JPH1070365A - Method for manufacturing multilayer circuit board - Google Patents
Method for manufacturing multilayer circuit boardInfo
- Publication number
- JPH1070365A JPH1070365A JP22660696A JP22660696A JPH1070365A JP H1070365 A JPH1070365 A JP H1070365A JP 22660696 A JP22660696 A JP 22660696A JP 22660696 A JP22660696 A JP 22660696A JP H1070365 A JPH1070365 A JP H1070365A
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- wiring pattern
- layer
- multilayer circuit
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 229910052751 metal Inorganic materials 0.000 claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 30
- 238000009413 insulation Methods 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- 230000007261 regionalization Effects 0.000 claims abstract description 4
- 239000010410 layer Substances 0.000 claims description 126
- 239000004020 conductor Substances 0.000 claims description 96
- 239000000758 substrate Substances 0.000 claims description 63
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 16
- 238000010030 laminating Methods 0.000 claims description 15
- 239000002356 single layer Substances 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 239000011889 copper foil Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 239000005028 tinplate Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 description 10
- 229920001721 polyimide Polymers 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000003825 pressing Methods 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体素子搭載用
基板や半導体素子などの電子部品を複数搭載するMCM
(マルチチップモジュール)基板等の製造に適用でき、
微細配線パターンを形成可能な多層回路基板の製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an MCM for mounting a plurality of electronic components such as a semiconductor element mounting substrate and a semiconductor element.
(Multi-chip module) Applicable to the manufacture of substrates, etc.
The present invention relates to a method for manufacturing a multilayer circuit board capable of forming a fine wiring pattern.
【0002】[0002]
【従来の技術】従来、高密度実装に適した多層回路基板
の配線パターンを絶縁層を介して多層に形成する方法と
しては、図5に示すビルドアップ法が知られている。こ
のビルドアップ法は、ガラスエポキシ基板等の積層板を
コア基板51とし、このコア基板51にスパッタリング
法又はめっき法、若しくはこれら方法の併用などにより
導体層を形成し、該導体層をエッチングして配線パター
ン52を形成する(図5(a)参照)。上記配線パター
ン52を覆ってコア基板51上に感光性レジスト53を
塗布し、配線パターン上の該感光性レジスト53にフォ
トリソグラフィ工程によりビアホール54を形成する
(図5(b)参照)。次いで、上記ビアホール54を含
めて感光性レジスト53上にめっき法又はスパッタリン
グ法等により導体層を形成し、この導体層をエッチング
して配線パターン55を形成し、コア基板51上に形成
した配線パターン52とビアホール54部分で電気的に
導通させる(図5(c)参照)。更に、上記感光性レジ
スト53上に形成した配線パターン55を含めレジスト
53上に感光性レジスト56を塗布し、上述した同様な
工程により配線パターン57を形成し、配線パターン5
5と電気的に接続するという工程を繰り返すものである
(図5(d)参照)。2. Description of the Related Art Conventionally, a build-up method shown in FIG. 5 is known as a method for forming a wiring pattern of a multilayer circuit board suitable for high-density mounting in a multilayer through an insulating layer. In this build-up method, a laminate such as a glass epoxy substrate is used as a core substrate 51, a conductor layer is formed on the core substrate 51 by a sputtering method, a plating method, or a combination of these methods, and the conductor layer is etched. The wiring pattern 52 is formed (see FIG. 5A). A photosensitive resist 53 is applied on the core substrate 51 so as to cover the wiring pattern 52, and a via hole 54 is formed in the photosensitive resist 53 on the wiring pattern by a photolithography process (see FIG. 5B). Next, a conductor layer is formed on the photosensitive resist 53 including the via hole 54 by a plating method or a sputtering method, and the conductor layer is etched to form a wiring pattern 55, and the wiring pattern formed on the core substrate 51 is formed. 52 and the via hole 54 are electrically connected (see FIG. 5C). Further, a photosensitive resist 56 is applied on the resist 53 including the wiring pattern 55 formed on the photosensitive resist 53, and a wiring pattern 57 is formed by the same process as described above.
5 is repeated (see FIG. 5D).
【0003】[0003]
【発明が解決しようとする課題】しかしながら、近年の
LSIの高集積化により、LSI等の半導体素子を搭載
した回路基板の高密度実装化などにより、半導体素子搭
載用基板や半導体装置の実装基板の配線パターンの微細
化が要求されている。上記ビルドアップ法による多層回
路基板の製造方法においては、例えば半導体素子搭載用
基板やMCM(マルチチップモジュール)基板を、小型
化しつつ微細配線パターンを形成するためには、感光性
レジスト53,56として高耐熱絶縁材料、例えばポリ
イミド,BCB(ベンゾシクロブテン)等を使用したい
が、そうするとコア基板51の耐熱温度(ガラス転移点
110°〜130°C)はキュア温度(150°程度)
より低いため、加熱するとコア基板51の樹脂部分がた
わんだりゆがむため、直接コア基板51上に微細配線パ
ターンを形成するのは困難である。そこで、耐熱温度が
高いコア基板、即ちガラス転移点がキュア温度より高い
コア基板を使用して、ビルドアップ法により多層回路基
板を製造するとすれば、製造コストが上昇する。However, with the recent high integration of LSIs and the high-density mounting of circuit boards on which semiconductor elements such as LSIs are mounted, the use of substrates for mounting semiconductor elements and mounting boards for semiconductor devices has been increasing. There is a demand for finer wiring patterns. In the method of manufacturing a multilayer circuit board by the build-up method, in order to form a fine wiring pattern while miniaturizing a semiconductor element mounting board or an MCM (multi-chip module) board, for example, the photosensitive resists 53 and 56 are used. It is desired to use a high heat-resistant insulating material, for example, polyimide, BCB (benzocyclobutene), or the like. However, in this case, the heat-resistant temperature (glass transition point 110 ° to 130 ° C.) of the core substrate 51 is a curing temperature (about 150 °).
Since the resin portion is lower, the resin portion of the core substrate 51 bends and warps when heated, and it is difficult to directly form a fine wiring pattern on the core substrate 51. Therefore, if a multilayer substrate is manufactured by a build-up method using a core substrate having a high heat-resistant temperature, that is, a core substrate having a glass transition point higher than the curing temperature, the manufacturing cost increases.
【0004】また、めっき法或いはスパッタリング法に
よるビルドアップ法に代えて、両面銅張積層基板を使用
して多層回路基板を形成する場合、微細配線パターンを
形成するためには、導体層である銅箔の厚さを10μm
以下、好ましくは5μm程度の厚さにする必要がある。
しかしながら、上記導体層の厚さが薄くなると多層回路
基板の製造工程において、多層形成する導体層を含む基
材の取扱いが難しくなる。When a multilayer circuit board is formed by using a double-sided copper-clad laminate instead of a build-up method by a plating method or a sputtering method, a copper layer, which is a conductor layer, is required to form a fine wiring pattern. Foil thickness 10μm
Hereinafter, it is necessary to make the thickness preferably about 5 μm.
However, when the thickness of the conductor layer is reduced, it becomes difficult to handle the base material including the conductor layer to be formed in multiple layers in the manufacturing process of the multilayer circuit board.
【0005】本発明の目的は、上記従来技術の課題を解
決し、金属支持体上に導体層を積層し該導体層上に絶縁
層を積層してなるコア基材を用いることで、導体層の取
扱い性を向上させると共に微細配線を可能にした多層回
路基板の製造方法を提供することにある。[0005] An object of the present invention is to solve the above-mentioned problems of the prior art, and to use a core substrate having a conductor layer laminated on a metal support and an insulating layer laminated on the conductor layer. It is an object of the present invention to provide a method for manufacturing a multilayer circuit board, which has improved handleability and enables fine wiring.
【0006】[0006]
【課題を解決するための手段】本発明は上記目的を達成
するため次の手段を備える。すなわち、第1の手段は、
金属支持体上に導体層を積層し該導体層上に絶縁層を積
層してなるコア基材の前記絶縁層に前記導体層と電気的
に接続するビアを形成する工程と、前記ビアと該ビアの
配置に対応して回路基板に形成した配線パターンとが電
気的に接続するように前記コア基材のビア形成面と前記
回路基板の配線パターン形成面とを対向させて積層する
工程と、前記コア基材より前記金属支持体を除去して導
体層を露出させた後、該導体層を前記ビアと電気的に接
続する導体配線パターンに形成する工程とを含むことを
特徴とする。The present invention has the following means to achieve the above object. That is, the first means is:
Forming a via electrically connected to the conductor layer on the insulating layer of the core base material having a conductor layer laminated on a metal support and an insulating layer laminated on the conductor layer; and Laminating the via-formed surface of the core substrate and the wiring pattern-formed surface of the circuit board so as to electrically connect the wiring pattern formed on the circuit board corresponding to the arrangement of the vias; and Removing the metal support from the core substrate to expose the conductor layer, and then forming the conductor layer into a conductor wiring pattern that is electrically connected to the via.
【0007】また、前記第1の手段は、前記導体配線パ
ターンと別に設けたコア基材に形成したビアが電気的に
接続するように更にコア基材を積層し、該コア基材より
前記金属支持体を除去して導体層を露出させた後、該導
体層を前記ビアと電気的に接続する導体配線パターンに
形成する工程を繰り返しても良い。[0007] The first means may further comprise: laminating a core substrate so that vias formed in the core substrate provided separately from the conductor wiring pattern are electrically connected to each other; After removing the support and exposing the conductor layer, the step of forming the conductor layer into a conductor wiring pattern that is electrically connected to the via may be repeated.
【0008】また、第2の手段は、金属支持体上に導体
層を積層し該導体層上に絶縁層を積層してなるコア基材
の前記絶縁層に前記導体層と電気的に接続するビアを形
成した第1及び第2のコア基材を設ける工程と、前記第
1のコア基材のビア形成面と支持体とを積層する工程
と、前記第1のコア基材より金属支持体を除去して導体
層を露出させた後、該導体層を前記ビアと電気的に接続
する導体配線パターンに形成した単層回路基板を形成す
る工程と、前記導体配線パターンと第2のコア基材に形
成したビアとが電気的に接続するように第2のコア基材
のビア形成面と前記単層回路基板の導体配線パターン形
成面とを対向させて積層する工程と、前記第2のコア基
材から金属支持体を除去して導体層を露出させた後、該
導体層を導体配線パターンに形成する工程と、前記支持
体を除去する工程とを含むことを特徴とする。[0008] The second means is to electrically connect the conductor layer to the insulation layer of the core substrate, which is formed by laminating a conductor layer on a metal support and laminating an insulation layer on the conductor layer. Providing a first and second core base material having vias formed therein, laminating a via-formed surface of the first core base material and a support, and providing a metal support from the first core base. Forming a single-layer circuit board in which the conductor layer is formed in a conductor wiring pattern for electrically connecting the conductor layer to the via after removing the conductor layer to expose the conductor layer; Laminating the via-formed surface of the second core base material and the conductor wiring pattern-formed surface of the single-layer circuit board so as to be electrically connected to the via formed in the material; After removing the metal support from the core base material to expose the conductor layer, the conductor layer is connected to the conductor wiring pattern. Characterized in that it comprises a step of forming the over emissions, and removing the support.
【0009】また、前記第2の手段は、前記支持体を除
去する工程の後、前記多層回路基板の支持体除去面に露
出したビアと、該ビアの配置に対応して回路基板に形成
した配線パターンとが電気的に接続するように、前記多
層回路基板の支持体除去面と回路基板の配線パターン形
成面とを対向させて積層する工程を有していても良い。
また、前記第2の手段は、前記支持体を除去する工程の
後、前記多層回路基板の支持体除去面に露出したビアに
外部接続端子を形成する工程を有していても良い。The second means may include, after the step of removing the support, a via formed on the circuit board corresponding to the via exposed on the support-removed surface of the multilayer circuit board and an arrangement of the via. The method may include a step of laminating the support-removed surface of the multilayer circuit board and the wiring pattern forming surface of the circuit board so as to be electrically connected to the wiring pattern.
Further, the second means may include, after the step of removing the support, a step of forming an external connection terminal in a via exposed on the support-removed surface of the multilayer circuit board.
【0010】また、前記第1,第2の手段において、前
記絶縁層に形成するビアは、前記絶縁層に形成したビア
孔に電解めっきを施すことにより、又は導電性ペースト
を充填することにより形成しても良い。この場合、前記
絶縁層に形成するビアは、前記絶縁層に形成したビア孔
の開口部よりも外方に突出しているのが望ましい。ま
た、前記金属支持体に、アルミニウム板又はスズ板を用
いても良い。また、前記導体層は、前記金属支持体に銅
又は銅合金をスパッタ法或いはめっき法により形成し、
又は銅箔を貼着して形成してもよい。In the first and second means, a via formed in the insulating layer is formed by applying electrolytic plating to a via hole formed in the insulating layer or by filling a conductive paste. You may. In this case, it is preferable that the via formed in the insulating layer protrudes outward from the opening of the via hole formed in the insulating layer. Further, an aluminum plate or a tin plate may be used for the metal support. Further, the conductor layer is formed by sputtering or plating copper or a copper alloy on the metal support,
Alternatively, it may be formed by attaching a copper foil.
【0011】[0011]
【発明の実施の形態】以下、本発明の好適な実施の態様
を添付図面に基づいて詳細に説明する。図1はコア基材
の構成を示す断面図、図2は第1実施例に係る多層回路
基板の製造工程を示す説明図、図3はコア基材と接合す
るプリント回路基板の説明図、図4は第2実施例に係る
多層回路基板の製造工程を示す説明図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a sectional view showing a configuration of a core substrate, FIG. 2 is an explanatory diagram showing a manufacturing process of a multilayer circuit board according to the first embodiment, FIG. 3 is an explanatory diagram of a printed circuit board bonded to a core substrate, FIG. FIG. 4 is an explanatory view showing a manufacturing process of the multilayer circuit board according to the second embodiment.
【0012】(第1実施例)先ず、図1(a)を参照し
て多層回路基板の一部として用いられるコア基材の構成
について説明する。1はコア基材であり、金属支持体2
の一方の面に導体層3を積層し、該導体層3上に絶縁層
4を順次積層したものが用いられる。(First Embodiment) First, the structure of a core base material used as a part of a multilayer circuit board will be described with reference to FIG. Reference numeral 1 denotes a core substrate, and a metal support 2
In this case, a conductor layer 3 is laminated on one surface, and an insulating layer 4 is sequentially laminated on the conductor layer 3.
【0013】上記金属支持体2は、上記薄肉の導体層3
のハンドリングを向上させるための支持体となるもので
ある。上記金属支持体2としては、導体層3に対して剥
離性が良く、該導体層3の厚さに比較して十分厚いも
の、例えば500μm〜1.0mm程度のアルミニウム
板が好適に用いられる。尚、上記金属支持体2として
は、導体層3を侵食しないエッチング液により除去する
ことが可能な金属板を用いることが好適であり、上記ア
ルミニウム板の他にスズ板等を用いることも可能であ
る。尚、上記金属支持体2は剥離により除去可能な場合
は、剥離させても良い。また、上記導体層3は、微細配
線化を考慮して厚さは10μm以下、好ましくは5μm
程度に形成される。この導体層3としては、前記金属支
持体2に銅層又は銅合金層をスパッタ法或いはめっき法
により形成し、又は銅箔を貼着して形成してもよい。The metal support 2 is formed of the thin conductor layer 3
It becomes a support for improving the handling of the above. As the metal support 2, one having good releasability from the conductor layer 3 and sufficiently thicker than the thickness of the conductor layer 3, for example, an aluminum plate of about 500 μm to 1.0 mm is suitably used. In addition, as the metal support 2, it is preferable to use a metal plate that can be removed by an etchant that does not attack the conductor layer 3, and it is also possible to use a tin plate or the like in addition to the aluminum plate. is there. If the metal support 2 can be removed by peeling, it may be peeled. The conductor layer 3 has a thickness of 10 μm or less, preferably 5 μm in consideration of miniaturization.
Formed to the extent. The conductor layer 3 may be formed by forming a copper layer or a copper alloy layer on the metal support 2 by a sputtering method or a plating method, or by attaching a copper foil.
【0014】上記絶縁層4は、接着性や不飽和蒸気加圧
バイアス試験(耐湿性試験)への耐久性を考慮してガラ
ス転移点の高いもの、例えばポリイミド(ガラス転移点
250°C〜300°C),エポキシ系樹脂(ガラス転
移点190°C程度)、熱可塑性材料等を用いた有機絶
縁材料であって、厚さは50μm〜100μmのものが
導体層3の上に塗布される。尚、上記金属支持体2の他
方の面には、絶縁性を有する保護フィルム5が貼着され
ており、該金属支持体2の表面が汚れたり異物が付着す
るのを防止している。尚、この保護フィルム5は必ずし
も必要とするものではない。また、図1(b)に示すよ
うに、上記絶縁層4として接着性の低いフィルム状の絶
縁層を用いた場合には、該絶縁層4の下層にエポキシ
系,ポリイミドなどの接着剤層6を数μm程度の厚さで
設けても良い。The insulating layer 4 is made of a material having a high glass transition point, for example, polyimide (glass transition point of 250 ° C. to 300 ° C.) in consideration of adhesiveness and durability against an unsaturated vapor pressure bias test (moisture resistance test). C), an epoxy-based resin (glass transition point of about 190 ° C.), an organic insulating material using a thermoplastic material or the like, and having a thickness of 50 μm to 100 μm is applied on the conductor layer 3. Note that a protective film 5 having an insulating property is adhered to the other surface of the metal support 2 to prevent the surface of the metal support 2 from being stained or adhered with foreign matter. The protective film 5 is not always required. In addition, as shown in FIG. 1B, when a film-like insulating layer having low adhesiveness is used as the insulating layer 4, an adhesive layer 6 made of epoxy, polyimide or the like is provided below the insulating layer 4. May be provided with a thickness of about several μm.
【0015】上記コア基材1を一部に用いた多層回路基
板の製造方法の一例について図2を参照して説明する。
先ず、図2(a)に示すコア基材1に対して、図2
(b)に示すように絶縁層4にエキシマレーザー等(絶
縁層4が感光性レジストの場合にはフォトリソグラフィ
ー工程)でビア孔を形成し、該ビア孔に電解めっきによ
るアディティブ法又は導電性ペーストをスクリーン印刷
等により埋め込んでビア4aを形成して導体層3と電気
的に接続する。また、上記ビア4aの先端は、図2
(b)に示すように絶縁層4より外方に突出するように
形成しても良い。上記ビア4aを形成するにあたり、コ
ア基材1に金属支持体2を用いることにより、電解めっ
きを施す際に上記金属支持体2が共通のめっき用電極と
して使用できる。An example of a method for manufacturing a multilayer circuit board using the core substrate 1 as a part will be described with reference to FIG.
First, the core substrate 1 shown in FIG.
As shown in (b), a via hole is formed in the insulating layer 4 by an excimer laser or the like (a photolithography step when the insulating layer 4 is a photosensitive resist), and an additive method by electrolytic plating or a conductive paste is formed in the via hole. Is embedded by screen printing or the like to form a via 4 a to be electrically connected to the conductor layer 3. Also, the tip of the via 4a is shown in FIG.
As shown in (b), it may be formed so as to protrude outward from the insulating layer 4. By using the metal support 2 for the core substrate 1 in forming the via 4a, the metal support 2 can be used as a common plating electrode when performing electrolytic plating.
【0016】次に、図2(c)及び図3に示すように、
前記コア基材1に形成した導体層3と電気的に接続する
ビア4aとBTレジンなどからなるプリント回路基板7
の一方の面に形成した配線パターン7aのうち前記ビア
4aに対応する部位に形成されたランド部7cとが電気
的に接続するよう前記コア基材1のビア形成面1aとプ
リント回路基板7の配線パターン形成面7dとを対向さ
せて積層して加熱加圧して接合する。このとき、コア基
材1は絶縁層4によるプリプレグ(接着剤層の作用をも
つ)又は異方導電性接着剤を介してプリント回路基板7
と接合する。或いは、上記絶縁層4がエポキシ系樹脂や
ポリイミド等のように接着性を有する材料である場合に
は加熱加圧により接合する。また、コア基材1のビア形
成面1aに形成したビア4aの先端が絶縁層4より外方
に突出している場合には、プリント回路基板7のランド
部7cと確実に接合できる。なお、上記プリント回路基
板7としては、図3に示す配線パターン7a、スルーホ
ール7b、ランド部7c等が形成された公知のプリント
回路基板(例えばガラスエポキシ基板)が用いられる。Next, as shown in FIG. 2C and FIG.
Printed circuit board 7 made of BT resin and via 4a electrically connected to conductor layer 3 formed on core substrate 1
The via-formed surface 1a of the core substrate 1 and the printed circuit board 7 are electrically connected to the land portion 7c formed at a portion corresponding to the via 4a in the wiring pattern 7a formed on one surface of the printed circuit board 7. The wiring pattern forming surface 7d is stacked facing the wiring pattern forming surface 7d and bonded by heating and pressing. At this time, the core substrate 1 is connected to the printed circuit board 7 via a prepreg (having the function of an adhesive layer) by the insulating layer 4 or an anisotropic conductive adhesive.
To join. Alternatively, when the insulating layer 4 is made of an adhesive material such as epoxy resin or polyimide, the bonding is performed by heating and pressing. Further, when the tip of the via 4 a formed on the via forming surface 1 a of the core base 1 protrudes outward from the insulating layer 4, the via 4 a can be reliably joined to the land 7 c of the printed circuit board 7. As the printed circuit board 7, a known printed circuit board (for example, a glass epoxy board) on which the wiring patterns 7a, the through holes 7b, the lands 7c, and the like shown in FIG. 3 are formed is used.
【0017】次に、図2(d)に示すように、コア基材
1側の金属支持体2及び保護フィルム5をエッチングに
より剥離させて導体層3を露出させる。上記エッチング
液としては、導体層3に銅又は銅箔、金属支持体にアル
ミニウム板を用いた場合、これらを侵食しない塩酸、硫
酸又はアルカリ系水溶液等が好適に用いられる。Next, as shown in FIG. 2D, the metal support 2 and the protective film 5 on the core substrate 1 are peeled off by etching to expose the conductor layer 3. When copper or copper foil is used for the conductor layer 3 and an aluminum plate is used for the metal support, hydrochloric acid, sulfuric acid, or an alkaline aqueous solution that does not corrode these is preferably used as the etching solution.
【0018】最後に、図2(e)に示すように、導体層
3をエッチングによりパターニングしてビア4aと電気
的に接続した導体配線パターン3aを形成して多層回路
基板8が得られる。具体的には、銅箔の上に感光膜を形
成して露光し、エッチングによって導体配線パターン3
aを形成する。上記多層回路基板8は、金属支持体2に
支持された導体層3を有するコア基材1の平坦なビア形
成面1aと、プリント回路基板7の配線パターン7aの
うち対応するランド部7cを形成した配線パターン形成
面7d(図3参照)とを対向させて積層して接合してい
る。この配線パターン形成面7dは、配線パターン7a
が基板表面より凸状に形成されているため、該配線パタ
ーン形成面7dにソルダレジストを被覆する平坦化処理
を施してほぼ平坦化されたものを用いることが好まし
い。そして、最後に最上層の導体層3をエッチングによ
りパターニングして導体配線パターン3aを形成する。
このため、従来のビルドアップ方式のように、コア基板
上の配線パターンにレジストを塗布してビアホールを形
成し、該ビアホールを含めたレジスト上に無電解銅めっ
きと電解銅めっきを続けて行うことにより導体層を形成
し、該導体層をエッチングして配線パターンを形成する
工程を繰り返す場合に比べて、積層面における配線パタ
ーンの波打ちや歪み等は少なく、平坦度の高い多層回路
基板8を得ることができる。Finally, as shown in FIG. 2E, the conductor layer 3 is patterned by etching to form a conductor wiring pattern 3a electrically connected to the via 4a, thereby obtaining a multilayer circuit board 8. Specifically, a photosensitive film is formed on a copper foil, exposed, and etched to form a conductive wiring pattern 3.
a is formed. The multilayer circuit board 8 has a flat via forming surface 1 a of the core substrate 1 having the conductor layer 3 supported by the metal support 2 and a corresponding land portion 7 c of the wiring pattern 7 a of the printed circuit board 7. The wiring pattern forming surface 7d (see FIG. 3) is laminated and joined to face each other. The wiring pattern forming surface 7d is provided with a wiring pattern 7a.
Is formed so as to be more convex than the substrate surface, it is preferable to use a wiring pattern forming surface 7d which has been subjected to a flattening process of coating with a solder resist and has been substantially flattened. Finally, the uppermost conductor layer 3 is patterned by etching to form a conductor wiring pattern 3a.
Therefore, as in the conventional build-up method, a resist is applied to a wiring pattern on a core substrate to form a via hole, and electroless copper plating and electrolytic copper plating are continuously performed on the resist including the via hole. As compared with the case where a conductor layer is formed and a process of forming a wiring pattern by etching the conductor layer is repeated, a multilayer circuit board 8 with less flatness and less waving and distortion of the wiring pattern on the laminated surface is obtained. be able to.
【0019】また、上記多層回路基板8の最上層に形成
された導体配線パターン3aと、別に用意した前記コア
基材1に形成されたビア4aとを電気的に導通するよう
に積層して接合する工程と、前記コア基材1より前記金
属支持体2を剥離させて導体層3を露出させた後、該導
体層3に導体配線パターン3aを形成する工程(図2
(a)〜(e)参照)とを複数回繰り返すことにより微
細配線を更に多層に形成した多層回路基板8を形成する
ことができる。Further, the conductor wiring pattern 3a formed on the uppermost layer of the multilayer circuit board 8 and the via 4a formed on the separately prepared core substrate 1 are laminated so as to be electrically connected and joined. And exposing the metal support 2 from the core substrate 1 to expose the conductor layer 3, and then forming a conductor wiring pattern 3a on the conductor layer 3 (FIG. 2).
By repeating (a) to (e) a plurality of times, it is possible to form a multilayer circuit board 8 in which fine wiring is further formed in multiple layers.
【0020】尚、上記多層回路基板8は、プリント回路
基板7の片面にコア基材1を積層して導体層3に導体配
線パターン3aを形成する工程について説明したが、上
記プリント回路基板7の両面側においてコア基材1を積
層して導体配線パターン3aを形成しても良い。また、
上記多層回路基板8のうちプリント回路基板7の露出面
側(図2(e)の下面側)に、スルーホール7bを介し
て配線パターン7aに接続するランド部7cを除いてソ
ルダレジストを施して、外部に露出するランド部7cに
はんだボールなどの外部接続端子を形成してBGA(B
oll Grid Array)用の回路基板(図示せ
ず)を製造することも可能である。The multilayer circuit board 8 has been described with respect to the step of laminating the core substrate 1 on one side of the printed circuit board 7 and forming the conductor wiring pattern 3a on the conductor layer 3. The conductor wiring pattern 3a may be formed by laminating the core substrates 1 on both sides. Also,
A solder resist is applied to the exposed surface side (the lower surface side in FIG. 2E) of the printed circuit board 7 of the multilayer circuit board 8 except for a land portion 7c connected to the wiring pattern 7a through the through hole 7b. An external connection terminal such as a solder ball is formed on the land portion 7c exposed to the outside to form a BGA (B
It is also possible to manufacture a circuit board (not shown) for an all grid array.
【0021】上記構成によれば、コア基材1として予め
導体層3を金属支持体2に一体に積層したものを用いる
ことにより、コア基材1どうしを接合したり該コア基材
1をプリント回路基板7と接合する場合など、多層回路
基板の製造工程において薄肉の導体層3の取扱い性が良
く、しかも微細配線パターンを形成できるので、多層回
路基板8の高密度実装化に適している。また、上記導体
層3と共にコア基材1を形成する絶縁層4として耐熱性
の高いポリイミドやエポキシ系の樹脂を使用した場合に
は、接着性,耐湿性試験に優れており、プリント回路基
板7として低コストの材料を使用しても、高品質な多層
回路基板8を廉価で提供できる。According to the above-described structure, by using the core substrate 1 in which the conductor layer 3 is previously laminated integrally with the metal support 2, the core substrates 1 are joined together or the core substrate 1 is printed. Since the thin conductor layer 3 is easy to handle and can form a fine wiring pattern in the manufacturing process of the multilayer circuit board such as when it is bonded to the circuit board 7, it is suitable for high-density mounting of the multilayer circuit board 8. Further, when a polyimide or epoxy resin having high heat resistance is used as the insulating layer 4 forming the core substrate 1 together with the conductor layer 3, the printed circuit board 7 has excellent adhesion and moisture resistance tests. Even if a low-cost material is used, a high-quality multilayer circuit board 8 can be provided at a low price.
【0022】(第2実施例)次に、前記コア基材1を用
いた多層回路基板の製造方法の他の実施例について図4
を参照して説明する。なお、上記第1実施例と同一部材
に同一番号を付して説明を援用するものとする。先ず、
図4(a)において、第1のコア基材1に、最下層側の
絶縁層4にエキシマレーザー等(絶縁層4が感光性レジ
ストの場合にはフォトリソグラフィ工程)でビア孔を形
成し、該ビア孔に電解めっきによるアディティブ法又は
導電性ペーストをスクリーン印刷等により埋め込んでビ
ア4aを形成して導体層3との電気的導通を取る。次に
前記コア基材1と金属からなる支持体9とを積層し加熱
加圧により接合する。このとき、上記コア基材1と支持
体9と絶縁層4によるプリプレグ又は異方導電性接着剤
を介して接合する。或いは、上記絶縁層4がエポキシ系
樹脂やポリイミド等のように接着性を有する材料である
場合には加熱加圧により接合する。上記支持体9として
は必ずしも金属板に限られないが、配線パターンの形成
や熱放散性を考慮すると、銅板が好適に用いられる。そ
して、図4(b)に示すように、コア基材1の導体層3
とビア4aを介して支持体9としての銅板が電気的に接
続する。(Second Embodiment) Next, another embodiment of a method for manufacturing a multilayer circuit board using the core substrate 1 will be described with reference to FIG.
This will be described with reference to FIG. The same members as those in the first embodiment are denoted by the same reference numerals, and the description will be referred to. First,
In FIG. 4A, via holes are formed in the first core base material 1 by excimer laser or the like (a photolithography step when the insulating layer 4 is a photosensitive resist) in the lowermost insulating layer 4, The via hole is formed by embedding an additive method by electroplating or a conductive paste into the via hole by screen printing or the like, thereby establishing electrical conduction with the conductor layer 3. Next, the core substrate 1 and a support 9 made of metal are laminated and joined by heating and pressing. At this time, the core substrate 1, the support 9 and the insulating layer 4 are joined via a prepreg or an anisotropic conductive adhesive. Alternatively, when the insulating layer 4 is made of an adhesive material such as epoxy resin or polyimide, the bonding is performed by heating and pressing. The support 9 is not necessarily limited to a metal plate, but a copper plate is preferably used in consideration of formation of a wiring pattern and heat dissipation. Then, as shown in FIG. 4B, the conductor layer 3 of the core base material 1 is formed.
And a copper plate as the support 9 is electrically connected via the via 4a.
【0023】次に、図4(c)に示すように、コア基材
1側の金属支持体2及び保護フィルム5を前記第1実施
例と同様にしてエッチングにより剥離させて導体層3を
露出させた後、該導体層3をエッチングによりパターニ
ングして導体配線パターン3aを形成した単層回路基板
10を製造する。具体的には、銅箔の上に感光膜を形成
して露光し、エッチングによって導体配線パターン3a
を形成する。この後、上記導体配線パターン3a全体に
ニッケルなどをめっきした後金めっきを施し、該導体配
線パターン3aのランド部3cを除いてソルダーレジス
トを被覆して単層回路基板10の表面を平坦化しても良
い。この場合には、後述するように多層形成する場合の
他層の導体配線パターンのビアとの密着性が良く、電気
抵抗も低いため多層回路基板内に微細配線パターンを形
成する上で有利である。この場合も、第1実施例と同様
に金属の支持体9をめっき用の共通電極として利用して
金めっき等を電解めっきすることができる。Next, as shown in FIG. 4C, the metal support 2 and the protective film 5 on the core substrate 1 are peeled off by etching in the same manner as in the first embodiment, so that the conductor layer 3 is exposed. After that, the conductor layer 3 is patterned by etching to produce the single-layer circuit board 10 on which the conductor wiring pattern 3a is formed. Specifically, a photosensitive film is formed on a copper foil, exposed, and etched to form a conductive wiring pattern 3a.
To form Thereafter, the entire surface of the conductor wiring pattern 3a is plated with nickel or the like and then plated with gold, and a solder resist is coated except for the land 3c of the conductor wiring pattern 3a to flatten the surface of the single-layer circuit board 10. Is also good. In this case, as will be described later, when forming a multilayer, the adhesion to the via of the conductor wiring pattern of the other layer is good, and the electric resistance is low, which is advantageous in forming a fine wiring pattern in the multilayer circuit board. . Also in this case, similarly to the first embodiment, gold plating or the like can be electrolytically plated using the metal support 9 as a common electrode for plating.
【0024】次に、図4(d)に示すように、上記単層
回路基板10の上に、別に用意した第2のコア基材1を
積層し、加熱加圧により接合する。具体的には、前記第
2のコア基材1に形成したビア4bと、前記単層回路基
板10に形成された前記ビア4bに対応する配線パター
ン3aのランド部3cとを対向させて積層して接合する
ことにより電気的に導通をとる。このとき、上記単層回
路基板10は、第1実施例と同様に絶縁層によるプリプ
レグ等を介して第2のコア基材1と接合する。Next, as shown in FIG. 4D, a separately prepared second core substrate 1 is laminated on the single-layer circuit board 10 and joined by heating and pressing. Specifically, the vias 4b formed on the second core substrate 1 and the land portions 3c of the wiring patterns 3a corresponding to the vias 4b formed on the single-layer circuit board 10 are laminated so as to face each other. The electrical connection is established by joining them together. At this time, the single-layer circuit board 10 is bonded to the second core substrate 1 via a prepreg or the like made of an insulating layer as in the first embodiment.
【0025】次に、図4(e)に示すように、前記コア
基材1より金属支持体2及び保護フィルム5をエッチン
グにより剥離させて導体層3を露出させた後、該導体層
3をエッチングによりパターニングして導体配線パター
ン3bを形成する。具体的には、銅箔の上に感光膜を形
成して露光し、エッチングによって導体配線パターン3
bを形成する。この後、前記導体配線パターン3aと同
様に平坦化処理した後、導体配線パターン3bのランド
部3dにはニッケルなどをめっきした後、金めっきを施
しても良い。また、平坦化処理をせずに配線パターン全
体にニッケルめっきや金めっきを施してもかまわない。Next, as shown in FIG. 4E, after the metal support 2 and the protective film 5 are peeled off from the core substrate 1 by etching to expose the conductor layer 3, the conductor layer 3 is removed. The conductive wiring pattern 3b is formed by patterning by etching. Specifically, a photosensitive film is formed on a copper foil, exposed, and etched to form a conductive wiring pattern 3.
b is formed. Thereafter, after the flattening process is performed in the same manner as the conductor wiring pattern 3a, the lands 3d of the conductor wiring pattern 3b may be plated with nickel or the like and then subjected to gold plating. Further, nickel plating or gold plating may be applied to the entire wiring pattern without performing the flattening process.
【0026】最後に、最下層に接合した前記単層回路基
板10の底部に接合した支持体9としての銅板をエッチ
ングなどにより除去して、多層回路基板11を製造する
ことができる。上記第2実施例では導電層3を2層設け
る場合について説明したが、上記導体配線パターン3b
上に更に他のコア基材1をそのビアとこれに対応する配
線パターン3bのランド部3cとの電気的導通をとるよ
うに積層して、図4(d)〜(e)の工程を繰り返すこ
とにより更に多層の微細配線を形成した多層回路基板1
1を得ることができる。Finally, the copper plate as the support 9 joined to the bottom of the single-layer circuit board 10 joined to the lowermost layer is removed by etching or the like, whereby the multilayer circuit board 11 can be manufactured. In the second embodiment, the case where two conductive layers 3 are provided has been described.
Another core substrate 1 is further laminated thereon so as to establish electrical conduction between the via and the corresponding land portion 3c of the wiring pattern 3b, and the steps of FIGS. 4D to 4E are repeated. The multilayer circuit board 1 on which further multilayer fine wiring is formed
1 can be obtained.
【0027】尚、上記最下層に接合した単層回路基板1
0より支持体9を除去した後、その底部にビア4aのみ
を露出させるようにソルダレジストを施して、該露出部
にはんだボールなどの外部接続端子を形成してBGA用
の多層回路基板(図示せず)を製造することも可能であ
る。或いは上記支持体9を除去した後、プリント回路基
板7の配線パターン7aの対応するランド部7cと多層
回路基板11の底部に露出するビア4aとの電気的導通
を取るように上記多層回路基板11とプリント回路基板
7を積層して接合しても良い。また、上記支持体9は金
属に限らず、絶縁体(セラミック,樹脂材)の表面をめ
っき処理などで金属化したものでも良い。The single-layer circuit board 1 bonded to the lowermost layer
After the support 9 is removed from the substrate 0, a solder resist is applied to the bottom so that only the via 4a is exposed, and external connection terminals such as solder balls are formed on the exposed portion to form a multilayer circuit board for BGA (FIG. (Not shown) can also be produced. Alternatively, after removing the support 9, the multilayer circuit board 11 may be electrically connected between the corresponding land 7 c of the wiring pattern 7 a of the printed circuit board 7 and the via 4 a exposed at the bottom of the multilayer circuit board 11. And the printed circuit board 7 may be laminated and joined. Further, the support 9 is not limited to metal, but may be one in which the surface of an insulator (ceramic, resin material) is metallized by plating or the like.
【0028】以上、本発明の好適な実施例について種々
述べてきたが、本発明は上記各実施例に限定されるもの
ではなく、発明の精神を逸脱しない範囲内でさらに多く
の改変を施し得るのはもちろんのことである。例えば、
上記第1,第2実施例では、多層形成するコア基材1を
プリント回路基板7と接合する工程について説明した
が、多層回路基板の熱放散性を効果的に行うために、金
属ベース(鉄板,アルミニウム板等)の両側に絶縁層及
びめっき層を設けたメタルコア基板などと接合しても良
い。Although the preferred embodiments of the present invention have been described in various ways, the present invention is not limited to the above-described embodiments, and more modifications can be made without departing from the spirit of the invention. Of course. For example,
In the first and second embodiments, the process of joining the core substrate 1 to be formed into a multilayer to the printed circuit board 7 has been described. However, in order to effectively dissipate the heat of the multilayer circuit board, a metal base (iron plate) is required. , An aluminum plate, etc.) and a metal core substrate provided with an insulating layer and a plating layer on both sides.
【0029】[0029]
【発明の効果】本発明は前述したように、予め導体層を
金属支持体に一体に積層したコア基材を用いることによ
り、例えばコア基材を多層に積層したり、該コア基材と
回路基板とを接合するときなど、多層回路基板の製造工
程において薄肉の導体層の取扱い性が良く、しかも微細
配線パターンを形成できるので、多層回路基板の高密度
実装化に適している。また、上記導体層と共にコア基材
を形成する絶縁層として耐熱性の高いポリイミドやエポ
キシ系などの樹脂を使用した場合には、接着性,耐湿性
試験に優れており、回路基板として低コストの材料を使
用しても、高品質な多層回路基板を廉価で提供できる。
また、上記多層回路基板は、金属支持体に支持された導
体層を有するコア基材の平坦なビア形成面と、該ビアの
配置に対応して回路基板に形成した配線パターン形成面
とを対向させて積層して接合する工程を経て製造してい
るため、積層面における配線パターンの波打ちや歪み等
は少なく、平坦度の高い多層回路基板を得ることができ
る等の著効を奏する。As described above, the present invention uses a core substrate in which a conductor layer is integrally laminated on a metal support in advance, for example, by laminating a core substrate in multiple layers, It is suitable for high-density mounting of a multilayer circuit board because it has good handleability of a thin conductor layer and can form a fine wiring pattern in a manufacturing process of the multilayer circuit board such as when bonding to a board. Also, when a resin such as a polyimide or an epoxy resin having high heat resistance is used as an insulating layer forming the core base material together with the conductor layer, the adhesive and moisture resistance tests are excellent, and a low-cost circuit board is used. Even if the material is used, a high-quality multilayer circuit board can be provided at low cost.
Further, in the multilayer circuit board, a flat via formation surface of a core base having a conductor layer supported by a metal support is opposed to a wiring pattern formation surface formed on the circuit board corresponding to the via arrangement. Since it is manufactured through a process of laminating and joining, there is little undulation or distortion of the wiring pattern on the laminating surface, and it is possible to obtain a multilayer circuit board with high flatness, and so on.
【図1】コア基材の構成を示す断面図である。FIG. 1 is a cross-sectional view illustrating a configuration of a core base material.
【図2】第1実施例に係る多層回路基板の製造工程の一
例を示す説明図である。FIG. 2 is an explanatory diagram illustrating an example of a manufacturing process of the multilayer circuit board according to the first embodiment.
【図3】コア基材と接合するプリント回路基板の説明図
である。FIG. 3 is an explanatory view of a printed circuit board bonded to a core base material.
【図4】第2実施例に係る多層回路基板の製造工程の一
例を示す説明図である。FIG. 4 is an explanatory diagram illustrating an example of a manufacturing process of the multilayer circuit board according to the second embodiment.
【図5】従来のビルドアップ法により多層回路基板を製
造する製造工程を示す説明図である。FIG. 5 is an explanatory view showing a manufacturing process for manufacturing a multilayer circuit board by a conventional build-up method.
1 コア基材 1a ビア形成面 2 アルミニウム板 3 導体層 3a,3b 導体配線パターン 3c,3d,7c ランド部 4 絶縁層 4a,4b ビア 5 保護フィルム 6 接着剤層 7 プリント回路基板 7a 配線パターン 7b スルーホール 7d 配線パターン形成面 8 回路基板 9 支持板 10,12a,12b 単層回路基板 11,13 多層回路基板 DESCRIPTION OF SYMBOLS 1 Core base material 1a Via formation surface 2 Aluminum plate 3 Conductor layer 3a, 3b Conductor wiring pattern 3c, 3d, 7c Land part 4 Insulating layer 4a, 4b Via 5 Protective film 6 Adhesive layer 7 Printed circuit board 7a Wiring pattern 7b Through Hole 7d Wiring pattern formation surface 8 Circuit board 9 Support plate 10, 12a, 12b Single layer circuit board 11, 13 Multilayer circuit board
Claims (11)
上に絶縁層を積層してなるコア基材の前記絶縁層に前記
導体層と電気的に接続するビアを形成する工程と、前記
ビアと該ビアの配置に対応して回路基板に形成した配線
パターンとが電気的に接続するように前記コア基材のビ
ア形成面と前記回路基板の配線パターン形成面とを対向
させて積層する工程と、前記コア基材より前記金属支持
体を除去して導体層を露出させた後、該導体層を前記ビ
アと電気的に接続する導体配線パターンに形成する工程
とを含むことを特徴とする多層回路基板の製造方法。Forming a via electrically connected to the conductor layer in the insulation layer of a core base material having a conductor layer laminated on a metal support and an insulation layer laminated on the conductor layer; The via forming surface of the core substrate and the wiring pattern forming surface of the circuit board are opposed to each other so that the via and the wiring pattern formed on the circuit board corresponding to the via arrangement are electrically connected. Laminating, and after exposing the conductor layer by removing the metal support from the core base material, forming a conductor wiring pattern that electrically connects the conductor layer to the via. A method for manufacturing a multilayer circuit board, which is characterized in that:
基材に形成したビアが電気的に接続するように更にコア
基材を積層し、該コア基材より前記金属支持体を除去し
て導体層を露出させた後、該導体層を前記ビアと電気的
に接続する導体配線パターンに形成する工程を繰り返す
ことを特徴とする請求項1記載の多層回路基板の製造方
法。2. A core substrate is further laminated so that vias formed on a core substrate provided separately from the conductor wiring pattern are electrically connected, and the metal support is removed from the core substrate to form a conductor. 2. The method for manufacturing a multilayer circuit board according to claim 1, wherein after exposing the layer, a step of forming the conductor layer into a conductor wiring pattern electrically connected to the via is repeated.
上に絶縁層を積層してなるコア基材の前記絶縁層に前記
導体層と電気的に接続するビアを形成した第1及び第2
のコア基材を設ける工程と、前記第1のコア基材のビア
形成面と支持体とを積層する工程と、前記第1のコア基
材より金属支持体を除去して導体層を露出させた後、該
導体層を前記ビアと電気的に接続する導体配線パターン
に形成した単層回路基板を形成する工程と、 前記導体配線パターンと第2のコア基材に形成したビア
とが電気的に接続するように第2のコア基材のビア形成
面と前記単層回路基板の導体配線パターン形成面とを対
向させて積層する工程と、前記第2のコア基材から金属
支持体を除去して導体層を露出させた後、該導体層を導
体配線パターンに形成する工程と、前記支持体を除去す
る工程とを含むことを特徴とする多層回路基板の製造方
法。3. A first substrate having a conductive layer laminated on a metal support and an insulating layer laminated on the conductive layer, wherein the insulating layer of the core substrate has a via formed thereon for electrically connecting to the conductive layer. And the second
Providing a core base material, laminating a via-formed surface of the first core base material and a support, and removing a metal support from the first core base to expose a conductor layer. Forming a single-layer circuit board in which the conductor layer is formed in a conductor wiring pattern that is electrically connected to the via; and electrically connecting the conductor wiring pattern and the via formed in the second core substrate. Laminating the via formation surface of the second core base material and the conductor wiring pattern formation surface of the single-layer circuit board so as to be connected to each other, and removing the metal support from the second core base material Forming a conductive layer on the conductive wiring pattern after exposing the conductive layer, and removing the support.
層回路基板の支持体除去面に露出したビアと、該ビアの
配置に対応して回路基板に形成した配線パターンとが電
気的に接続するように、前記多層回路基板の支持体除去
面と回路基板の配線パターン形成面とを対向させて積層
する工程を有することを特徴とする請求項3記載の多層
回路基板の製造方法。4. After the step of removing the support, the via exposed on the support-removed surface of the multilayer circuit board and the wiring pattern formed on the circuit board corresponding to the arrangement of the via are electrically connected. 4. The method for manufacturing a multilayer circuit board according to claim 3, further comprising the step of stacking the multilayer circuit board so that the support removing surface of the multilayer circuit board and the wiring pattern forming surface of the circuit board face each other so as to be connected.
層回路基板の支持体除去面に露出したビアに外部接続端
子を形成する工程を有することを特徴とする請求項3記
載の多層回路基板の製造方法。5. The multilayer circuit according to claim 3, further comprising, after the step of removing the support, a step of forming an external connection terminal in a via exposed on the support removal surface of the multilayer circuit board. Substrate manufacturing method.
層に形成したビア孔に電解めっきを施すことにより形成
することを特徴とする請求項1、請求項2、請求項3、
請求項4又は請求項5記載の多層回路基板の製造方法。6. The method according to claim 1, wherein the via formed in the insulating layer is formed by applying electrolytic plating to a via hole formed in the insulating layer.
A method for manufacturing a multilayer circuit board according to claim 4.
層に形成したビア孔に導電性ペーストを充填することに
より形成することを特徴とする請求項1、請求項2、請
求項3、請求項4又は請求項5記載の多層回路基板の製
造方法。7. The method according to claim 1, wherein the via formed in the insulating layer is formed by filling a via hole formed in the insulating layer with a conductive paste. A method for manufacturing a multilayer circuit board according to claim 4.
層に形成したビア孔の開口部よりも外方に突出している
ことを特徴とする請求項6又は請求項7記載の多層回路
基板の製造方法。8. The multilayer circuit board according to claim 6, wherein the via formed in the insulating layer protrudes outward from an opening of the via hole formed in the insulating layer. Manufacturing method.
スズ板を用いることを特徴とする請求項1、請求項2、
請求項3、請求項4、請求項5、請求項6、請求項7又
は請求項8記載の多層回路基板の製造方法。9. The method according to claim 1, wherein an aluminum plate or a tin plate is used for the metal support.
A method for manufacturing a multilayer circuit board according to claim 3, claim 4, claim 5, claim 6, claim 7, or claim 8.
は銅合金をスパッタ法或いはめっき法により形成するこ
とを特徴とする請求項1、請求項2、請求項3、請求項
4、請求項5、請求項6、請求項7、請求項8又は請求
項9記載の多層回路基板の製造方法。10. The conductor layer according to claim 1, wherein copper or a copper alloy is formed on the metal support by a sputtering method or a plating method. 10. The method for manufacturing a multilayer circuit board according to claim 5, claim 6, claim 7, claim 8, or claim 9.
を貼着して形成することを特徴とする請求項1、請求項
2、請求項3、請求項4、請求項5、請求項6、請求項
7、請求項8又は請求項9記載の多層回路基板の製造方
法。11. The conductive layer is formed by attaching a copper foil to the metal support. 10. The method for manufacturing a multilayer circuit board according to claim 6, 7, 8, or 9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22660696A JPH1070365A (en) | 1996-08-28 | 1996-08-28 | Method for manufacturing multilayer circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22660696A JPH1070365A (en) | 1996-08-28 | 1996-08-28 | Method for manufacturing multilayer circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1070365A true JPH1070365A (en) | 1998-03-10 |
Family
ID=16847839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22660696A Pending JPH1070365A (en) | 1996-08-28 | 1996-08-28 | Method for manufacturing multilayer circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1070365A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6370748B1 (en) * | 1999-04-02 | 2002-04-16 | Gisulfo Baccini | Device to produce multi-layer electronic circuits |
US6591491B2 (en) * | 2000-03-22 | 2003-07-15 | Nitto Denko Corporation | Method for producing multilayer circuit board |
US8533943B2 (en) | 1998-09-28 | 2013-09-17 | Ibiden Co., Ltd. | Printed wiring board and method for producing the same |
-
1996
- 1996-08-28 JP JP22660696A patent/JPH1070365A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8533943B2 (en) | 1998-09-28 | 2013-09-17 | Ibiden Co., Ltd. | Printed wiring board and method for producing the same |
US6370748B1 (en) * | 1999-04-02 | 2002-04-16 | Gisulfo Baccini | Device to produce multi-layer electronic circuits |
US6591491B2 (en) * | 2000-03-22 | 2003-07-15 | Nitto Denko Corporation | Method for producing multilayer circuit board |
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