JPH11256041A - Inorganic resin composition - Google Patents
Inorganic resin compositionInfo
- Publication number
- JPH11256041A JPH11256041A JP6133798A JP6133798A JPH11256041A JP H11256041 A JPH11256041 A JP H11256041A JP 6133798 A JP6133798 A JP 6133798A JP 6133798 A JP6133798 A JP 6133798A JP H11256041 A JPH11256041 A JP H11256041A
- Authority
- JP
- Japan
- Prior art keywords
- zirconium
- weight
- parts
- resin composition
- pts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 15
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 17
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000013522 chelant Substances 0.000 claims abstract description 13
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims abstract description 8
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims abstract description 8
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 8
- -1 silane compound Chemical class 0.000 abstract description 14
- 229910000077 silane Inorganic materials 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000004593 Epoxy Substances 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract 4
- 239000010408 film Substances 0.000 description 16
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011521 glass Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 150000003755 zirconium compounds Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001029 thermal curing Methods 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VQFQVYFUZUTIMU-UHFFFAOYSA-N triethoxy(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)silane Chemical compound C1C(C[Si](OCC)(OCC)OCC)CCC2OC21 VQFQVYFUZUTIMU-UHFFFAOYSA-N 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- SQAZDQFHAOTWGX-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(C(C)C[Si](OCC)(OCC)OCC)CCC2OC21 SQAZDQFHAOTWGX-UHFFFAOYSA-N 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- LQZHZFUSFHLGHE-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(C(C)C[Si](OC)(OC)OC)CCC2OC21 LQZHZFUSFHLGHE-UHFFFAOYSA-N 0.000 description 1
- ARKBFSWVHXKMSD-UHFFFAOYSA-N trimethoxysilylmethanamine Chemical compound CO[Si](CN)(OC)OC ARKBFSWVHXKMSD-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、比較的低温での熱
処理により高硬度の薄層被膜を形成できる無機系樹脂組
成物に関するものである。本発明組成物によれば、ガラ
ス,セラミックス,金属,合成樹脂などの表面に耐磨耗
性にして高硬度の薄層被膜を容易に形成できるので、非
常に広い分野における被膜形成に適用することが可能で
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inorganic resin composition capable of forming a thin film having high hardness by heat treatment at a relatively low temperature. According to the composition of the present invention, it is possible to easily form a high-hardness thin layer coating on the surface of glass, ceramics, metal, synthetic resin, etc. by applying abrasion resistance. Is possible.
【0002】[0002]
【従来の技術】一般に、PMMA(ポリメチルメタアク
リレート),PC(ポリカーボネート),PVC(ポリ
塩化ビニル),PET(ポリエチレンテレフタレート)
などの熱可塑性樹脂(以下「樹脂」という)で成形する
製品は、安価でかつ容易に成形できるとともに、ガラス
製品に比べ軽量で耐衝撃性および透明性に優れているた
めに広範に使用されている。2. Description of the Related Art Generally, PMMA (polymethyl methacrylate), PC (polycarbonate), PVC (polyvinyl chloride), PET (polyethylene terephthalate)
Products molded with thermoplastic resins (hereinafter referred to as "resins") are widely used because they are inexpensive and easy to mold, and are lighter and have better impact resistance and transparency than glass products. I have.
【0003】しかしながら、上記樹脂は一般に表面硬度
が、ガラス製品に比ベかなり劣っているため、成形後の
製品輸送中,取付け中,使用中などにその表面が損傷
し、製品歩留まりの低下や商品価値の低下を招くという
問題があったので、これらの製品の表面硬度を向上させ
たいという要請があった。かかる要請は、上記樹脂製品
に限らず、ガラスや金属材料製のものについても同様に
存在した。そこで従来から、製品の表面に樹脂組成物を
塗布し硬化させることにより被膜を形成して、その製品
の表面硬度を高めるための数多くの方法が提案されてき
ているところである。However, the surface hardness of the above resin is generally inferior to that of glass products, so that the surface of the resin is damaged during transportation of the product, during installation, during use, and the like, resulting in a decrease in product yield and a decrease in product yield. Since there was a problem of lowering the value, there was a demand to improve the surface hardness of these products. Such a request exists not only for the above resin products but also for those made of glass or a metal material. Therefore, a number of methods for increasing the surface hardness of a product by forming a film by applying and curing a resin composition on the surface of the product have been proposed.
【0004】その方法として、良く知られているのは、
(1)アルコキシシランを主成分とし、場合によりこれ
にコロイダルシリカを配合した塗料を、樹脂製品の表面
に塗布して加熱する熱硬化被膜形成方法、(2)1分子
内に2個以上の(メタ)アクリル基を有する多官能性モ
ノマー(単量体)を主成分とする塗料を、樹脂製品の表
面に塗布して、これに紫外線のような活性エネルギー線
を照射する紫外線硬化被膜形成方法などである。A well-known method is as follows.
(1) A method of forming a thermosetting film in which a coating material containing alkoxysilane as a main component and optionally colloidal silica is applied to the surface of a resin product and heated, and (2) two or more ( A method of forming a UV-cured film by applying a coating mainly composed of a polyfunctional monomer (monomer) having a (meth) acrylic group to the surface of a resin product and irradiating the surface with an active energy ray such as ultraviolet light. It is.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、(1)
の熱硬化被膜形成方法は、無機系成分の比率が比較的高
い材料を主にしているため耐摩耗性向上効果が大きい反
面、熱硬化によるアルコキシシランの重縮合によって硬
度を高めるものであるために、比較的高い温度で長時間
処理しなければならないとともに、この高温長時間処理
は、PMMAのように耐熱性の乏しい樹脂材料を使用し
た製品には好ましいものでない。(2)の紫外線硬化被
膜形成法は、低温短時間硬化性であるという利点がある
ものの、硬化塗膜の耐摩耗性,耐久性,密着性などの性
能が十分とはいえないのが現状である。However, (1)
Because the method of forming a thermosetting film is mainly made of a material having a relatively high ratio of inorganic components, the effect of improving abrasion resistance is great, but the hardness is increased by polycondensation of alkoxysilane by thermosetting. In addition, the treatment must be performed at a relatively high temperature for a long time, and this high-temperature long-time treatment is not preferable for a product using a resin material having poor heat resistance such as PMMA. Although the method (2) of forming an ultraviolet-cured coating film has the advantage of being able to be cured at a low temperature for a short time, at present the performance of the cured coating film such as abrasion resistance, durability and adhesion is not sufficient. is there.
【0006】本発明は、PMMAをはじめとする各種樹
脂,ガラス,セラミックス,金属などの表面に良く密着
し、かつまた、耐摩耗性,耐久性,密着性が良く、耐擦
傷性を有する薄層被膜を容易に形成することができる無
機系樹脂組成物を得、これによって上記課題を解決しよ
うとするものである。[0006] The present invention provides a thin layer having good abrasion resistance, durability, adhesion, and abrasion resistance, which adheres well to the surface of various resins including PMMA, glass, ceramics, and metals. An object of the present invention is to obtain an inorganic resin composition capable of easily forming a coating film, thereby solving the above-mentioned problems.
【0007】[0007]
【課題を解決するための手段】すなわち、本発明は、エ
ポキシ基含有アルコキシシランの1種または2種以上の
加水分解または共加水分解物,アミノシランおよびジル
コニウムキレートからなることを特徴とする無機系樹脂
組成物に係わる。That is, the present invention provides an inorganic resin comprising one or more hydrolyzed or co-hydrolyzed products of epoxy group-containing alkoxysilane, aminosilane and zirconium chelate. Related to the composition.
【0008】上記において、エポキシ基含有アルコキシ
シランの1種または2種以上の加水分解または共加水分
解物が100重量部,アミノシランが10〜100重量
部,ジルコニウムキレートが酸化ジルコニウムとして
0.5〜25重量部,好ましくは1〜10重量部である
ことが好適である。In the above, 100 parts by weight of one or more hydrolyzates or co-hydrolysates of an epoxy group-containing alkoxysilane, 10 to 100 parts by weight of aminosilane, and zirconium chelate of 0.5 to 25 as zirconium oxide. It is suitable that the amount is from 1 to 10 parts by weight.
【0009】また、上記ジルコニウムキレートとして
は、下記一般式で表されるジルコニウムキレートが好ま
しい。 Zr(lig)n (OR)4-n ここで、ligは、アセチルアセトンやエチルアセトア
セテートのようなキレート形成基を、Rはアルキル基
を、nは1〜4の整数を示す。The zirconium chelate is preferably a zirconium chelate represented by the following general formula. Zr (lig) n (OR) 4-n where lig represents a chelate-forming group such as acetylacetone or ethyl acetoacetate, R represents an alkyl group, and n represents an integer of 1 to 4.
【0010】本発明者は、従来の熱硬化性無機系樹脂組
成物について、成分とその成分の機能分担について解析
を行い、特定のシラン化合物誘導体に、低温硬化性と硬
度向上性を付与する特定の触媒を組み合わせることによ
り、上記課題を解決できるとの知見のもとに鋭意検討を
行った結果、シラン化合物誘導体としては、特開昭54
−63176に記載されている、エポキシ基含有アルコ
キシシランの1種または2種以上の加水分解または共加
水分解物100重量部およびアミノシラン10〜100
重量部を主成分とするシラン化合物誘導体が好ましく利
用できることを見い出し、また、低温硬化性と硬度向上
性を付与する特定の触媒としては、一般式 Zr(lig)n (OR)4-n ここで、ligは、アセチルアセトンやエチルアセトア
セテートのようなキレート形成基を、Rはアルキル基
を、nは1〜4の整数を示す。で表されるジルコニウム
化合物が好適であることを見い出したものである。The present inventor has analyzed the components of the conventional thermosetting inorganic resin composition and the functions of the components, and provided a specific silane compound derivative with a low-temperature curability and a hardness improving property. As a result of diligent studies based on the finding that the above problem can be solved by combining the catalysts described in
100 parts by weight of one or more hydrolyzed or co-hydrolyzed products of epoxy group-containing alkoxysilanes and aminosilanes 10 to 100 described in US Pat.
It has been found that a silane compound derivative whose main component is parts by weight can be preferably used, and a specific catalyst for imparting low-temperature curability and hardness improvement properties is represented by the general formula Zr (lig) n (OR) 4-n , Lig represents a chelating group such as acetylacetone or ethyl acetoacetate, R represents an alkyl group, and n represents an integer of 1 to 4. Have been found to be suitable.
【0011】本発明に使用できるシラン化合物誘導体
は、あらかじめエポキシ基含有アルコキシシランの1種
または2種以上の加水分解または共加水分解物を作成
し、これにアミノ基含有シランを添加することによって
得られるものが好ましい。The silane compound derivative which can be used in the present invention is obtained by preparing in advance one or more hydrolyzate or co-hydrolyzate of an epoxy group-containing alkoxysilane and adding an amino group-containing silane thereto. Are preferred.
【0012】エポキシ基含有アルコキシシランとして
は、グリシドキシメチルトリメトキシシラン,グリシド
キシメチルトリエトキシシラン,β−グリシドキシメチ
ルトリメトキシシラン、β−グリシドキシメチルトリエ
トキシシラン,γ−グリシドキシメチルトリメトキシシ
ラン、γ−グリシドキシメチルトリエトキシシラン,
3,4−エポキシシクロヘキシルメチルトリエトキシシ
ラン,β−(3,4−エポキシシクロヘキシル)エチル
トリエトキシシラン,β−(3,4−エポキシシクロヘ
キシル)プロピルトリメトキシシラン,β−(3,4−
エポキシシクロヘキシル)プロピルトリエトキシシラン
などを例示できる。Examples of the epoxy silane having an epoxy group include glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, β-glycidoxymethyltrimethoxysilane, β-glycidoxymethyltriethoxysilane, and γ-glycol. Sidoxymethyltrimethoxysilane, γ-glycidoxymethyltriethoxysilane,
3,4-epoxycyclohexylmethyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxycyclohexyl) propyltrimethoxysilane, β- (3,4-
Epoxycyclohexyl) propyltriethoxysilane and the like can be exemplified.
【0013】アミノ基含有シランとしては、アミノメチ
ルトリメトキシシラン,アミノメチルトリエトキシシラ
ン,アミノエチルトリメトキシシラン,アミノエチルト
リエトキシシラン,アミノプロピルトリメトキシシラ
ン,アミノプロピルトリエトキシシラン,(β−アミノ
エチル)−β−アミノプロピルトリメトキシシラン,
(β−アミノエチル)−β−アミノプロピルメチルジメ
トキシシラン,(β−アミノエチル)−γ−アミノプロ
ピルトリメトキシシランなどを例示することができる。Examples of the amino group-containing silane include aminomethyltrimethoxysilane, aminomethyltriethoxysilane, aminoethyltrimethoxysilane, aminoethyltriethoxysilane, aminopropyltrimethoxysilane, aminopropyltriethoxysilane, (β-amino Ethyl) -β-aminopropyltrimethoxysilane,
(Β-aminoethyl) -β-aminopropylmethyldimethoxysilane, (β-aminoethyl) -γ-aminopropyltrimethoxysilane and the like can be exemplified.
【0014】上記ジルコニウム化合物の具体的な例とし
ては、ジルコニウム・トリブトキシ・アセチルアセトネ
ート,ジルコニウム・ジブトキシ・ビスアセチルアセト
ネート,ジルコニウム・テトラアセチルアセトネート,
ジルコニウム・トリブトキシ・エチルアセトアセテー
ト,ジルコニウム・モノブトキシ・アセチルアセトネー
ト・ビスエチルアセトアセテートなどを例示することが
できる。Specific examples of the zirconium compound include zirconium tributoxy acetylacetonate, zirconium dibutoxy bisacetylacetonate, zirconium tetraacetylacetonate,
Zirconium tributoxy ethyl acetoacetate, zirconium monobutoxy acetylacetonate bisethyl acetoacetate and the like can be exemplified.
【0015】これらは、一般に酸化ジルコニウムに換算
して7.5〜15%程度含有する濃度で有機溶剤溶液と
して、トルエンまたは/およびn−ブタノールなどの溶
剤に溶解した形で市販されている。These are generally commercially available in the form of an organic solvent solution having a concentration of about 7.5 to 15% in terms of zirconium oxide, dissolved in a solvent such as toluene and / or n-butanol.
【0016】本発明においてジルコニウム化合物の添加
重は、上記エポキシ基含有アルコキシシランの1種また
は2種以上の加水分解または共加水分解物100重量部
に対し、酸化ジルコニウムとして0.5〜25重量部の
範囲、好ましくは1〜10重量部の範囲である。0.5
重量部より少ない添加量では、低温硬化性が不十分であ
るため十分な硬度を得られないし、25重量部を超える
添加量ではその効果が飽和し、比較的高価なジルコニウ
ム化合物の割合が増えるため経済的でなくなる。In the present invention, the addition weight of the zirconium compound is 0.5 to 25 parts by weight as zirconium oxide with respect to 100 parts by weight of one or more hydrolyzed or co-hydrolyzed products of the above-mentioned epoxy-containing alkoxysilane. , Preferably in the range of 1 to 10 parts by weight. 0.5
When the amount is less than 25 parts by weight, the low-temperature curability is insufficient, so that sufficient hardness cannot be obtained. It is not economical.
【0017】本発明無機系樹脂組成物においては、加飾
性を高めるために各種染料・顔料を添加することができ
る。このような染料としては、有機溶剤可溶性染料、例
えば保土ヶ谷化学工業からアイゼンスピロン染料として
市販されている金属錯塩染料あるいは大日精化から市販
されている油性用UTCOカラー顔料が好ましく利用で
きる。In the inorganic resin composition of the present invention, various dyes and pigments can be added in order to enhance the decorativeness. As such a dye, an organic solvent-soluble dye, for example, a metal complex salt dye commercially available from Hodogaya Chemical Industry Co., Ltd. as an Eizenspirone dye or a UTCO color pigment for oiliness commercially available from Dainichi Seika is preferably used.
【0018】また、本発明無機系樹脂組成物において、
他の機能性微粒子などを添加することが可能である。機
能性微粒子としては、硬度を向上させるシリカ,ジルコ
ニアなど、導電性付与する酸化インジウム,酸化錫チイ
タン,カーボン,グラファイトなど,熱伝導性を付与す
る酸化マグネシウム,アルミナなどを例示できる。さら
に、塗布性を改良するための濡れ剤,チクソトロピー性
付与剤,希釈溶剤,消泡剤などの添加も可能である。Further, in the inorganic resin composition of the present invention,
Other functional fine particles and the like can be added. Examples of the functional fine particles include silica, zirconia, etc., which improve hardness, indium oxide, tin oxide, titanium oxide, carbon, graphite, etc., which give conductivity, and magnesium oxide, alumina, etc. which give thermal conductivity. Furthermore, it is also possible to add a wetting agent, a thixotropic agent, a diluting solvent, an antifoaming agent and the like for improving the coating property.
【0019】[0019]
【発明の実施の形態】以下、本発明を実施例1〜10に
ついて説明するが、本発明はこれらの実施例に限定され
るものではない。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described with reference to Examples 1 to 10, but the present invention is not limited to these Examples.
【0020】実施例1〜5および比較例1 γ−グリシドキシプロピルトリメトキシシラン100重
量部をエチレングリコールモノエチルエーテル105重
量部に溶解し、これに水45重量部と35%塩酸0.3
重量部を添加し、79℃で8時間反応させた後、室温ま
で冷却し、次いでγ−アミノプロピルトリエトキシシラ
ン50gとエチレングリコールモノエチルエーテル75
重量部を添加して均一に混合し、これをシラン化合物誘
導体(1)とした。Examples 1 to 5 and Comparative Example 1 100 parts by weight of γ-glycidoxypropyltrimethoxysilane were dissolved in 105 parts by weight of ethylene glycol monoethyl ether, and 45 parts by weight of water and 0.3% of 35% hydrochloric acid were added thereto.
The mixture was cooled to room temperature, and then 50 g of γ-aminopropyltriethoxysilane and 75 g of ethylene glycol monoethyl ether were added.
The parts by weight were added and mixed uniformly to obtain a silane compound derivative (1).
【0021】表1の実施例1〜5の各欄に示すジルコニ
ウム化合物溶液4gを、シラン化合物誘導体(1)50
gをキシレン50gで希釈したものに添加し、実施例1
〜5の無機系樹脂組成物液を作成した。4 g of the zirconium compound solution shown in each column of Examples 1 to 5 of Table 1 was mixed with the silane compound derivative (1) 50
g was added to a solution diluted with 50 g of xylene.
To 5 were prepared.
【0022】その各実施例に係る無機系樹脂組成物液を
ガラス板に塗布し、まず80℃下で30分、次いで15
0℃下で30分の熱硬化を行った。得られた被膜の膜厚
は1〜2μmで、無色透明な均一被膜であり、鉛筆硬さ
が7H以上であった(表1参照)。比較のため、ジルコ
ニウム化合物を含まない溶液を用いて同様の実験を行っ
た場合の鉛筆硬さは5〜6Hであった(比較例1)。The inorganic resin composition liquid according to each of the examples is applied to a glass plate, and firstly at 80 ° C. for 30 minutes and then for 15 minutes.
Thermal curing was performed at 0 ° C. for 30 minutes. The resulting film had a thickness of 1 to 2 μm, was a colorless and transparent uniform film, and had a pencil hardness of 7H or more (see Table 1). For comparison, when the same experiment was performed using a solution containing no zirconium compound, the pencil hardness was 5 to 6H (Comparative Example 1).
【0023】[0023]
【表1】 [Table 1]
【0024】実施例6〜9および比較例2 γ−グリシドキシプロピルトリメトキシシラン50重量
部とβ−(3,4−エポキシシクロヘキシル)エチルト
リメトキシシラン50重量部をエチレングリコールモノ
エチルエーテルジアセトンアルコール70重量部に溶解
し、これに水30重量部と35%塩酸0.2重量部を添
加し65℃で5時間反応させた後、室温まで冷却し、次
いで(β−アミノエチル)−γ−アミノプロピルトリメ
トキシシラン25重量部,γ−アミノプロピルトリエト
キシシラン25重量部,エチレングリコールモノエチル
エーテル125重量部を添加して均一に混合し、これを
シラン化合物誘導体(2)とした。Examples 6 to 9 and Comparative Example 2 50 parts by weight of γ-glycidoxypropyltrimethoxysilane and 50 parts by weight of β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane were mixed with ethylene glycol monoethyl ether diacetone. After dissolving in 70 parts by weight of alcohol, 30 parts by weight of water and 0.2 parts by weight of 35% hydrochloric acid were added thereto, reacted at 65 ° C. for 5 hours, cooled to room temperature, and then (β-aminoethyl) -γ 25 parts by weight of -aminopropyltrimethoxysilane, 25 parts by weight of γ-aminopropyltriethoxysilane, and 125 parts by weight of ethylene glycol monoethyl ether were added and uniformly mixed to obtain a silane compound derivative (2).
【0025】このシラン化合物誘導体(2)50gをジ
アセトンアルコール25g,キシレン25gで希釈し、
これに実施例1に示すジルコニウム化合物溶液を4g,
8g,15g,30g添加し、実施例6〜9の無機系樹
脂組成物液を作成した。50 g of this silane compound derivative (2) was diluted with 25 g of diacetone alcohol and 25 g of xylene,
4 g of the zirconium compound solution shown in Example 1 was added thereto.
8 g, 15 g, and 30 g were added to prepare inorganic resin composition liquids of Examples 6 to 9.
【0026】その各実施例に係る無機系樹脂組成物液を
ガラス板に塗布し、まず80℃下で30分、次いで18
0℃下で10分の熱硬化を行った。得られた被膜の膜厚
は1〜2μmで、無色透明な均一被膜であり、鉛筆硬さ
は、各実施例とも7H,7H,7H,7Hであった。比
較のため、ジルコニウム化合物を含まない溶液を用いて
同様の実験を行った場合の鉛筆硬さは5Hであった(比
較例2)。The inorganic resin composition liquid according to each of the examples is applied to a glass plate, first at 80 ° C. for 30 minutes, and then at 18 ° C.
Thermal curing was performed at 0 ° C. for 10 minutes. The film thickness of the obtained film was 1-2 μm, it was a colorless and transparent uniform film, and the pencil hardness was 7H, 7H, 7H, 7H in each example. For comparison, when the same experiment was performed using a solution containing no zirconium compound, the pencil hardness was 5H (Comparative Example 2).
【0027】実施例10および比較例3 実施例1に記載した組成物をPMMA板に塗布し、まず
80℃下で30分、次いで120℃下で2時間の熱硬化
を行った。得られた被膜の膜厚は1〜2μmで、無色透
明な均一被膜であり、鉛筆硬さが7Hであった。比較の
ため、ジルコニウム化合物を含まない溶液(比較例1に
記載の組成物)をPMMA板に塗布し硬化した場合の鉛
筆硬さは4Hであった(比較例3)。Example 10 and Comparative Example 3 The composition described in Example 1 was applied to a PMMA plate, and heat cured at 80 ° C. for 30 minutes and then at 120 ° C. for 2 hours. The thickness of the obtained film was 1-2 μm, it was a colorless and transparent uniform film, and the pencil hardness was 7H. For comparison, when a solution containing no zirconium compound (the composition described in Comparative Example 1) was applied to a PMMA plate and cured, the pencil hardness was 4H (Comparative Example 3).
【0028】[0028]
【発明の効果】以上述べたところから明らかなように、
本発明無機系樹脂組成物は、エポキシ基含有アルコキシ
シランの1種または2種以上の加水分解または共加水分
解物,アミノシランおよびジルコニウムキレートからな
るから、比較的低温での熱処理により高硬度の薄層被膜
を形成できるので、ガラス、セラミックス、金属、樹脂
などの表面に耐磨耗性、高硬度な被膜が容易に形成で
き、非常に広範囲の分野において利用できる。As is apparent from the above description,
Since the inorganic resin composition of the present invention comprises one or more kinds of hydrolysis or co-hydrolysates of epoxy group-containing alkoxysilane, aminosilane and zirconium chelate, a thin layer having high hardness is obtained by heat treatment at a relatively low temperature. Since a film can be formed, a wear-resistant and high-hardness film can be easily formed on the surface of glass, ceramics, metal, resin, etc., and can be used in a very wide range of fields.
Claims (3)
たは2種以上の加水分解または共加水分解物,アミノシ
ランおよびジルコニウムキレートからなることを特徴と
する無機系樹脂組成物。1. An inorganic resin composition comprising one or more hydrolyzed or co-hydrolyzed products of epoxy group-containing alkoxysilane, aminosilane and zirconium chelate.
たは2種以上の加水分解または共加水分解物100重量
部,アミノシラン10〜100重量部およびジルコニウ
ムキレートが酸化ジルコニウムとして0.5〜25重量
部,好ましくは1〜10重量部からなることを特徴とす
る無機系樹脂組成物。2. 100 parts by weight of a hydrolyzate or co-hydrolyzate of one or more of epoxy group-containing alkoxysilanes, 10 to 100 parts by weight of aminosilane and 0.5 to 25 parts by weight of zirconium chelate as zirconium oxide; An inorganic resin composition comprising preferably 1 to 10 parts by weight.
されるジルコニウムキレートであることを特徴とする請
求項1または2記載の無機系樹脂組成物。 Zr(lig)n (OR)4-n ここで、ligは、アセチルアセトンやエチルアセトア
セテートのようなキレート形成基を、Rはアルキル基
を、nは1〜4の整数を示す。3. The inorganic resin composition according to claim 1, wherein the zirconium chelate is a zirconium chelate represented by the following general formula. Zr (lig) n (OR) 4-n where lig represents a chelate-forming group such as acetylacetone or ethyl acetoacetate, R represents an alkyl group, and n represents an integer of 1 to 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6133798A JPH11256041A (en) | 1998-03-12 | 1998-03-12 | Inorganic resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6133798A JPH11256041A (en) | 1998-03-12 | 1998-03-12 | Inorganic resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11256041A true JPH11256041A (en) | 1999-09-21 |
Family
ID=13168231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6133798A Pending JPH11256041A (en) | 1998-03-12 | 1998-03-12 | Inorganic resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11256041A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002008348A1 (en) * | 2000-07-25 | 2002-01-31 | Nihon Yamamura Glass Co., Ltd. | Cold-setting coating composition |
KR100347666B1 (en) * | 1998-09-08 | 2002-11-18 | 주식회사 엘지화학 | Transparent antistatic wear resistant coating composition and preparation method thereof |
JP2008101219A (en) * | 2007-11-07 | 2008-05-01 | Matsushita Electric Works Ltd | Method for imparting anti-fogging property |
JP2011184700A (en) * | 2003-02-12 | 2011-09-22 | Nippon Kayaku Co Ltd | Silicon compound containing epoxy group and thermosetting resin composition |
-
1998
- 1998-03-12 JP JP6133798A patent/JPH11256041A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100347666B1 (en) * | 1998-09-08 | 2002-11-18 | 주식회사 엘지화학 | Transparent antistatic wear resistant coating composition and preparation method thereof |
WO2002008348A1 (en) * | 2000-07-25 | 2002-01-31 | Nihon Yamamura Glass Co., Ltd. | Cold-setting coating composition |
JP2011184700A (en) * | 2003-02-12 | 2011-09-22 | Nippon Kayaku Co Ltd | Silicon compound containing epoxy group and thermosetting resin composition |
JP2008101219A (en) * | 2007-11-07 | 2008-05-01 | Matsushita Electric Works Ltd | Method for imparting anti-fogging property |
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