JPH11233392A - Substrate processing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing equipment the maintenance operation of a substrate processing part which has a filter at the upper part is easy. SOLUTION: A rotating type coating unit and a rotating type development unit are arranged at the periphery of the transfer region C of substrate processing equipment. At the upper part of the processing space of the rotating type coating unit and the rotating type development unit, an air control unit composed of a fan unit, and a filter unit is arranged. The filter unit is provided with a sliding mechanism 3 for shifting the filter horizontally. A sliding mechanism 36 is provided with a fixed rail 37 and a movable frame 40, which freely shifts in the horizontal direction along the fixed rail 37, and shifts the filter in the horizontal direction by mounting it on a movable frame 40. The filter can be shifted to the transfer region C by horizontally moving the movable frame 40 of the sliding mechanism 36.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate processing apparatus provided with a substrate processing section for performing a predetermined processing on a substrate.

[0002]

2. Description of the Related Art A substrate processing apparatus is used to perform predetermined processing on substrates such as semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for photomasks, and glass substrates for optical disks. For example, in a semiconductor device manufacturing process, a substrate processing apparatus in which each of a series of processes is unitized and a plurality of processing units are integrated is used in order to increase production efficiency.

FIG. 11 is a perspective view showing a configuration of a conventional substrate processing apparatus. The substrate processing apparatus of FIG. 11 has processing areas E and F and a transport area G.

In the processing area E, a rotary coating unit (spin coater) 52a for applying a processing liquid to a substrate and a rotary developing unit (spin developer) 52b for performing a developing process on the substrate are arranged in parallel. In the processing region F, a plurality of heating units (hot plates) HP for performing a heating process on the substrate and a plurality of cooling units (cooling plates) CP for performing a cooling process on the substrate are arranged. In the transfer area G, a transfer unit 55 that transfers the substrate is provided.

The processing areas E and F and the transport area G
A loading and unloading device (indexer) 51 for storing the substrate W and loading and unloading the substrate W is provided at one end of the device.
Is arranged. The loading / unloading device 51 includes a plurality of cassettes 53 for storing the substrates W and a transfer robot 54 for loading and unloading the substrates W. Loading / unloading device 51
The transfer robot 54 moves in the direction of the arrow U, takes out the substrate W from the cassette 53 and passes it to the transport unit 55,
The substrate W subjected to the series of processes is received from the transport unit 55 and returned to the cassette 53.

The transport unit 55 transports the substrate W in the transport area G in the direction of the arrow S, carries the substrate W in and out of each of the processing units, and transfers the substrate W to and from the transfer robot 54. Delivery of the substrate W is performed.

In recent years, a large number of processing units are mounted on a single substrate processing apparatus in order to efficiently process a large amount of substrates. Further, the diameter of the substrate is increased in order to improve productivity, and accordingly, the size of each processing unit is also increased. As a result, the size of a substrate processing apparatus in which a large number of processing units are integrated tends to increase, and the footprint (installation area) tends to increase. Therefore, there is a demand for a substrate processing apparatus capable of effectively using a space in a clean room while suppressing an increase in a footprint.

[0008] Therefore, there has been proposed a substrate processing apparatus in which footprints are reduced by stacking processing units in the vertical direction. For example, JP-A-8-4601
In the substrate processing apparatus disclosed in Japanese Patent Publication No. 0, a rotary coating unit and a rotary developing unit are vertically stacked, and a heating unit and a cooling unit are stacked in multiple stages.

An air adjusting unit for lowering a clean air flow is provided above the plurality of stacked processing units. As a result, the substrate transfer area and the like are kept in a clean atmosphere. Further, a filter is provided between the rotary developing unit and the rotary coating unit which are vertically stacked. Thus, clean air that has passed through the filter is supplied into the rotary coating unit, and the processing space of the rotary coating unit is maintained in a clean atmosphere.

In such a substrate processing apparatus, for example, when maintenance work is performed on the rotary coating unit, the filter disposed above the rotary coating unit is removed, and a work space is secured to perform the work. The removed filter is usually prepared with a pedestal around the substrate processing equipment,
It is placed on the table.

[0011]

However, the filter has a very delicate structure, and is configured so that only the side surface of the filter can be gripped. If the upper and lower surfaces of the filter are damaged, the performance of removing particles and the like is reduced. For this reason, great care is required in the removal and installation of the filter, which makes the maintenance work complicated and increases the work time.

In addition, the atmosphere around the substrate processing apparatus has a lower degree of cleanliness than the inside of the substrate processing apparatus, and contains ammonia and fine particles. Therefore, when a filter is placed around the substrate processing apparatus, ammonia, particles, and the like adhere to the filter surface during maintenance work, and the filter removal performance is reduced. Further, when the filter to which particles or the like have adhered is attached again inside the substrate processing apparatus due to the end of the maintenance work, the processing atmosphere of the substrate processing apparatus may be contaminated by the adhered particles or the like, and a defect may occur in the substrate processing. .

An object of the present invention is to provide a substrate processing apparatus in which a maintenance operation of a substrate processing section having a filter disposed above is easy.

Another object of the present invention is to provide a substrate processing apparatus in which a filter is not contaminated by particles in the surrounding atmosphere during maintenance work.

[0015]

Means for Solving the Problems and Effects of the Invention A substrate processing apparatus according to a first invention has a processing space, and performs a predetermined processing on a substrate in the processing space; The apparatus includes a filter provided above the processing space, and support means for movably supporting the filter at a position above the processing space and at a predetermined position outside the processing space.

In the substrate processing apparatus according to the first invention, a filter is provided above the processing space of the substrate processing section, and clean air passing through the filter is supplied into the processing space, so that the substrate is processed. The processing space of the processing unit is kept in a clean state. The filter is movably supported by a support means at a position above the processing space and at a predetermined position outside the processing space. For this reason, by moving the filter out of the processing space during maintenance, a large space can be secured above the processing space, and the working space for maintenance of the substrate processing unit is expanded. This facilitates maintenance work of the substrate processing unit. Further, the filter is supported by a support means outside the processing space. Therefore, there is no need to remove the filter from the substrate processing apparatus, and the maintenance work of the substrate processing unit is simplified. Further, it is not necessary to provide a space for mounting the removed filter around the substrate processing apparatus, and the space around the substrate processing apparatus can be reduced. In addition, the filter is prevented from being damaged while the filter is placed around the substrate processing apparatus.

A substrate processing apparatus according to a second aspect of the present invention, in the configuration of the substrate processing apparatus according to the first aspect, further includes an air supply unit for supplying a clean air flow to an area adjacent to the substrate processing unit. The predetermined position is provided in the adjacent area.

In this case, at the time of maintenance of the substrate processing section, the filter is moved to an adjacent area where a clean air flow is supplied by the air adjusting section. For this reason, the filter is supported in a clean atmosphere, thereby preventing the filter from being contaminated by particles and the like, preventing a decrease in the performance of removing the particles and the like, and also bringing the particles and the like into the substrate processing unit at the end of maintenance and causing the substrate to be removed. Contamination of the atmosphere in the processing section can be prevented.

A substrate processing apparatus according to a third aspect of the present invention, in the configuration of the substrate processing apparatus according to the first aspect of the present invention, includes a transport unit disposed in a transport area adjacent to the substrate processing unit and transporting the substrate to the substrate processing unit. And an air adjusting unit for supplying a clean air flow to the transport area, wherein a predetermined position is provided in the transport area.

In this case, during maintenance of the substrate processing section, the filter is moved to the transport area. A clean air flow is supplied to the transfer area from the air adjustment unit. For this reason, the filter is kept in a clean atmosphere, and is prevented from being contaminated by particles and the like. This prevents a decrease in the performance of removing particles and the like, and also prevents the particles and the like from being brought into the substrate processing unit.

A substrate processing apparatus according to a fourth aspect of the present invention is the substrate processing apparatus according to the first aspect of the present invention, wherein the transport means for transporting the substrate to the substrate processing section and the substrate storage container for storing the substrate are mounted. A loading section, a loading / unloading section disposed in a loading / unloading area adjacent to the substrate processing section, and loading / unloading means for loading / unloading the substrate between the transporting means and the loading section; and a clean air flow to the loading / unloading area. A supply air adjusting unit, and a predetermined position is provided in the carry-in / carry-out area.

In this case, during maintenance of the substrate processing section, the filter is moved to the carry-in / carry-out area and is supported. A clean air flow is supplied to the carry-in / out area by the air adjusting unit. Therefore, the filter is kept in a clean atmosphere. This prevents the filter removal performance from being reduced due to the attachment of particles and the like, and also prevents the particles and the like from being brought into the substrate processing unit.

According to a fifth aspect of the present invention, in the substrate processing apparatus according to the first aspect of the present invention, the substrate processing apparatus further includes a transfer unit configured to transfer the substrate to the substrate processing unit and a transfer area adjacent to the substrate processing unit. A transfer means for transferring the substrate between the transfer means and the external device; and an air adjusting unit for supplying a clean air flow to the transfer area, wherein the predetermined position is provided in the transfer area. is there.

In this case, at the time of maintenance of the substrate processing section, the filter is moved to the transfer area and supported. A clean air flow is supplied to the transfer area by the air adjustment unit. For this reason, the filter is kept in a clean atmosphere. This prevents the removal performance of particles and the like of the filter from being reduced due to the attachment of dust and the like, and also prevents the particles and the like from being brought into the substrate processing unit.

A substrate processing apparatus according to a sixth aspect of the present invention is the substrate processing apparatus according to the third aspect of the present invention, wherein:
A substrate holding unit that holds the substrate and moves at least in the vertical direction, and transfers the substrate to and from the substrate processing unit,
The apparatus further includes control means for controlling the operation of the substrate holding unit so that the substrate holding unit does not interfere with the filter during maintenance of the substrate processing unit.

In this case, during maintenance of the substrate processing section, the filter is moved to the transport area. In the transfer area, a transfer unit having a substrate holding unit that moves in the vertical direction is provided.
Therefore, the control unit controls the operation of the substrate holding unit so that the filter moved to the transfer area does not interfere with the substrate holding unit of the transfer unit. As a result, during maintenance of the substrate processing unit,
An accident in which the filter and the substrate holder interfere with each other can be prevented.

A substrate processing apparatus according to a seventh aspect of the present invention is the substrate processing apparatus according to the sixth aspect, further comprising a detecting means for detecting a movement of the filter, wherein the control means controls the movement of the filter by the detecting means. When the detection is detected, the substrate holding unit is retracted to a position where the substrate holding unit does not interfere with the filter.

In this case, the filter is moved to the transport area manually by the operator. The detecting means detects the movement of the filter. When the movement of the filter is detected,
The control unit retracts the substrate holding unit to a position where it does not interfere with the filter. Accordingly, even when the operator moves the filter without confirming the position of the substrate holding unit, it is possible to prevent the filter from interfering with the substrate holding unit.

The substrate processing apparatus according to an eighth aspect of the present invention is the substrate processing apparatus according to the third aspect, wherein the transporting means comprises:
A substrate holding unit that holds the substrate and moves at least in the vertical direction, and transfers the substrate to and from the substrate processing unit,
Input means for inputting a command for maintenance of the substrate processing unit,
The apparatus further includes control means for controlling the operation of the substrate holding unit so that the substrate holding unit does not interfere with the filter when a filter maintenance command is input.

In this case, when a maintenance command is input from the input unit during maintenance of the substrate processing unit, the control unit controls the operation of the substrate holding unit based on the input maintenance command so that the substrate holding unit does not interfere with the filter. Control. Thereby, before the operator moves the filter, the substrate holding unit is operated so as not to interfere with the filter, and it is possible to prevent an accident that the filter interferes with the substrate holding unit.

A substrate processing apparatus according to a ninth aspect of the present invention is the substrate processing apparatus according to the third aspect of the present invention, wherein
A substrate holding unit that holds the substrate and moves at least in the vertical direction, and transfers the substrate to and from the substrate processing unit,
When the substrate holding unit is at a predetermined position, the apparatus further comprises a prohibition unit for prohibiting the movement of the filter.

In this case, the prohibiting means prohibits the movement of the filter when the substrate holding unit is at a position where it interferes with the filter. Thus, it is possible to prevent an accident that the filter interferes with the substrate holding unit.

A substrate processing apparatus according to a tenth aspect of the present invention comprises:
In the configuration of the substrate processing apparatus according to any one of the ninth to ninth aspects, the support means is fixed above the processing space of the substrate processing unit, supports the guide member extending in the horizontal direction, and the filter, and And a movable member that is movable.

In this case, when the operator pushes the moving member toward a predetermined position outside the processing space, the moving member moves along the guide member while supporting the filter. When the operator pulls the moving member back toward the position above the processing space of the substrate processing unit, the moving member moves along the guide member to a position above the processing space of the substrate processing unit while supporting the filter. Thus, the filter can be moved to a position above the processing space and a predetermined position outside the processing space by a simple operation, and maintenance work of the substrate processing unit can be performed easily in a short time.

The substrate processing apparatus according to the eleventh aspect of the present invention has a first
In the configuration of the substrate processing apparatus according to the first aspect, the substrate processing unit further includes a housing surrounding the processing space, the filter is detachably attached to a lower surface of a top plate of the housing, and the moving member is mounted on the top plate. The removed filter is movably supported.

In this case, when the operator removes the filter from the lower surface of the top plate of the casing of the substrate processing section, the filter is supported by the moving member. Then, the operator can move the filter to a position above the processing space of the substrate processing unit and a predetermined position outside the processing space by moving the moving member. Thus, the filter can be moved by a simple operation.

[0037]

FIG. 1 is a perspective view of a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a front sectional view of the substrate processing apparatus of FIG. 1, and FIG. 3 is a sectional view taken along line HH in FIG. FIG. 4 is a sectional view taken along line II in FIG.

1 to 4, the substrate processing apparatus has a processing area A, a carry-in / out area B, and a transfer area D. The carry-in / carry-out area B is arranged at one end of the processing area A, and the transfer area D is arranged at the other end of the processing area A. Further, a transport area C is disposed in the processing area A. Hereinafter, the alignment direction of the processing area A, the loading / unloading area B, and the delivery area D is referred to as a Y-axis direction, a direction orthogonal to the Y-axis direction is referred to as an X-axis direction, and a vertical direction is referred to as a Z-axis direction.

The processing area A includes a first hierarchical level A1, a second hierarchical level A2, a third hierarchical level A3, and a fourth hierarchical level A4 arranged in order from bottom to top. The chemical unit 1 is arranged on the first level A1. The chemical unit 1 stores various processing liquids (chemical liquids), waste liquids, pumps, and exhaust systems.

In the second level A2, a plurality of rotation processing units are arranged. In this embodiment, a rotation type coating unit (spin coater) for performing a rotation coating process of a processing liquid on a substrate.
2a and two rotary developing units (spin developers) 2b for performing a developing process on the substrate are arranged.

In the third hierarchy A3, ULPA (Ultra Lo
w An air conditioning unit 3 including a filter unit 32 including a filter such as a Penetration Air) filter and a chemical adsorption filter and a fan unit 31 are arranged.
The structure of the air adjustment unit 3 will be described later in detail.

In the fourth level A4, a plurality of heat treatment units are arranged. In this embodiment, a plurality of cooling units (cooling plates) CP for performing a cooling process on the substrate and a plurality of heating units for performing a heating process on the substrate are provided. The units (hot plates) HP are arranged in a plurality of stages.

The processing unit groups stacked in multiple stages in the second to fourth layers A2 to A4 are arranged so as to surround the transfer area C. In the center of the transfer area C, a lower transfer unit 4 and an upper transfer unit 5 are arranged. The lower transfer unit 4 includes a substrate holding unit 14 that includes two arms 14a that hold the substrate W and can move forward and backward in a horizontal direction and a moving unit 14b that moves the arm 14a forward and backward. The substrate holding unit 14 is connected to an elevating mechanism and a rotating mechanism, moves up and down in the transport area C, and rotates around a vertical axis.

The upper transfer unit 5 is provided with two arms 15a and 2
The substrate holding unit 15 includes a moving unit 15b that moves the arm 15a forward and backward. The substrate holding unit 15 is connected to an elevating mechanism and a turning mechanism, and moves up and down and turns in the transport area C.

The loading / unloading area B includes a first story B1, a second story B2, and a third story B3 arranged in order from bottom to top. In the first level B1 of the loading / unloading area B, a loading / unloading device (indexer) 6 for storing the substrates and loading / unloading the substrates is arranged. The loading / unloading device 6 includes a plurality of cassettes 9 for storing the substrates W and a transfer robot 10 for loading and unloading the substrates.
The transfer robot 10 takes out the substrate W from the cassette 9 and transfers it to the lower transfer unit 4 in the transfer area C, receives the substrate W subjected to the series of processing from the lower transfer unit 4, and returns the substrate W to the cassette 9.

An air conditioning unit 7 including a filter and a fan is arranged on the second level B2. In the third level B3, an electric control unit 8 is arranged.

The transfer area D includes transfer means (not shown) for transferring the substrate, and transfers the substrate to and from an external device.

An air adjusting unit 12 composed of a filter and a fan is arranged above the transport area C.
The air adjustment unit 12 supplies a clean airflow (downflow) from above to below the transport area C. As a result, the transport area C is kept in a clean atmosphere.

In the loading / unloading area B, a clean air flow is supplied by the air adjusting unit 7 around the moving area of the transfer robot 10. Thereby, the transfer robot 1
The area around the 0 movement area is also kept in a clean atmosphere.

Further, an air adjusting unit (not shown) including a filter and a fan is arranged above the transfer area D. Thereby, the inside of the transfer area D is maintained in a clean atmosphere.

The substrate processing apparatus includes a control unit 49 (see FIG. 6) for controlling the operation of each processing unit, loading / unloading device 6, lower transport unit 4, upper transport unit 5, and the like. An input unit for inputting various data and commands for substrate processing is connected to the control unit 49.

Next, the air adjusting unit 3 in the processing area A will be described. Hereinafter, the air adjusting unit 3 provided in the rotary coating unit 2a will be described as an example. FIG. 5 is a front sectional view of the air adjustment unit. FIG. 6 is a perspective view of a main part of the filter unit. The air adjustment unit 3 includes a fan unit 31 disposed on an upper side,
And a filter unit 32 arranged on the lower side.

The fan unit 31 has a fan 31a for lowering the air. The air flow supplied by the fan 31a is applied to the opening 31c of the bottom plate 31b of the fan unit 31.
And is led to the filter unit 32 side.

The filter unit 32 comprises a filter 33 and a slide mechanism 36. Filter 33 is U
It consists of an LPA filter or a chemical adsorption filter.
Here, the rotary coating unit 2a includes the frames 21 and
2. It has a housing composed of an outer plate (not shown), a top plate 20 and the like, and the filter 33 is attached to the lower surface of the top plate 20 of the rotary coating unit 2a by mounting bolts 35.

The upper and lower surfaces of the filter 33 have exposed material surfaces of the filter, and the outer peripheral surface of the side is surrounded by a metal material. Frames 34 having an L-shaped cross section are fixed to both side surfaces of the filter 33.

The top plate 20 is formed with an opening through which air descending from the fan unit 31 passes, and the filter 33 transmits the air descending through the opening of the top plate 20 to allow the lower rotary coating unit 2a to pass therethrough. It leads to the processing space 16.

The slide mechanism 36 moves the filter 33 removed from the top plate 20 in the horizontal direction.
It has a fixed rail 37 and a movable frame 40. The pair of fixed rails 37 are made of a plate-shaped member having an S-shaped cross section, and are attached to the frame 22 of the rotary coating unit 2a. The horizontal surface 37 a below the fixed rail 37 serves as a guide surface for guiding the movement of the movable frame 40.

The movable frame 40 includes a pair of movable rails 41.
And a connecting frame 42 connecting one end of a pair of movable rails 41. Each movable rail 41 is made of a plate-like member having an L-shaped cross section, and has an upper guide groove 43 and a lower guide groove 44 formed on its vertical wall surface. The horizontal surface 41 a of the movable rail 41 serves as a support surface for supporting the frame 34 formed on the side surface of the filter 33.

The movable frame 40 is slidably mounted on the guide surface 37a of the fixed rail 37. In this state, the positions of the guide groove 38 of the fixed rail 37 and the lower guide groove 44 of the movable rail 41 coincide with each other, and the connecting bolt 46 is inserted through each of the guide grooves 38 and 44. Connecting bolt 46
A nut is screwed into the threaded portion of the connecting bolt 46.
The fixed rail 37 and the movable rail 41 are connected by a nut and a nut. By loosening the bolt 46 and the nut, the movable rail 41 can slide along the fixed rail 37, and by fastening the bolt 46 and the nut, the movable rail 41 is fixed to the fixed rail 37.

A fixing bolt 45 is inserted into the upper guide groove 43 of the movable rail 41. The fixing bolt 45 passes through the upper guide groove 43 and is screwed into a screw hole 39 formed in the fixing rail 37. The amount of movement of the movable frame 40 in the horizontal direction is regulated by the fixing bolt 45 and the upper guide groove 43. That is, when the filter 33 on the movable frame 40 is pushed toward the transport area C, the movement of the movable frame 40 is stopped at a position where one end 43a of the upper guide groove 43 abuts on the fixing bolt 45, and the movable frame 40 is pulled back. And the other end 43b of the upper guide groove 43 is
The movement of the movable frame 40 is stopped at the position where the movable frame 40 abuts.

In this embodiment, the rotary coating unit 2
a and the developing unit 2b correspond to the substrate processing unit of the present invention, the slide mechanism 36 corresponds to the support means, the lower transfer unit 4 corresponds to the transfer means, the transfer robot 10 corresponds to the loading / unloading means, A part of the carry-out device 6 corresponds to a mounting unit, and the control unit 49 corresponds to a control unit. Further, the air adjustment unit 12 in the transfer area C corresponds to an air adjustment unit in the transfer area of the present invention, and the air adjustment unit 7 in the carry-in / out area B.
Corresponds to the air adjusting section in the carry-in / out area, and the transfer area D
The air adjustment unit corresponds to the air adjustment unit in the delivery area.

Here, the maintenance work of the rotary coating unit 2a provided with the filter unit 32 will be described. FIG. 7 is a cross-sectional view of the substrate processing apparatus during a maintenance operation of the rotary coating unit. FIG. 7 shows a cross section of the same substrate processing apparatus as in FIG. Hereinafter, the maintenance work of the rotary coating unit 2a will be described with reference to FIGS.

First, the outer plate (not shown) on the side of the housing of the rotary type coating unit 2a is removed. Thereby, the side surface of the filter unit 32 as shown in FIG. 5 is exposed. Next, the mounting bolt 35 of the filter 33 is removed. As a result, the filter 33 drops from the top plate 20 and the frame 34 of the filter 33 is placed on the mounting surface 41 a of the movable rail 41.
Supported by

Further, the fixing bolt 45 and the connecting bolt 46 are loosened. Thus, the movable rail 41 can move with respect to the fixed rail 37. In this state, the side surface of the filter 33 on the movable frame 40 is pushed out to the transport area C side. The movable frame 40 on which the filter 33 is mounted moves horizontally, and the filter 33 moves to the transport area C. Thereby, the space above the rotary coating unit 2a is enlarged, the space for maintenance work is widened, and the maintenance work of the rotary coating unit 2a becomes easy.

When the maintenance work of the rotary type coating unit 2a is completed, the filter 33 is returned from the transport area C to the original position. At this time, by putting a finger on the bent portion 47 on the front surface of the movable frame 40, the movable frame 40 can be easily pulled back.

Thereafter, the mounting bolt 35 is again passed through the filter 33 and fastened to the top plate 20. Thereby, the filter 33 is fixed to the top plate 20. After that, the connecting bolt 46 and the fixing bolt 45 are tightened to fix the movable rail 41 to the fixed rail 37. Thereby, the filter unit 32 returns to the original state.

As described above, during the maintenance work of the rotary coating unit 2a, the filter 33 disposed above the rotary coating unit 2a is horizontally moved to the transport area C, so that the space above the rotary coating unit 2a is maintained. And workability during maintenance is improved.

An air adjusting unit 12 is disposed above the transfer area C, and a downward flow of clean air is supplied from the air adjustment unit 12 to keep the transfer area C clean. For this reason, the filter 33 pushed out to the transport area C is not contaminated by particles or the like.

Further, since the filter 33 is held at a position where it is difficult for an operator to touch, the surface of the filter 33 is prevented from being erroneously damaged. Further, it is not necessary to dispose a pedestal for the filter 33 around the substrate processing apparatus as in the related art, so that space saving around the substrate processing apparatus can be achieved.

In the above embodiment, an example was described in which the filter 33 was moved to the transport area C during maintenance work.
In the present invention, the filter 33 may be moved to a clean atmosphere of the substrate processing apparatus. For this purpose, the present invention can be further applied to the following examples.

FIG. 8 is a plan view of the substrate processing apparatus showing a moving state of the filter. Filter 33 as in the above embodiment
May be moved horizontally to the transfer area C along the X-axis direction, or may be moved horizontally to the transfer area C along the Y-axis direction.

FIG. 9 is a plan view of the substrate processing apparatus showing another movement state of the filter. As shown in FIG. 9, the filter 33 may be moved horizontally to a region other than the transport region C, for example, the carry-in / out region B, or may be moved horizontally to the transfer region D. In this case, the air adjusting unit 7 (see FIG. 1) is provided above the loading / unloading area B, and the atmosphere in the loading / unloading area B is kept clean. Further, an air adjustment unit (not shown) is similarly provided above the transfer area D, and the atmosphere is kept clean. Therefore, when the filter 33 is horizontally moved during the maintenance work, the filter 33 is prevented from being contaminated by particles and the like in the atmosphere.

FIG. 10 is a plan view of the substrate processing apparatus showing another moving state of the filter. In the illustrated substrate processing apparatus, transfer areas E for transferring a substrate to and from the outside are arranged on both sides of the substrate processing area A. The transfer area E is provided with transfer means (not shown) for transferring a substrate to and from an external device. An air conditioning unit (not shown) is provided above the transfer area E, and its atmosphere is kept clean. Therefore, the filter 33 can be pulled out and held in the delivery area E during maintenance work. Note that the delivery area E in this example corresponds to the delivery area of the present invention.

Next, an interlock mechanism for moving the filter unit 32 will be described. For example, as shown in FIG. 3, when the substrate holding portion of the lower transport unit 4 is raised to at least the same height as the filter unit 32 during the maintenance work, the filter 33 pushed out to the transport area C may be used.
Interferes with the substrate holding unit. Therefore, an interlock mechanism is provided to avoid interference between the filter 33 and the lower transport unit 4.

In the first example of the interlock mechanism, the interference between the lower transport unit 4 and the filter 33 is avoided by using a detecting means for detecting the movement of the filter 33.

As a detecting means, as shown in FIG. 6, a transmission type sensor 48 may be provided on the transport area C side of the fixed rail 37 of the slide mechanism 36. In this case, when the filter 33 is pushed out to the transport area C side together with the movable frame 40, the transmission sensor 48 detects the filter 33 and outputs a detection signal to the control unit 49.

The filter unit 32 has the filter 3
A switch for notifying the movement of No. 3 may be provided. The operator turns on this switch before moving the filter 33. The switch ON signal is output to the control unit 49.

Further, the mounting bolt 3 of the filter 33
A sensor that detects that the filter 5 has been detached from the top plate 20, a sensor that detects that the filter 33 is mounted on the mounting surface 41a of the movable rail 41, or a sensor that detects that the fixing bolt 45 and the connecting bolt 46 have been loosened. A sensor for detecting may be provided. Output signals of these sensors are output to the control unit 49. Further, a filter 3 is attached to the lower transport unit 4.
3 may be provided.

Upon receiving a signal indicating that the filter 33 has moved or the like, the control unit 49 sets the lower transport unit 4 to the filter 3.
Then, the fan unit 31 is lowered to a position where it does not interfere with the fan unit 3 and the fan unit 31 is stopped. Further, an alarm may be generated.

Further, the movable frame 4 to the transfer area C side
A lock member (not shown) for inhibiting the movement of zero may be provided. When receiving a signal indicating that the lower transport unit 4 is at a position where the lower transport unit 4 interferes with the movement of the filter 33, the controller 49 moves the lock member to prevent the movable frame 40 from moving. Further, when the lower transport unit 4 retreats to a predetermined position, the lock member is returned to a position where the movable frame 40 is allowed to move.

In the second example of the interlock mechanism,
When a maintenance work command is input from the input unit of the substrate processing apparatus, the lower transport unit 4 is retracted to a position where it does not interfere with the filter 33 before the filter 33 moves.

In this embodiment, the above sensors such as the transmission type sensor 48 correspond to the detecting means of the present invention, and the lock member corresponds to the inhibiting means.

The upper transport unit 5 and the filter 33
If the upper transport unit 5 and the lower transport unit 4 can interfere with each other, the interlock structure described above is applied to the upper transport unit 5. A lock structure may be applied.

When processing units such as the rotary coating unit 2a and the rotary developing unit 2b are arranged adjacent to each other, the filter 33 of one processing unit is placed below the filter 33 of the other processing unit. You may comprise so that it may move.

Further, in the above embodiment, the substrate processing apparatus in which a plurality of processing units are arranged so as to surround the transfer area C has been described as an example, but the structure of the filter unit 32 according to the present invention is The present invention can also be applied to a substrate processing apparatus having a linear transfer area extending along processing units arranged in a direction.

[Brief description of the drawings]

FIG. 1 is a perspective view of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a front sectional view of the substrate processing apparatus of FIG. 1;

FIG. 3 is a sectional view taken along line HH in FIG. 2;

FIG. 4 is a sectional view taken along line II in FIG. 2;

FIG. 5 is a front sectional view of the air adjustment unit.

FIG. 6 is a perspective view of a main part of the filter unit.

FIG. 7 is a sectional view of the substrate processing apparatus showing a moving state of the filter.

FIG. 8 is a plan view of the substrate processing apparatus showing a moving state of the filter.

FIG. 9 is a plan view of the substrate processing apparatus showing another movement state of the filter material.

FIG. 10 is a plan view of a substrate processing apparatus showing still another example of moving a filter.

FIG. 11 is a perspective view of a conventional substrate processing apparatus.

[Explanation of symbols]

 2a Rotary coating unit 2b Rotary developing unit 3 Air adjustment unit 4 Lower transfer unit 5 Upper transfer unit 6 Carry-in / out device 7 Air adjustment unit 31 Fan unit 32 Filter unit 33 Filter 35 Mounting bolt 36 Slide mechanism 37 Fixed rail 38 Guide groove Reference Signs List 40 movable frame 41 movable rail 42 connecting frame 43 upper guide groove 44 lower guide groove 45 fixing bolt 46 connecting bolt 48 transmission type sensor

Claims (11)

[Claims] A substrate processing unit having a processing space and performing a predetermined processing on a substrate in the processing space; a filter provided above the processing space of the substrate processing unit; A substrate processing apparatus comprising: support means for movably supporting a position above a space and a predetermined position outside the processing space. 2. The air conditioner according to claim 1, further comprising an air adjusting unit configured to supply a clean air flow to an adjacent area adjacent to the substrate processing unit, wherein the predetermined position is provided in the adjacent area. Substrate processing equipment. 3. A transport unit provided in a transport area adjacent to the substrate processing unit, for transporting a substrate to the substrate processing unit, and an air adjusting unit for supplying a clean air flow to the transport area. 2. The substrate processing apparatus according to claim 1, wherein the predetermined position is provided in the transfer area. A transfer unit configured to transfer a substrate to the substrate processing unit; a mounting unit on which a substrate storage container storing the substrate is mounted; and a loading / unloading area adjacent to the substrate processing unit; Loading / unloading means for loading / unloading the substrate between the transporting means and the mounting unit; and an air adjusting unit for supplying a clean air flow to the loading / unloading area; 2. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is provided in a carry-out area. 5. A transfer unit for transferring a substrate to the substrate processing unit; and a transfer unit disposed in a transfer area adjacent to the substrate processing unit, for transferring a substrate between the transfer unit and an external device. The substrate processing apparatus according to claim 1, further comprising an air adjusting unit configured to supply a clean air flow to the delivery area, wherein the predetermined position is provided in the delivery area. 6. The apparatus according to claim 1, wherein the transfer unit has a substrate holding unit that holds the substrate and moves at least in a vertical direction, and transfers the substrate to and from the substrate processing unit. 4. The substrate processing apparatus according to claim 3, further comprising control means for controlling an operation of the substrate holding unit so that the substrate holding unit does not interfere with the filter. 7. The apparatus according to claim 1, further comprising: a detecting unit configured to detect a movement of the filter, wherein the control unit is configured to detect the movement of the filter by the detecting unit at a position where the substrate holding unit does not interfere with the filter. 7. The substrate processing apparatus according to claim 6, wherein the substrate holding unit is retracted. 8. The apparatus according to claim 1, wherein the transfer unit includes a substrate holding unit that holds the substrate and moves at least in a vertical direction, and transfers the substrate to and from the substrate processing unit. Input means for inputting a command for the operation, and control means for controlling the operation of the substrate holding unit so that the substrate holding unit does not interfere with the filter when a maintenance command for the filter is input. 4. The substrate processing apparatus according to claim 3, wherein: 9. The transfer unit has a substrate holding unit that holds a substrate and moves at least in a vertical direction, and transfers the substrate to and from the substrate processing unit. 4. The substrate processing apparatus according to claim 3, further comprising a prohibition unit that prohibits the movement of the filter when the filter is at the position. 10. A supporting member fixed above the processing space of the substrate processing section and extending in a horizontal direction, a moving member supporting the filter and movable along the guiding member. The substrate processing apparatus according to claim 1, further comprising: 11. The substrate processing unit further includes a housing surrounding the processing space, the filter is detachably attached to a lower surface of a top plate of the housing, and the moving member is detached from the top plate. The substrate processing apparatus according to claim 10, wherein the filter is movably supported.