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JPH10256736A - Multilayer wiring board and manufacture thereof - Google Patents

Multilayer wiring board and manufacture thereof

Info

Publication number
JPH10256736A
JPH10256736A JP6303797A JP6303797A JPH10256736A JP H10256736 A JPH10256736 A JP H10256736A JP 6303797 A JP6303797 A JP 6303797A JP 6303797 A JP6303797 A JP 6303797A JP H10256736 A JPH10256736 A JP H10256736A
Authority
JP
Japan
Prior art keywords
wiring board
multilayer wiring
conductor circuit
copper conductor
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6303797A
Other languages
Japanese (ja)
Inventor
Hiroaki Fujiwara
弘明 藤原
Koji Takagi
光司 高木
Shinichi Iketani
晋一 池谷
Shoichi Fujimori
正一 藤森
Isao Hirata
勲夫 平田
Kiyoaki Ihara
清暁 井原
Shuji Maeda
修二 前田
Satoru Ogawa
悟 小川
Yoshihiro Nakagawa
義廣 中川
Masayuki Ishihara
政行 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP6303797A priority Critical patent/JPH10256736A/en
Publication of JPH10256736A publication Critical patent/JPH10256736A/en
Pending legal-status Critical Current

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Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a multilayer wiring board and manufacture thereof, whereby no inferior appearance occurs due to the discoloration of the roughened surface of a Cu conductor circuit which is covered with an insulation resin layer and insulation performance deterioration is little after the moisture absorption. SOLUTION: A metal film 4, dissimilar to Cu is formed on the roughened surface of a Cu conductor circuit 2 with an insulation resin layer 5 covering the metal film 4, which is made of Pd, Sn or Ni and 0.01-2.0μm thick. After roughening the surface of the circuit 2, the metal film 4 is formed and insulation resin layer 5 covering the metal film 4 is formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、絶縁樹脂層で被覆
される銅導体回路の変色等の劣化を防止することができ
る多層配線板及びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer wiring board capable of preventing deterioration such as discoloration of a copper conductor circuit covered with an insulating resin layer and a method of manufacturing the same.

【0002】[0002]

【従来の技術】従来、電子機器、電気機器に用いられる
多層配線板は、内層用回路板の銅導体回路を形成してい
る面に、基材に樹脂を含浸し半硬化したプリプレグを重
ね、その外側に外層用基板、又は銅箔を重ね、加熱加圧
して製造されている。近年、機器の高密度化、小型化、
薄型化に伴って、ガラス布等の基材を含んでいるプリプ
レグに代えて、エポキシ樹脂等の樹脂成分のみで導体層
間の絶縁樹脂層を形成するビルドアップ方式も検討され
ている。ビルドアップ方式における導体層間の絶縁樹脂
層の形成方法には、フローコータで樹脂を塗布する方
法、スクリーン印刷法、樹脂フィルムを使用する方法、
予め銅箔に樹脂を塗布し半硬化状態にした、樹脂付き銅
箔を使用する方法等がある。
2. Description of the Related Art Conventionally, multilayer wiring boards used in electronic equipment and electric equipment are constructed by laminating a semi-cured prepreg by impregnating a base material with a resin on a surface of a circuit board for an inner layer on which a copper conductor circuit is formed. It is manufactured by laminating an outer layer substrate or a copper foil on the outside and heating and pressing. In recent years, higher density, smaller size of equipment,
Along with the reduction in thickness, a build-up method in which an insulating resin layer between conductor layers is formed only with a resin component such as an epoxy resin instead of a prepreg containing a base material such as a glass cloth has been studied. The method of forming an insulating resin layer between conductor layers in the build-up method includes a method of applying a resin with a flow coater, a screen printing method, a method of using a resin film,
There is a method of using a resin-attached copper foil which has been preliminarily applied with a resin to a copper foil to be in a semi-cured state.

【0003】従来のプリプレグを使用する一括多層化方
式の場合には、内層の銅導体回路と絶縁樹脂層の密着を
良好とするために、内層用回路板の銅導体回路に黒化処
理と呼ばれる酸化処理を施すことが主流であったが、環
境問題や、処理の簡素化、処理時間の短縮化等の要求か
ら、黒化処理に代えて、ソフトエッチングやメッキで銅
導体回路の表面を粗化する方法が検討されている。そし
て、ビルドアップ方式においても、ソフトエッチングや
メッキで銅導体回路の表面を粗化する方法の方が黒化処
理の方法より、銅導体回路と絶縁樹脂層の密着力が優れ
る場合があり、検討されている。
In the case of a conventional multi-layer system using a prepreg, in order to improve the adhesion between the inner copper conductor circuit and the insulating resin layer, the copper conductor circuit of the inner layer circuit board is called a blackening treatment. Oxidation treatment was the mainstream, but due to environmental issues and demands for simplification of treatment and shortening of treatment time, the surface of the copper conductor circuit was roughened by soft etching or plating instead of blackening treatment. A method to make it is being studied. Also, in the build-up method, the method of roughening the surface of the copper conductor circuit by soft etching or plating may have better adhesion between the copper conductor circuit and the insulating resin layer than the method of blackening treatment. Have been.

【0004】しかし、ソフトエッチングやメッキで銅導
体回路の表面を粗化した場合には、粗化後に銅導体回路
の表面は、酸化されていない純粋な銅となるために、絶
縁樹脂層の形成までの間に、吸湿等で室温でも酸化し、
変色等が生じる。また、絶縁樹脂層を形成する際には、
100〜250℃程度の高温加熱が施されるため、この
高温加熱により、銅導体回路の表面が酸化が進行し、変
色等の劣化が進む。そして、この銅導体回路の表面の変
色等の劣化は、最終製品である多層配線板の外観不良と
いう不良原因となったり、絶縁樹脂を劣化させて吸湿処
理後の多層配線板の絶縁性能を大幅に低下する原因とな
るため、銅導体回路の表面の変色等の劣化を防止するこ
とができる多層配線板及びその製造方法が求められてい
る。
[0004] However, when the surface of the copper conductor circuit is roughened by soft etching or plating, the surface of the copper conductor circuit becomes pure unoxidized copper after the roughening. In the meantime, it oxidizes even at room temperature due to moisture absorption,
Discoloration occurs. Also, when forming the insulating resin layer,
Since the high-temperature heating of about 100 to 250 ° C. is performed, the surface of the copper conductor circuit is oxidized by the high-temperature heating, and deterioration such as discoloration proceeds. Deterioration such as discoloration on the surface of the copper conductor circuit may be a cause of poor appearance of the multilayer wiring board as a final product, or may degrade the insulating resin and significantly increase the insulation performance of the multilayer wiring board after the moisture absorption treatment. Therefore, a multilayer wiring board capable of preventing deterioration such as discoloration on the surface of a copper conductor circuit and a method for manufacturing the same are required.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記のような
事情に鑑みてなされたものであって、その目的とすると
ころは、絶縁樹脂層で被覆される、粗化処理した銅導体
回路の表面に変色等の劣化が生じず、従って、銅導体回
路の表面の変色を原因とする外観不良が発生せず、且
つ、吸湿処理後の絶縁性能の劣化が少ない多層配線板を
提供すること及びその製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a roughened copper conductor circuit covered with an insulating resin layer. To provide a multilayer wiring board in which deterioration such as discoloration does not occur on the surface, so that appearance defects due to discoloration of the surface of the copper conductor circuit do not occur, and insulation performance after the moisture absorption treatment is less deteriorated; It is to provide a manufacturing method thereof.

【0006】[0006]

【課題を解決するための手段】請求項1に係る発明の多
層配線板は、粗化処理した銅導体回路の表面に、銅と異
なる金属の金属膜を形成し、さらにこの金属膜の表面を
被覆する絶縁樹脂層を形成している多層配線板である。
According to a first aspect of the present invention, there is provided a multilayer wiring board in which a metal film of a metal different from copper is formed on a surface of a copper conductor circuit subjected to a roughening treatment, and the surface of the metal film is further formed. It is a multilayer wiring board on which an insulating resin layer to be coated is formed.

【0007】請求項2に係る発明の多層配線板は、請求
項1記載の多層配線板において、銅と異なる金属が、パ
ラジウム、スズ又はニッケルの何れかであることを特徴
とする。
A multilayer wiring board according to a second aspect of the present invention is characterized in that, in the multilayer wiring board according to the first aspect, the metal different from copper is any one of palladium, tin and nickel.

【0008】請求項3に係る発明の多層配線板は、請求
項1又は請求項2記載の多層配線板において、銅と異な
る金属の金属膜の膜厚が、0.01〜2.0μmである
ことを特徴とする。
According to a third aspect of the present invention, in the multilayer wiring board according to the first or second aspect, the thickness of the metal film different from copper is 0.01 to 2.0 μm. It is characterized by the following.

【0009】請求項4に係る発明の多層配線板の製造方
法は、銅導体回路の表面を粗化処理した後、この粗化処
理した銅導体回路の表面に、銅と異なる金属の金属膜を
形成し、次いでこの金属膜の表面を被覆する絶縁樹脂層
を形成することを特徴とする。
According to a fourth aspect of the invention, there is provided a method for manufacturing a multilayer wiring board, comprising the steps of roughening a surface of a copper conductor circuit, and forming a metal film of a metal different from copper on the surface of the roughened copper conductor circuit. And then forming an insulating resin layer covering the surface of the metal film.

【0010】請求項5に係る発明の多層配線板の製造方
法は、請求項4記載の多層配線板の製造方法において、
銅導体回路の粗化処理の方法が、メッキ処理であること
を特徴とする。
According to a fifth aspect of the present invention, there is provided a method of manufacturing a multilayer wiring board, comprising the steps of:
The method of roughening the copper conductor circuit is plating.

【0011】請求項6に係る発明の多層配線板の製造方
法は、請求項4記載の多層配線板の製造方法において、
銅導体回路の粗化処理の方法が、ソフトエッチング処理
であることを特徴とする。
According to a sixth aspect of the present invention, there is provided a method of manufacturing a multilayer wiring board, comprising the steps of:
The method of roughening the copper conductor circuit is a soft etching process.

【0012】請求項7に係る発明の多層配線板の製造方
法は、請求項4から請求項6までの何れかに記載の多層
配線板の製造方法において、銅と異なる金属の金属膜を
形成する方法が、無電解メッキであることを特徴とす
る。
According to a seventh aspect of the present invention, in the method of manufacturing a multilayer wiring board according to any one of the fourth to sixth aspects, a metal film of a metal different from copper is formed. The method is characterized by electroless plating.

【0013】請求項1〜請求項3に係る発明の多層配線
板では、粗化処理した銅導体回路の表面に、銅と異なる
金属の金属膜を形成し、さらにこの金属膜の表面を被覆
する絶縁樹脂層を形成しているので、粗化処理した銅導
体回路の表面に変色等の劣化が生じにくくなる。
In the multilayer wiring board according to the first to third aspects of the present invention, a metal film different from copper is formed on the surface of the roughened copper conductor circuit, and the surface of the metal film is coated. Since the insulating resin layer is formed, the surface of the roughened copper conductor circuit hardly undergoes deterioration such as discoloration.

【0014】請求項4〜請求項7に係る発明の多層配線
板の製造方法では、銅導体回路の表面を粗化処理した
後、この粗化処理した銅導体回路の表面上に、銅と異な
る金属の金属膜を形成し、次いでこの金属膜の表面を被
覆する絶縁樹脂層を形成して多層配線板を製造するの
で、粗化処理した銅導体回路の表面に変色等の劣化が生
じにい多層配線板を製造することが可能になる。
In the method for manufacturing a multilayer wiring board according to the present invention, after roughening the surface of the copper conductor circuit, the surface of the roughened copper conductor circuit is different from copper. Since a multi-layer wiring board is manufactured by forming a metal film of a metal and then forming an insulating resin layer covering the surface of the metal film, deterioration of the surface of the roughened copper conductor circuit is unlikely to occur. It becomes possible to manufacture a multilayer wiring board.

【0015】なお、ここでいうソフトエッチングとは、
エッチング対象の金属をある深さ迄は除去するが、全部
を除去してしまうことはない、部分的なエッチング(あ
る深さ迄しか除去しないエッチング)を表わしている。
[0015] The soft etching referred to here is:
This indicates partial etching (etching that only removes a metal to be etched to a certain depth), in which the metal to be etched is removed to a certain depth but not all of the metal.

【0016】[0016]

【発明の実施の形態】本発明の実施の形態を図面を参照
して説明する。なお、図面で示す実施の形態はビルドア
ップ方式による多層配線板の製造方法を示しているが、
本発明はプリプレグを接着層とする一括多層方式による
多層配線板及びその製造方法にも適用できる。図1
(a)〜(c)はこの実施の形態に係る多層配線板及び
その製造方法を説明するための断面図である。図1
(a)に示すように、この実施の形態では、表面に銅導
体回路2を備える内層用回路板1を準備する。この内層
用回路板1は、ガラス布等の基材に樹脂を含浸して得ら
れるプリプレグと銅箔を張り合わせた銅張積層板を加工
して製造することができる。上記樹脂としては、エポキ
シ樹脂、ポリイミド樹脂、フェノール樹脂、PPO樹脂
等の単独物、変性物、混合物が挙げられる。上記基材と
しては、特に限定しないが、ガラス繊維等の無機材料よ
りなる基材が、耐熱性、吸湿性等の点で優れており好ま
しい。また、耐熱性に優れる有機繊維よりなる基材や、
耐熱性に優れる有機繊維と無機繊維よりなる基材を用い
ることもできる。さらに、内層用回路板1は、アルミナ
等の無機基板や、ポリイミドフィルム等のフレキシブル
基板のように基材を使用していない基板や、フィラー等
を混合している基板であってもよい。
Embodiments of the present invention will be described with reference to the drawings. The embodiment shown in the drawings shows a method of manufacturing a multilayer wiring board by a build-up method,
The present invention can be applied to a multilayer wiring board of a batch multilayer system using a prepreg as an adhesive layer and a method of manufacturing the same. FIG.
(A)-(c) is sectional drawing for demonstrating the multilayer wiring board which concerns on this Embodiment, and its manufacturing method. FIG.
As shown in (a), in this embodiment, an inner layer circuit board 1 having a copper conductor circuit 2 on its surface is prepared. The inner layer circuit board 1 can be manufactured by processing a copper-clad laminate in which a prepreg obtained by impregnating a resin such as a glass cloth with a resin and a copper foil are laminated. Examples of the resin include a single product, a modified product, and a mixture such as an epoxy resin, a polyimide resin, a phenol resin, and a PPO resin. The substrate is not particularly limited, but a substrate made of an inorganic material such as glass fiber is preferable because of its excellent heat resistance and hygroscopicity. In addition, a substrate made of organic fibers having excellent heat resistance,
A substrate composed of organic fibers and inorganic fibers having excellent heat resistance can also be used. Furthermore, the circuit board 1 for the inner layer may be an inorganic substrate such as alumina, a substrate such as a flexible substrate such as a polyimide film, which does not use a base material, or a substrate in which a filler or the like is mixed.

【0017】銅導体回路2は、サブトラクティブ法やア
ディティブ法等で形成でき、この銅導体回路2に対して
粗化処理を施す。この粗化処理は、ソフトエッチング
や、メッキ等の方法で行うことができる。特にソフトエ
ッチングによる粗化処理は、液管理が簡単であり、処理
速度も速いため望ましい方法である。ソフトエッチング
に使用するエッチング系としては、例えば、塩化第2銅
系、塩化第2鉄系、硫酸−過酸化水素系、過硫酸ソーダ
系、過硫酸カリウム系、有機酸系等の酸化還元反応によ
るものが好ましい。一方、メッキによる粗化処理は、例
えば、無電解メッキや電気メッキにより、こぶ状の突起
を銅導体回路2に形成して粗面化するものである。
The copper conductor circuit 2 can be formed by a subtractive method, an additive method, or the like, and the copper conductor circuit 2 is subjected to a roughening process. This roughening treatment can be performed by a method such as soft etching or plating. In particular, the roughening treatment by soft etching is a desirable method because the liquid management is simple and the treatment speed is high. As an etching system used for soft etching, for example, an oxidation-reduction reaction such as a cupric chloride system, a ferric chloride system, a sulfuric acid-hydrogen peroxide system, a sodium persulfate system, a potassium persulfate system, and an organic acid system is used. Are preferred. On the other hand, in the roughening treatment by plating, for example, bump-like projections are formed on the copper conductor circuit 2 by electroless plating or electroplating to roughen the surface.

【0018】表面を粗化した銅導体回路2上に絶縁樹脂
層を形成する前に、図1(b)に示すように、銅導体回
路2上に銅と異なる金属の金属膜4を形成する。銅と異
なる金属として、例えば、金、ニッケル、スズ、パラジ
ウム、亜鉛、鉛等を使用することが銅導体回路2の酸化
による変色等の劣化防止の点から好ましい。そして、コ
ストや膜形成の容易性の点から、パラジウム、スズ又は
ニッケルの何れかであることがより好ましい。また、銅
と異なる金属の金属膜4の膜厚は、内層用回路板1と絶
縁樹脂層の密着性及び銅導体回路2の酸化による変色等
の劣化防止の点から、0.01μm以上の厚みであるこ
とが好ましく、2.0μmを越えて形成しても効果の増
大が期待できないので、0.01〜2.0μmの範囲内
であることが好ましい。
Before forming the insulating resin layer on the copper conductor circuit 2 whose surface is roughened, a metal film 4 of a metal different from copper is formed on the copper conductor circuit 2 as shown in FIG. . As a metal different from copper, for example, gold, nickel, tin, palladium, zinc, lead or the like is preferably used from the viewpoint of preventing deterioration such as discoloration due to oxidation of the copper conductor circuit 2. And, from the viewpoint of cost and easiness of film formation, it is more preferable to use any of palladium, tin and nickel. The thickness of the metal film 4 made of a metal different from copper is 0.01 μm or more in terms of adhesion between the inner circuit board 1 and the insulating resin layer and prevention of deterioration such as discoloration due to oxidation of the copper conductor circuit 2. It is preferable that the thickness be more than 2.0 μm, and the effect is not expected to increase even if the thickness exceeds 2.0 μm. Therefore, the thickness is preferably in the range of 0.01 to 2.0 μm.

【0019】銅と異なる金属の金属膜4の形成方法とし
ては、特に限定するものではないが、無電解メッキによ
って形成するのが好ましい。なぜならば、無電解メッキ
によって金属膜4を形成する場合には、内層用回路板1
の銅導体回路2中に独立回路があっても、電気メッキの
場合のように導通をとるためのリード線を引き出す必要
がないからである。近年、高密度化のために配線パター
ンの細線化が進んでおり、リード線を引き出す余裕がな
い場合が多いので、無電解メッキによって金属膜4を形
成することの有用性は増している。
The method of forming the metal film 4 of a metal different from copper is not particularly limited, but is preferably formed by electroless plating. This is because when the metal film 4 is formed by electroless plating, the inner-layer circuit board 1 is formed.
This is because, even if there is an independent circuit in the copper conductor circuit 2, there is no need to draw out a lead wire for conducting as in the case of electroplating. In recent years, thinning of wiring patterns has been progressing for higher density, and there is often no room to lead out lead wires. Therefore, the usefulness of forming the metal film 4 by electroless plating is increasing.

【0020】このようにして銅導体回路2上に銅と異な
る金属の金属膜4を形成した内層用回路板1上に、図1
(c)に示すように、絶縁樹脂層5を形成する。絶縁樹
脂層5の形成方法としては、フローコータで樹脂を塗布
する方法、スクリーン印刷法、樹脂フィルムやプリプレ
グを使用する方法、予め銅箔に樹脂を塗布し半硬化状態
にした、樹脂付き銅箔を使用する方法等がある。次い
で、図1(c)に示すように、絶縁樹脂層5に導体層間
を接続するための導体を配設するための穴6を形成し、
次いで、穴6を導体で充填し、次いで絶縁樹脂層5上に
新たな銅導体回路3を形成して、多層配線板を得る。穴
6を導体で充填する方法としては、例えばメッキ法や、
ペースト法で行うことができ、新たな銅導体回路3の形
成方法としては、メッキ法や、絶縁樹脂層5を形成する
際に樹脂付き銅箔を使用しておき、この銅箔をエッチン
グして形成する方法等が例示できる。なお、形成した新
たな銅導体回路3の表面が酸化等で劣化しないようにす
るには、例えば、半田レジスト等のレジストを塗布する
等の方法で行えばよく、特に限定はない。
On the inner layer circuit board 1 in which the metal film 4 of a metal different from copper is formed on the copper conductor circuit 2 in this manner, FIG.
As shown in (c), the insulating resin layer 5 is formed. Examples of the method of forming the insulating resin layer 5 include a method of applying a resin by a flow coater, a screen printing method, a method of using a resin film or a prepreg, and a resin-coated copper foil which has been previously applied to a copper foil to be in a semi-cured state. And the like. Next, as shown in FIG. 1C, a hole 6 for disposing a conductor for connecting the conductor layers to the insulating resin layer 5 is formed,
Next, the hole 6 is filled with a conductor, and then a new copper conductor circuit 3 is formed on the insulating resin layer 5 to obtain a multilayer wiring board. As a method of filling the hole 6 with a conductor, for example, a plating method,
It can be performed by a paste method. As a method for forming a new copper conductor circuit 3, a plating method or a method using a resin-coated copper foil when forming the insulating resin layer 5 is used. An example of the method of formation is given. In order to prevent the surface of the newly formed copper conductor circuit 3 from being deteriorated by oxidation or the like, for example, a method such as applying a resist such as a solder resist may be used, and there is no particular limitation.

【0021】このようにして得た多層配線板では、絶縁
樹脂層5で被覆されている内層の銅導体回路2の表面に
はパラジウム等の銅と異なる金属の金属層が形成されて
いるため、銅導体回路2の表面が経時変化や絶縁樹脂層
5を形成する際の加熱により酸化が進行し、変色等の劣
化が進むことがない。そのため、銅導体回路2の変色に
起因する多層配線板の外観不良の発生はなく、性能面で
は絶縁樹脂層5が劣化して吸湿処理後の多層配線板の絶
縁性能が大幅に低下する問題は生じなくなる。
In the multilayer wiring board thus obtained, a metal layer of a metal different from copper, such as palladium, is formed on the surface of the inner copper conductor circuit 2 covered with the insulating resin layer 5. The surface of the copper conductor circuit 2 changes over time or is oxidized by heating when the insulating resin layer 5 is formed, and deterioration such as discoloration does not progress. Therefore, there is no appearance defect of the multilayer wiring board caused by the discoloration of the copper conductor circuit 2, and the insulating resin layer 5 is deteriorated in terms of performance, and the insulation performance of the multilayer wiring board after the moisture absorption processing is greatly reduced. No longer occurs.

【0022】上記の実施の形態では、一方の表面にのみ
銅導体回路2を備える内層用回路板1を使用した例を示
したが、両面に銅導体回路2を備える内層用回路板に対
しそ、の両面に絶縁樹脂層を形成して製造する多層配線
板にも本発明は適用できる。
In the above-described embodiment, an example is shown in which the inner layer circuit board 1 having the copper conductor circuit 2 only on one surface is used, but the inner layer circuit board having the copper conductor circuit 2 on both surfaces is used. The present invention can also be applied to a multilayer wiring board manufactured by forming an insulating resin layer on both surfaces of the above.

【0023】[0023]

【実施例】次に本発明を実施例に基づいて説明する。Next, the present invention will be described based on embodiments.

【0024】(実施例1)厚み18μmの銅箔を片面に
配した、厚み0.8mmのエポキシ樹脂ガラス布積層板
(松下電工株式会社製、品番R−1700)を用い、エ
ッチングにより銅導体回路を形成して内層用回路板を得
た。この内層用回路板を有機酸系エッチング液(メック
株式会社製、品番CZ−5452)で、エッッチング深
さが4μmのソフトエッチングを行い、銅導体回路の表
面を粗化した。次に、粗化した銅導体回路の表面に厚み
0.02μmのパラジウムの金属膜を、アトテックジャ
パン株式会社製の商品名:パラテクトシステムを用いて
無電解メッキ法で形成した。得られた内層用回路板の銅
導体回路が配置されている面上に、フローコータで液状
のエポキシ樹脂組成物を塗布し、110℃で30分、次
いで150℃で20分、さらに170℃で90分乾燥機
で加熱硬化し、絶縁樹脂層を内層用回路板の銅導体回路
が配置されている面の全面に形成した。上記の液状のエ
ポキシ樹脂組成物は、ビスフェノールA型エポキシ樹脂
を主成分とするもので、内層用回路板に使用している樹
脂組成物と同一構成材料からなっているものを使用し
た。
(Example 1) A copper conductor circuit was formed by etching using a 0.8 mm thick epoxy resin glass cloth laminate (manufactured by Matsushita Electric Works Co., Ltd., product number R-1700) on which copper foil having a thickness of 18 μm was disposed on one side. Was formed to obtain an inner layer circuit board. The inner layer circuit board was subjected to soft etching with an etching depth of 4 μm using an organic acid-based etchant (manufactured by MEC Co., Ltd., product number CZ-5452) to roughen the surface of the copper conductor circuit. Next, a palladium metal film having a thickness of 0.02 μm was formed on the surface of the roughened copper conductor circuit by an electroless plating method using a trade name system manufactured by Atotech Japan KK. A liquid epoxy resin composition is applied with a flow coater on the surface of the obtained inner layer circuit board on which the copper conductor circuits are arranged, and is applied at 110 ° C. for 30 minutes, then at 150 ° C. for 20 minutes, and further at 170 ° C. It was heated and cured in a drier for 90 minutes, and an insulating resin layer was formed on the entire surface of the inner layer circuit board on which the copper conductor circuits were arranged. The liquid epoxy resin composition was mainly composed of a bisphenol A type epoxy resin, and was made of the same material as the resin composition used for the inner layer circuit board.

【0025】次いで、絶縁樹脂層に導体層間を接続する
ための導体を配設するための穴として、炭酸ガスレーザ
で150μm径のバイアホールを形成した。次いで、形
成を予定するメッキによる新たな銅導体と絶縁樹脂層の
密着力を良好にするために、上記バイアホールの壁面を
含む絶縁樹脂層の表面を、過マンガン酸カリウム液(シ
プレイ株式会社製)で粗化した後、バイアホールを充填
していて、絶縁樹脂層上の厚みが18μmである銅導体
層をメッキ法で形成した。次いで、エッチングによりこ
の銅導体層に回路を形成して、絶縁樹脂層の表面に銅導
体回路を形成して多層配線板を得た。
Next, a via hole having a diameter of 150 μm was formed by a carbon dioxide laser as a hole for disposing a conductor for connecting the conductor layer to the insulating resin layer. Then, in order to improve the adhesion between the new copper conductor and the insulating resin layer by plating to be formed, the surface of the insulating resin layer including the wall surface of the via hole is coated with a potassium permanganate solution (manufactured by Shipley Co., Ltd.). ), A copper conductor layer filled with via holes and having a thickness of 18 μm on the insulating resin layer was formed by plating. Next, a circuit was formed on the copper conductor layer by etching, and a copper conductor circuit was formed on the surface of the insulating resin layer to obtain a multilayer wiring board.

【0026】このようにして得られた多層配線板につい
て、絶縁樹脂層で被覆された内層の銅導体回路の変色や
色ムラ等の外観不良があるかを目視にて行った結果、表
1に示すように、変色や色ムラの発生は観察されなかっ
た。また、吸湿処理後の絶縁性能の劣化を評価するため
に、得られた多層配線板を2気圧の蒸気中に暴露するこ
とにより、温度121℃、湿度100%の条件で処理す
る試験を行い、絶縁抵抗が1×108 オーム以下低下す
る迄の処理時間を測定し、得られた結果を表1に示し
た。
The multilayer wiring board thus obtained was visually inspected for any external appearance defects such as discoloration and color unevenness of the inner copper conductor circuit covered with the insulating resin layer. As shown, no discoloration or color unevenness was observed. Further, in order to evaluate the deterioration of the insulation performance after the moisture absorption treatment, a test was conducted in which the obtained multilayer wiring board was exposed to steam of 2 atm under conditions of a temperature of 121 ° C. and a humidity of 100%. The processing time until the insulation resistance decreased by 1 × 10 8 ohms or less was measured, and the obtained results are shown in Table 1.

【0027】(実施例2)ソフトエッチングを行って粗
化した銅導体回路の表面に、パラジウムの金属膜に代え
て、厚み0.1μmのスズの金属膜をシプレイ株式会社
製の商品名:ティンポジットLT−34を用いて無電解
メッキ法で形成した以外は、実施例1と同様にして多層
配線板を得、次いで実施例1と同様にして得られた多層
配線板の外観不良及び吸湿処理後の絶縁性能の劣化につ
いて評価し、得られた結果を表1に示した。
(Example 2) On the surface of a copper conductor circuit roughened by soft etching, a tin metal film having a thickness of 0.1 µm was replaced with a tin metal film having a thickness of 0.1 µm by Shipley Co., Ltd. instead of a palladium metal film. A multilayer wiring board was obtained in the same manner as in Example 1 except that the multilayer wiring board was formed by an electroless plating method using Positive LT-34. The deterioration of the insulation performance was evaluated later, and the obtained results are shown in Table 1.

【0028】(実施例3)ソフトエッチングを行って粗
化した銅導体回路の表面に、厚み2μmのパラジウムの
金属膜を形成するようにした以外は、実施例1と同様に
して多層配線板を得、次いで実施例1と同様にして得ら
れた多層配線板の外観不良及び吸湿処理後の絶縁性能の
劣化について評価し、得られた結果を表1に示した。
Example 3 A multilayer wiring board was formed in the same manner as in Example 1 except that a palladium metal film having a thickness of 2 μm was formed on the surface of a copper conductor circuit roughened by soft etching. Then, the multilayer wiring board obtained in the same manner as in Example 1 was evaluated for poor appearance and deterioration of insulation performance after moisture absorption treatment, and the obtained results are shown in Table 1.

【0029】(実施例4)銅導体回路の表面をソフトエ
ッチングで粗化する代わりに、銅導体回路の表面に無電
解銅メッキを施して、銅よりなるこぶ状の突起(こぶの
粒径2〜6μm程度)を形成して粗面化した以外は、実
施例1と同様にして多層配線板を得、次いで実施例1と
同様にして得られた多層配線板の外観不良及び吸湿処理
後の絶縁性能の劣化について評価し、得られた結果を表
1に示した。
Embodiment 4 Instead of roughening the surface of a copper conductor circuit by soft etching, the surface of the copper conductor circuit is subjected to electroless copper plating to form bumps made of copper (having a bump diameter of 2). Except that the multilayer wiring board was obtained in the same manner as in Example 1 except that the multilayer wiring board was formed and roughened. The deterioration of the insulation performance was evaluated, and the obtained results are shown in Table 1.

【0030】(比較例1)ソフトエッチングを行って粗
化した銅導体回路の表面に、銅と異なるパラジウム等の
金属膜を形成することなしに、すなわち、銅導体回路の
表面は粗化しただけの状態で、絶縁樹脂層を内層用回路
板の銅導体回路が配置されている面の全面に形成するよ
うにした以外は、実施例1と同様にして多層配線板を
得、次いで実施例1と同様にして得られた多層配線板の
外観不良及び吸湿処理後の絶縁性能の劣化について評価
し、得られた結果を表1に示した。
Comparative Example 1 The surface of a copper conductor circuit roughened by soft etching was not formed on the surface of a metal film such as palladium different from copper, that is, the surface of the copper conductor circuit was merely roughened. , A multilayer wiring board was obtained in the same manner as in Example 1 except that the insulating resin layer was formed on the entire surface of the inner layer circuit board on which the copper conductor circuits were arranged. The multilayer wiring board obtained in the same manner as described above was evaluated for poor appearance and deterioration of insulation performance after the moisture absorption treatment, and the obtained results are shown in Table 1.

【0031】[0031]

【表1】 [Table 1]

【0032】表1の結果から、実施例1〜実施例4で
は、内層の銅導体回路の表面の変色を原因とする外観不
良が発生せず、且つ、比較例1に比べて、吸湿処理後の
絶縁性能の劣化程度が少ない多層配線板が得られている
ことが確認された。
From the results shown in Table 1, it can be seen from Examples 1 to 4 that the appearance failure due to the discoloration of the surface of the copper conductor circuit in the inner layer did not occur, and that after the moisture absorption treatment, as compared with Comparative Example 1, It was confirmed that a multilayer wiring board with a small degree of deterioration of the insulation performance was obtained.

【0033】[0033]

【発明の効果】請求項1〜請求項3に係る発明の多層配
線板では、粗化処理した銅導体回路の表面に、銅と異な
る金属の金属膜を形成し、さらにこの金属膜の表面を被
覆する絶縁樹脂層を形成しているので、粗化処理した銅
導体回路の表面に変色等の劣化が生じにくくなる。従っ
て、請求項1〜請求項3に係る発明の多層配線板は内層
の銅導体回路の表面の変色を原因とする外観不良が発生
せず、且つ、吸湿処理後の絶縁性能の劣化程度が少ない
という有用な効果を奏する。
In the multilayer wiring board according to the first to third aspects of the present invention, a metal film different from copper is formed on the surface of the roughened copper conductor circuit, and the surface of the metal film is further formed. Since the insulating resin layer to be coated is formed, deterioration such as discoloration is unlikely to occur on the surface of the roughened copper conductor circuit. Therefore, the multilayer wiring board according to the first to third aspects of the present invention does not cause appearance defects due to discoloration of the surface of the copper conductor circuit in the inner layer, and has a small degree of deterioration of insulation performance after moisture absorption processing. This has a useful effect.

【0034】請求項4〜請求項7に係る発明の多層配線
板の製造方法では、銅導体回路の表面を粗化処理した
後、この粗化処理した銅導体回路の表面上に、銅と異な
る金属の金属膜を形成し、次いでこの金属膜の表面を被
覆する絶縁樹脂層を形成して多層配線板を製造する。従
って、請求項4〜請求項7に係る発明の多層配線板の製
造方法によれば、内層の銅導体回路の表面の変色を原因
とする外観不良が発生せず、且つ、吸湿処理後の絶縁性
能の劣化程度が少ない多層配線板を製造することが可能
になる。
In the method for manufacturing a multilayer wiring board of the invention according to claims 4 to 7, after roughening the surface of the copper conductor circuit, the surface of the roughened copper conductor circuit is different from copper. A metal film of a metal is formed, and then an insulating resin layer covering the surface of the metal film is formed to manufacture a multilayer wiring board. Therefore, according to the method for manufacturing a multilayer wiring board of the invention according to claims 4 to 7, the appearance defect due to the discoloration of the surface of the copper conductor circuit in the inner layer does not occur, and the insulation after the moisture absorption processing is performed. It is possible to manufacture a multilayer wiring board with a small degree of performance deterioration.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1の(a)〜(c)は本発明の実施の形態の
製造工程を説明するための断面図である。
FIGS. 1A to 1C are cross-sectional views illustrating a manufacturing process according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 内層用回路板 2 銅導体回路 3 銅導体回路 4 金属膜 5 絶縁樹脂層 6 穴 REFERENCE SIGNS LIST 1 inner layer circuit board 2 copper conductor circuit 3 copper conductor circuit 4 metal film 5 insulating resin layer 6 hole

───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤森 正一 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 平田 勲夫 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 井原 清暁 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 前田 修二 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 小川 悟 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 中川 義廣 大阪府門真市大字門真1048番地松下電工株 式会社内 (72)発明者 石原 政行 大阪府門真市大字門真1048番地松下電工株 式会社内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shoichi Fujimori 1048 Kadoma Kadoma, Kadoma City, Osaka Pref. (72) Inventor Kiyoaki Ihara 1048 Kazuma Kadoma, Kadoma-shi, Osaka Prefecture Inside Matsushita Electric Works, Ltd. (72) Inventor Shuji Maeda 1048 Kadoma Kadoma, Kadoma-shi, Osaka Prefecture Inside Matsushita Electric Works, Ltd. (72) Inventor Satoru Ogawa 1048 Okadoma Kadoma, Kadoma City, Osaka Prefecture (72) Yoshihiro Nakagawa, Inventor Yoshihiro Nakagawa 1048 Okadoma Kadoma, Kadoma City, Osaka Prefecture (72) Inventor Masayuki Ishihara 1048 Okadoma Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Works, Ltd.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 粗化処理した銅導体回路の表面に、銅と
異なる金属の金属膜を形成し、さらにこの金属膜の表面
を被覆する絶縁樹脂層を形成している多層配線板。
1. A multilayer wiring board comprising: a metal film of a metal different from copper formed on a surface of a roughened copper conductor circuit; and an insulating resin layer covering the surface of the metal film.
【請求項2】 銅と異なる金属が、パラジウム、スズ又
はニッケルの何れかであることを特徴とする請求項1記
載の多層配線板。
2. The multilayer wiring board according to claim 1, wherein the metal different from copper is one of palladium, tin and nickel.
【請求項3】 銅と異なる金属の金属膜の膜厚が、0.
01〜2.0μmであることを特徴とする請求項1又は
請求項2記載の多層配線板。
3. The metal film of a metal different from copper has a thickness of 0.
3. The multilayer wiring board according to claim 1, wherein the thickness is from 0.01 to 2.0 [mu] m.
【請求項4】 銅導体回路の表面を粗化処理した後、こ
の粗化処理した銅導体回路の表面に、銅と異なる金属の
金属膜を形成し、次いでこの金属膜の表面を被覆する絶
縁樹脂層を形成することを特徴とする多層配線板の製造
方法。
4. After roughening the surface of the copper conductor circuit, a metal film of a metal different from copper is formed on the surface of the roughened copper conductor circuit, and then an insulating film covering the surface of the metal film is formed. A method for manufacturing a multilayer wiring board, comprising forming a resin layer.
【請求項5】 銅導体回路の粗化処理の方法が、メッキ
処理であることを特徴とする請求項4記載の多層配線板
の製造方法。
5. The method for manufacturing a multilayer wiring board according to claim 4, wherein the method of roughening the copper conductor circuit is plating.
【請求項6】 銅導体回路の粗化処理の方法が、ソフト
エッチング処理であることを特徴とする請求項4記載の
多層配線板の製造方法。
6. The method for manufacturing a multilayer wiring board according to claim 4, wherein the method of roughening the copper conductor circuit is a soft etching process.
【請求項7】 銅と異なる金属の金属膜を形成する方法
が、無電解メッキであることを特徴とする請求項4から
請求項6までの何れかに記載の多層配線板の製造方法。
7. The method for manufacturing a multilayer wiring board according to claim 4, wherein the method for forming a metal film of a metal different from copper is electroless plating.
JP6303797A 1997-03-17 1997-03-17 Multilayer wiring board and manufacture thereof Pending JPH10256736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6303797A JPH10256736A (en) 1997-03-17 1997-03-17 Multilayer wiring board and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6303797A JPH10256736A (en) 1997-03-17 1997-03-17 Multilayer wiring board and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH10256736A true JPH10256736A (en) 1998-09-25

Family

ID=13217741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6303797A Pending JPH10256736A (en) 1997-03-17 1997-03-17 Multilayer wiring board and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH10256736A (en)

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US7020961B2 (en) 2000-07-11 2006-04-04 Sony Corporation Method for manufacturing a bump-attached wiring circuit board
JP2008306201A (en) * 2008-07-22 2008-12-18 Ibiden Co Ltd Multilayer printed wiring board and manufacturing method therefor
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US8533943B2 (en) 1998-09-28 2013-09-17 Ibiden Co., Ltd. Printed wiring board and method for producing the same

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* Cited by examiner, † Cited by third party
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JP2008306201A (en) * 2008-07-22 2008-12-18 Ibiden Co Ltd Multilayer printed wiring board and manufacturing method therefor
JP4553402B2 (en) * 2008-07-22 2010-09-29 イビデン株式会社 Manufacturing method of multilayer printed wiring board
JP2009302588A (en) * 2009-09-30 2009-12-24 Ibiden Co Ltd Multilayer printed wiring board, and manufacturing method thereof
JP4611437B2 (en) * 2009-09-30 2011-01-12 イビデン株式会社 Multilayer printed wiring board and manufacturing method thereof

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