数が小さくチップとACF界面でのストレスを緩
和できることから、チップと基板を接着剤を介して接続
する際にチップの電極パッドに突起電極を設けた場合、
温度サイクル試験下での突起電極の電極パッドからの剥
離を大幅に低減できる。したがって、本発明の接着剤
は、LCDパネルとTAB、TABとフレキシブル回路
基板、LCDパネルとICチップ、ICチップとプリン
ト基板とを接続時の加圧方向にのみ電気的に接続するた
めに好適に用いられる。According to the adhesive of the present invention, since the coefficient of thermal expansion is not large unlike the conventional adhesive, the chip and the ACF
In addition to being able to relieve stress at the interface, when the elastic modulus at 40 ° C. of the adhesive resin composition is 30 to 2000 MPa, thermal shock and PC
Since the stress generated in a reliability test such as T or solder bath immersion test can be absorbed, there is no increase in connection resistance at the connection portion and no peeling of the adhesive after the reliability test, and the connection reliability is greatly improved. Further, since the adhesive of the present invention has a small coefficient of thermal expansion and can relieve stress at the interface between the chip and the ACF, when the chip and the substrate are connected via the adhesive, the electrode pad of the chip is provided with a protruding electrode. ,
Peeling of the protruding electrode from the electrode pad under the temperature cycle test can be greatly reduced. Therefore, the adhesive of the present invention is suitable for electrically connecting the LCD panel and TAB, the TAB and the flexible circuit board, the LCD panel and the IC chip, and the IC chip and the printed board only in the pressing direction at the time of connection. Used.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C09J 163/00 C09J 163/00 H01L 21/52 H01L 21/52 E 21/60 311 21/60 311S (72)発明者 井坂 和博 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 (72)発明者 渡辺 治 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 (72)発明者 小島 和良 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification symbol FI C09J 163/00 C09J 163/00 H01L 21/52 H01L 21/52 E 21/60 311 21/60 311S (72) Inventor Kazuhiro Isaka 48 Wadai, Tsukuba, Ibaraki Prefecture, Tsukuba Development Laboratory, Hitachi Chemical Co., Ltd. (72) Inventor Osamu Watanabe 48 Wadadai, Tsukuba, Ibaraki Prefecture, Tsukuba Development Laboratory, Hitachi Chemical Co., Ltd. Wada48 Hitachi Chemical Co., Ltd. Tsukuba Development Laboratory
Claims (7)
向する回路電極を加圧し加圧方向の電極間を電気的に接
続する回路部材接続用接着剤であって、接着樹脂組成物
100重量部に無機質充填材が5〜200重量部含有さ
れることを特徴とする回路部材接続用接着剤。1. An adhesive for connecting circuit members, which is interposed between opposing circuit electrodes and pressurizes the opposing circuit electrodes to electrically connect the electrodes in the pressing direction. An adhesive for connecting circuit members, wherein 5 to 200 parts by weight of an inorganic filler is contained in parts by weight.
下である請求項1記載の回路部材接続用接着剤。2. The adhesive according to claim 1, wherein the inorganic filler has an average particle size of 3 μm or less.
平均粒径の大きい導電粒子が0.1〜30体積%含有さ
れている請求項1又は2記載の回路部材接続用接着剤。3. The adhesive for connecting circuit members according to claim 1, wherein the adhesive contains 0.1 to 30% by volume of conductive particles having an average particle size larger than the average particle size of the inorganic filler. .
弾性率が30〜2000MPaである請求項1〜3各項
記載の回路部材接続用接着剤。4. The adhesive according to claim 1, wherein the adhesive resin composition has an elastic modulus at 40 ° C. after curing of 30 to 2000 MPa.
樹脂、アクリルゴム、潜在性硬化剤を含有する請求項1
〜4各項記載の回路部材接続用接着剤。5. An adhesive resin composition comprising at least an epoxy resin, an acrylic rubber, and a latent curing agent.
4. The adhesive for connecting circuit members according to any one of Items 4 to 4.
ルエーテル基を含有している請求項5記載の回路部材接
続用接着剤。6. The adhesive according to claim 5, wherein the acrylic rubber contains a glycidyl ether group in its molecule.
項記載の回路部材接続用接着剤。7. The adhesive for connecting circuit members according to claim 1, wherein the adhesive is in the form of a film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22823097A JP4178565B2 (en) | 1997-08-25 | 1997-08-25 | Adhesive for connecting circuit members |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22823097A JP4178565B2 (en) | 1997-08-25 | 1997-08-25 | Adhesive for connecting circuit members |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007325187A Division JP4492692B2 (en) | 2007-12-17 | 2007-12-17 | Adhesive film for connecting circuit members |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH1161088A true JPH1161088A (en) | 1999-03-05 |
JP4178565B2 JP4178565B2 (en) | 2008-11-12 |
Family
ID=16873214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22823097A Expired - Lifetime JP4178565B2 (en) | 1997-08-25 | 1997-08-25 | Adhesive for connecting circuit members |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4178565B2 (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001303016A (en) * | 2000-04-25 | 2001-10-31 | Hitachi Chem Co Ltd | Adhesive composition and adhesive film and method for bonding using the same |
JP2002204052A (en) * | 2000-12-28 | 2002-07-19 | Hitachi Chem Co Ltd | Circuit connecting material and method for connecting circuit terminal using the same as well as connecting structure |
JP2002226808A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit |
US6632320B1 (en) | 1999-08-19 | 2003-10-14 | Sony Chemicals Corp. | Adhesive material and circuit connection method |
JP2006249342A (en) * | 2005-03-14 | 2006-09-21 | Sumitomo Electric Ind Ltd | Adhesive composition and anisotropic conductive adhesive using the same |
JP2007056209A (en) * | 2005-08-26 | 2007-03-08 | Sumitomo Electric Ind Ltd | Adhesive for circuit connection |
CN100383211C (en) * | 1999-12-09 | 2008-04-23 | 索尼化学&信息部件株式会社 | Thermoset binding material |
JP2008147681A (en) * | 2007-12-17 | 2008-06-26 | Hitachi Chem Co Ltd | Adhesive film for connecting circuit member |
US7588698B2 (en) | 2004-12-16 | 2009-09-15 | Sumitomo Electric Industries, Ltd. | Circuit connecting adhesive |
JP2010010694A (en) * | 2009-08-06 | 2010-01-14 | Sony Chemical & Information Device Corp | Method for forming connecting structure |
JP2011006658A (en) * | 2009-05-29 | 2011-01-13 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet for connection of circuit member, and process for manufacture of semiconductor device |
JP2011080033A (en) * | 2009-05-29 | 2011-04-21 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet, and method of manufacturing semiconductor device |
JP2011132541A (en) * | 2011-03-22 | 2011-07-07 | Sumitomo Electric Ind Ltd | Adhesive composition |
-
1997
- 1997-08-25 JP JP22823097A patent/JP4178565B2/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6632320B1 (en) | 1999-08-19 | 2003-10-14 | Sony Chemicals Corp. | Adhesive material and circuit connection method |
CN100383211C (en) * | 1999-12-09 | 2008-04-23 | 索尼化学&信息部件株式会社 | Thermoset binding material |
JP2001303016A (en) * | 2000-04-25 | 2001-10-31 | Hitachi Chem Co Ltd | Adhesive composition and adhesive film and method for bonding using the same |
JP2002204052A (en) * | 2000-12-28 | 2002-07-19 | Hitachi Chem Co Ltd | Circuit connecting material and method for connecting circuit terminal using the same as well as connecting structure |
JP2002226808A (en) * | 2001-01-31 | 2002-08-14 | Hitachi Chem Co Ltd | Adhesive for connecting circuit |
US7588698B2 (en) | 2004-12-16 | 2009-09-15 | Sumitomo Electric Industries, Ltd. | Circuit connecting adhesive |
JP2006249342A (en) * | 2005-03-14 | 2006-09-21 | Sumitomo Electric Ind Ltd | Adhesive composition and anisotropic conductive adhesive using the same |
JP2007056209A (en) * | 2005-08-26 | 2007-03-08 | Sumitomo Electric Ind Ltd | Adhesive for circuit connection |
JP2008147681A (en) * | 2007-12-17 | 2008-06-26 | Hitachi Chem Co Ltd | Adhesive film for connecting circuit member |
JP4492692B2 (en) * | 2007-12-17 | 2010-06-30 | 日立化成工業株式会社 | Adhesive film for connecting circuit members |
JP2011006658A (en) * | 2009-05-29 | 2011-01-13 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet for connection of circuit member, and process for manufacture of semiconductor device |
JP2011080033A (en) * | 2009-05-29 | 2011-04-21 | Hitachi Chem Co Ltd | Adhesive composition, adhesive sheet, and method of manufacturing semiconductor device |
JP2010010694A (en) * | 2009-08-06 | 2010-01-14 | Sony Chemical & Information Device Corp | Method for forming connecting structure |
JP2011132541A (en) * | 2011-03-22 | 2011-07-07 | Sumitomo Electric Ind Ltd | Adhesive composition |
Also Published As
Publication number | Publication date |
---|---|
JP4178565B2 (en) | 2008-11-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3342703B2 (en) | Film adhesive for circuit connection and circuit board | |
JP4178565B2 (en) | Adhesive for connecting circuit members | |
JPH10226769A (en) | Film adhesive and method for connection | |
JP4045620B2 (en) | Film adhesive for circuit connection | |
JP4433564B2 (en) | Adhesive for circuit connection | |
JPH1150032A (en) | Connection member for circuit and circuit board | |
JP4440352B2 (en) | Adhesive for connecting circuit members | |
JP4514840B2 (en) | Adhesive for connecting circuit members | |
JP4928378B2 (en) | Adhesive for connecting circuit members | |
JP2007113012A (en) | Adhesive for connecting circuit members | |
JP4151081B2 (en) | Adhesive for connecting circuit members | |
JP4631979B2 (en) | Circuit member connecting adhesive, circuit board and manufacturing method thereof | |
JP4492692B2 (en) | Adhesive film for connecting circuit members | |
JP4055583B2 (en) | Adhesive composition for circuit connection, circuit terminal connection method using the same, and circuit terminal connection structure | |
JP3925746B2 (en) | Circuit board | |
JP5378261B2 (en) | Adhesive for connecting circuit members | |
KR101000798B1 (en) | Anisotropic conductive film adhesive and flat panel display manufactured using the same | |
JP4000655B2 (en) | Film-like adhesive for circuit connection, circuit board and IC card | |
JPH1167818A (en) | Circuit plate | |
JP3835584B2 (en) | Electronic component equipment | |
JPH10289927A (en) | Circuit board | |
JP4725568B2 (en) | Film adhesive for circuit connection | |
JP3801341B2 (en) | Electronic component equipment | |
JP2008115400A (en) | Adhesive for connecting circuit members | |
JP2009203478A (en) | Adhesive for connecting circuit member |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040806 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070510 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070531 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070730 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20070730 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071016 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071217 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080122 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080324 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080515 |
|
A911 | Transfer of reconsideration by examiner before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20080716 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080805 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080818 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110905 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110905 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120905 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120905 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130905 Year of fee payment: 5 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130905 Year of fee payment: 5 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |